Patents by Inventor Wei-Hsiang YANG

Wei-Hsiang YANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250060892
    Abstract: The application provides a method and a memory device for performing wear leveling in a memory device. The method includes: receiving data to be written transmitted by a host in the memory device; predicting the data to be written as a first type of data or a second type of data; referencing an erase count table in an erase count table buffer of the memory device; and when the data to be written is predicted as the first type of data, writing the data to be written into the block with a highest erase count among these blocks, and when the data to be written is predicted as the second type of data, writing the data to be written into the block with a lowest erase count among these blocks.
    Type: Application
    Filed: August 18, 2023
    Publication date: February 20, 2025
    Inventors: Wei-Cheng SU, Chih-Hsiang YANG, Hsiang-Lan LUNG
  • Publication number: 20250034060
    Abstract: A method for producing an energetic gas from carbon dioxide includes the steps of: impregnating a plurality of alumina particles into a nickel-based aqueous solution to form a crude product, followed by subjecting the crude product to a drying treatment and then to a calcination treatment at a temperature ranging from 550° C. to 650° C., so as to obtain a supported catalyst; activating the supported catalyst with hydrogen, so as to obtain an activated supported catalyst; and subjecting hydrogen and carbon dioxide to a methanation reaction at a total gas hourly space velocity ranging from 4000 h?1 to 5000 h?1 in the presence of the activated supported catalyst, so as to form methane serving as an energetic gas.
    Type: Application
    Filed: October 24, 2023
    Publication date: January 30, 2025
    Inventors: Wei-Cheng WANG, Yung-Hsiang YANG
  • Publication number: 20250027227
    Abstract: Provided are a silicon carbide crystal growth device and a quality control method. The device includes: an annealing unit, a crystal growth unit, an atmosphere control unit, and a transport system; the atmosphere control unit provides a gas environment with low water, oxygen and nitrogen; the transport system transports a plurality of target objects after high-temperature purification by the annealing unit to the atmosphere control unit; after assembling silicon carbide seed crystal and silicon carbide powder in a graphite crucible and covering with thermal insulation material to form a container inside the atmosphere control unit, the transport system transports the container to the crystal growth unit. The method uses a weighing system in a chamber of the crystal growth unit to detect a weight change of silicon carbide seed crystal and silicon carbide powder during a crystal growth process through a plurality of weight sensors of the weighing system.
    Type: Application
    Filed: July 20, 2023
    Publication date: January 23, 2025
    Inventors: Yun-Fu Chen, Wei-Tse Hsu, Min-Sheng Chu, Chien-Li Yang, Tsu-Hsiang Lin, Yuan-Hong Huang
  • Patent number: 10508342
    Abstract: A method for manufacturing a diamond-like carbon film is described, which includes the following steps. A substrate is disposed into a chamber. An aromatic cyclic hydrocarbon is introduced into the chamber. A diamond-like carbon film is grown on the substrate by using the aromatic cyclic hydrocarbon as a reaction precursor The step of growing the diamond-like carbon film includes controlling a substrate temperature at 200 Celsius degrees to 800 Celsius degrees.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: December 17, 2019
    Assignee: CREATING NANO TECHNOLOGIES, INC.
    Inventors: Shih-Ming Huang, Jie Huang, Wei-Hsiang Yang
  • Publication number: 20180057941
    Abstract: A method for manufacturing a diamond-like carbon film is described, which includes the following steps. A substrate is disposed into a chamber. An aromatic cyclic hydrocarbon is introduced into the chamber. A diamond-like carbon film is grown on the substrate by using the aromatic cyclic hydrocarbon as a reaction precursor The step of growing the diamond-like carbon film includes controlling a substrate temperature at 200 Celsius degrees to 800 Celsius degrees.
    Type: Application
    Filed: August 29, 2016
    Publication date: March 1, 2018
    Inventors: Shih-Ming HUANG, Jie HUANG, Wei-Hsiang YANG