Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.

Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.

Abstract: In the present invention, setting apparatus for semiconductor equipment with multitude of chambers comprises a plurality of input devices coupled to a controlling system of the semiconductor equipment. The input devices are used for setting a maintain status of said chambers whereby said chambers can be available for a test process. A method for setting a plurality of statuses for a plurality of chambers in semiconductor equipment comprises setting a plurality of maintain statuses for the chambers and executing a plurality of test process in the chambers in the maintain statuses. To be specific, the setting step can simultaneously set an on-line status for each the chamber and the maintain status for other the chamber.

Abstract: In the present invention, setting apparatus for semiconductor equipment with multitude of chambers comprises a plurality of input devices coupled to a controlling system of the semiconductor equipment. The input devices are used for setting a maintain status of said chambers whereby said chambers can be available for a test process. A method for setting a plurality of statuses for a plurality of chambers in semiconductor equipment comprises setting a plurality of maintain statuses for the chambers and executing a plurality of test process in the chambers in the maintain statuses. To be specific, the setting step can simultaneously set an on-line status for each the chamber and the maintain status for other the chamber.