Patents by Inventor Wei-Hsuan Hsu

Wei-Hsuan Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210322496
    Abstract: A method for treating and/or alleviating nervous diseases is provided. The method for treating and/or alleviating nervous diseases includes: administering an effective amount of a water extract of a plant of Gracilariaceae or a ferment thereof to a subject in need thereof to treat and/or alleviate a nervous disease thereof, wherein the ferment of the water extract of a plant of Gracilariaceae is a lactic acid bacteria ferment.
    Type: Application
    Filed: July 1, 2021
    Publication date: October 21, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Hong PAN, Wei-Hsuan HSU, Chu-Hsun LU, Shu-Fang WEN, Hsin-Chieh WU
  • Patent number: 11083762
    Abstract: The present disclosure provides a method for treating and/or alleviating nervous diseases, including: administering an effective amount of a water extract of a plant of Gracilariaceae or a ferment thereof to a subject in need thereof to treat and/or alleviate a nervous disease thereof, wherein the ferment of the water extract of a plant of Gracilariaceae is a lactic acid bacteria ferment.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: August 10, 2021
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: I-Hong Pan, Wei-Hsuan Hsu, Chu-Hsun Lu, Shu-Fang Wen, Hsin-Chieh Wu
  • Patent number: 10351427
    Abstract: A method for manufacturing high purity sulfuric acid is provided. A mixed solution subsequently undergoes a first preheating step, a second preheating step, a distilling step and an evaporating step to remove peroxide, water, oxygen and insoluble impurities, so as to obtain the first gas containing sulfur trioxide, sulfuric acid and hydrogen oxide. And then, the sulfur trioxide is absorbed by a sulfuric acid solution, thereby forming the high purity sulfuric acid.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: July 16, 2019
    Assignee: ASIA UNION ELECTRONIC CHEMICAL CORP.
    Inventors: Curtis Douglas Dove, Goang-Cheng Chang, Yuen-Ming Kung, Hung-Wen Chan, Wei-Hsuan Hsu
  • Publication number: 20190183949
    Abstract: The present disclosure provides a method for treating and/or alleviating nervous diseases, including: administering an effective amount of a water extract of a plant of Gracilariaceae or a ferment thereof to a subject in need thereof to treat and/or alleviate a nervous disease thereof, wherein the ferment of the water extract of a plant of Gracilariaceae is a lactic acid bacteria ferment.
    Type: Application
    Filed: December 18, 2017
    Publication date: June 20, 2019
    Applicant: Industrial Technology Research Institute
    Inventors: I-Hong PAN, Wei-Hsuan HSU, Chu-Hsun LU, Shu-Fang WEN, Hsin-Chieh WU
  • Publication number: 20180162731
    Abstract: A method for manufacturing high purity sulfuric acid is provided. A mixed solution subsequently undergoes a first preheating step, a second preheating step, a distilling step and an evaporating step to remove peroxide, water, oxygen and insoluble impurities, so as to obtain the first gas containing sulfur trioxide, sulfuric acid and hydrogen oxide. And then, the sulfur trioxide is absorbed by a sulfuric acid solution, thereby forming the high purity sulfuric acid.
    Type: Application
    Filed: February 12, 2018
    Publication date: June 14, 2018
    Inventors: Curtis Douglas DOVE, Goang-Cheng CHANG, Yuen-Ming KUNG, Hung-Wen CHAN, Wei-Hsuan HSU
  • Patent number: 9926198
    Abstract: A method for manufacturing high purity sulfuric acid is provided. A mixed solution subsequently undergoes a first preheating step, a second preheating step, a distilling step and an evaporating step to remove peroxide, water, oxygen and insoluble impurities, so as to obtain the first gas containing sulfur trioxide, sulfuric acid and hydrogen oxide. And then, the sulfur trioxide is absorbed by a sulfuric acid solution, thereby forming the high purity sulfuric acid.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: March 27, 2018
    Assignee: ASIA UNION ELECTRONIC CHEMICAL CORP.
    Inventors: Curtis Douglas Dove, Goang-Cheng Chang, Yuen-Ming Kung, Hung-Wen Chan, Wei-Hsuan Hsu
  • Publication number: 20140326593
    Abstract: A method for manufacturing high purity sulfuric acid is provided. A mixed solution subsequently undergoes a first preheating step, a second preheating step, a distilling step and an evaporating step to remove peroxide, water, oxygen and insoluble impurities, so as to obtain the first gas containing sulfur trioxide, sulfuric acid and hydrogen oxide. And then, the sulfur trioxide is absorbed by a sulfuric acid solution, thereby forming the high purity sulfuric acid.
    Type: Application
    Filed: April 30, 2014
    Publication date: November 6, 2014
    Applicant: ASIA UNION ELECTRONICAL CHEMICAL CORP.
    Inventors: Curtis Douglas DOVE, Goang-Cheng CHANG, Yuen-Ming KUNG, Hung-Wen CHAN, Wei-Hsuan HSU
  • Publication number: 20110157591
    Abstract: The monitoring apparatus for nano-transfer printing process is installed at a specific location in the surrounding of a transfer printing unit, and, during any stage of the transfer printing process, performs monitoring or measuring the filling height, filling rate and filling profile of the forming material inside the transfer printing unit. The monitoring apparatus includes a detection unit, a measuring unit and an analysis unit. The detection unit emits a detection ray to the transfer printing unit. The measuring unit receives a reaction signal of the detection ray passing through the transfer printing unit. The analysis unit analyzes the reaction signal to determine the filling height, the filling rate and filling profile of the forming material inside the transfer printing unit.
    Type: Application
    Filed: December 22, 2010
    Publication date: June 30, 2011
    Inventors: Hong Hocheng, Wei-Hsuan Hsu
  • Publication number: 20110134440
    Abstract: The monitoring apparatus for uniformity and residual thickness of nano-transfer printing process is installed at a specific location in the surrounding of a transfer printing unit, and, during any stage of the transfer printing process, performs monitoring or measuring the forming rate and forming profile of the forming material inside the transfer printing unit. The monitoring apparatus includes a detection unit, a measuring unit and an analysis unit. The detection unit emits a detection ray to the transfer printing unit. The measuring unit receives a reaction signal of the detection ray passing through the transfer printing unit. The analysis unit analyzes the reaction signal to determine transfer uniformity and the material residual thickness in the transfer print unit.
    Type: Application
    Filed: December 2, 2010
    Publication date: June 9, 2011
    Inventors: Hong Hocheng, Wei-Hsuan Hsu
  • Patent number: D359520
    Type: Grant
    Filed: January 24, 1994
    Date of Patent: June 20, 1995
    Assignee: Kwong Fei Expectation Electronic Co. Ltd.
    Inventor: Wei-Hsuan Hsu
  • Patent number: D369164
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: April 23, 1996
    Assignee: Kwong Fei Expectation Electronic Co Ltd
    Inventor: Wei-Hsuan Hsu
  • Patent number: D371173
    Type: Grant
    Filed: November 29, 1993
    Date of Patent: June 25, 1996
    Assignee: Kwong Fei Expectation Electronic Co. Ltd.
    Inventor: Wei-Hsuan Hsu
  • Patent number: D374259
    Type: Grant
    Filed: October 19, 1995
    Date of Patent: October 1, 1996
    Assignee: Kwong Fei Expectation Electronic Co., Ltd.
    Inventor: Wei-Hsuan Hsu
  • Patent number: D387805
    Type: Grant
    Filed: August 30, 1996
    Date of Patent: December 16, 1997
    Assignee: Kwong Fei Expectation Electronic Co., Ltd.
    Inventor: Wei-Hsuan Hsu