Patents by Inventor Wei-Jung Hsieh

Wei-Jung Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240210995
    Abstract: A display may have a stretchable portion with hermetically sealed rigid pixel islands. A flexible interconnect region may be interposed between the hermetically sealed rigid pixel islands. The hermetically sealed rigid pixel islands may include organic light-emitting diode (OLED) pixels. A conductive cutting structure may have an undercut that causes a discontinuity in a conductive OLED layer to mitigate lateral leakage. The conductive cutting structure may also be electrically connected to a cathode for the OLED pixels and provide a cathode voltage to the cathode. First and second inorganic passivation layers may be formed over the OLED pixels. Multiple discrete portions of an organic inkjet printed layer may be interposed between the first and second inorganic passivation layers.
    Type: Application
    Filed: October 10, 2023
    Publication date: June 27, 2024
    Inventors: Prashant Mandlik, Bhadrinarayana Lalgudi Visweswaran, Mahendra Chhabra, Chia-Hao Chang, Shiyi Liu, Siddharth Harikrishna Mohan, Zhen Zhang, Han-Chieh Chang, Yi Qiao, Yue Cui, Tyler R Kakuda, Michael Vosgueritchian, Sudirukkuge T. Jinasundera, Warren S Rieutort-Louis, Tsung-Ting Tsai, Jae Won Choi, Jiun-Jye Chang, Jean-Pierre S Guillou, Rui Liu, Po-Chun Yeh, Chieh Hung Yang, Ankit Mahajan, Takahide Ishii, Pei-Ling Lin, Pei Yin, Gwanwoo Park, Markus Einzinger, Martijn Kuik, Abhijeet S Bagal, Kyounghwan Kim, Jonathan H Beck, Chiang-Jen Hsiao, Chih-Hao Kung, Chih-Lei Chen, Chih-Yu Chung, Chuan-Jung Lin, Jung Yen Huang, Kuan-Chi Chen, Shinya Ono, Wei Jung Hsieh, Wei-Chieh Lin, Yi-Pu Chen, Yuan Ming Chiang, An-Di Sheu, Chi-Wei Chou, Chin-Fu Lee, Ko-Wei Chen, Kuan-Yi Lee, Weixin Li, Shin-Hung Yeh, Shyuan Yang, Themistoklis Afentakis, Asli Sirman, Baolin Tian, Han Liu
  • Patent number: 10557759
    Abstract: A sensor element including a first supporting layer, a second supporting layer, and a strain gauge is provided. The first supporting layer has a first supporting surface. The second support layer has a second supporting surface. The second supporting layer is connected to the first supporting layer. The Young's modulus of the first supporting layer is greater than the Young's modulus of the second supporting layer. The strain gauge has a sensing area. The sensing area covers at least a portion of the first supporting surface and at least a portion of the second supporting surface. Furthermore, an electronic device including the sensor element is provided.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: February 11, 2020
    Assignee: Au Optronics Corporation
    Inventor: Wei-Jung Hsieh
  • Publication number: 20180356304
    Abstract: A sensor element including a first supporting layer, a second supporting layer, and a strain gauge is provided. The first supporting layer has a first supporting surface. The second support layer has a second supporting surface. The second supporting layer is connected to the first supporting layer. The Young's modulus of the first supporting layer is greater than the Young's modulus of the second supporting layer. The strain gauge has a sensing area. The sensing area covers at least a portion of the first supporting surface and at least a portion of the second supporting surface. Furthermore, an electronic device including the sensor element is provided.
    Type: Application
    Filed: August 16, 2017
    Publication date: December 13, 2018
    Applicant: Au Optronics Corporation
    Inventor: Wei-Jung Hsieh
  • Patent number: 9219256
    Abstract: A handling device is used for handling a substrate. The handling device includes a holder, a moving element, at least one first adhesive chuck, and at least one second adhesive chuck. The moving element is located adjacent to the holder for moving relative to the holder along a first axial direction. The first adhesive chuck is located on a first surface of the holder and the second adhesive chuck is located on a first surface of the moving element, in which the first adhesive chuck and the second adhesive chuck are used to be respectively separated from the substrate adhered thereon. In addition, another embodiment of the invention discloses a handing method of the handing device.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: December 22, 2015
    Assignee: AU OPTRONICS CORP.
    Inventor: Wei-Jung Hsieh
  • Publication number: 20150295206
    Abstract: A handling device is used for handling a substrate. The handling device includes a holder, a moving element, at least one first adhesive chuck, and at least one second adhesive chuck. The moving element is located adjacent to the holder for moving relative to the holder along a first axial direction. The first adhesive chuck is located on a first surface of the holder and the second adhesive chuck is located on a first surface of the moving element, in which the first adhesive chuck and the second adhesive chuck are used to be respectively separated from the substrate adhered thereon. In addition, another embodiment of the invention discloses a handing method of the handing device.
    Type: Application
    Filed: August 11, 2014
    Publication date: October 15, 2015
    Inventor: WEI-JUNG HSIEH
  • Publication number: 20090110602
    Abstract: A fluid reactor having a thin film with two-dimensionally distributed micro-resistor units includes one flow way, separating ribs, a thin film which is thinner than 100 micrometer, and a catalytic layer. There are multiple micro-resistor units, which is thinner than 60 micrometer each, set on the thin film. A bi-directional control unit is disposed to control these multiple micro-resistor units to shift to a desired mode selected from detecting electrical resistance, voltage, current, temperature, flow speed, and/or heat-up functions at different time. It can be applied to different kinds of fuel cells with different flow-way patterns. Its micro-resistor units have bi-directional functions. It can detect flow speed at a desired location in the flow way. It would not influence its original flow field and structure. Plus, it is easy to be installed.
    Type: Application
    Filed: January 24, 2008
    Publication date: April 30, 2009
    Inventors: Chi-Yuan Lee, Shuo-Jen Lee, Chien-Heng Lin, Ren-De Huang, Wei-Jung Hsieh