Patents by Inventor Wei-Kai HO

Wei-Kai HO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150285973
    Abstract: A photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a compound (A) containing an ethylenically unsaturated group, an alkali-soluble resin (B), a photoinitiator (C), a pigment (D), and an organic solvent (E). The compound (A) containing an ethylenically unsaturated group includes a first compound (A-1) containing an ethylenically unsaturated group. The first compound (A-1) containing an ethylenically unsaturated group has two or more groups represented by formula (1) and does not have an aromatic skeleton. The photosensitive resin composition has the advantages of high precision pattern linearity and good alkali solution resistance.
    Type: Application
    Filed: March 26, 2015
    Publication date: October 8, 2015
    Inventors: Wei-Kai Ho, Jung-Pin Hsu
  • Patent number: 9062195
    Abstract: The present invention relates to a red photosensitive resin composition for a color filter and an application of the same. The red photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymerized compound (C), a cationic photo-initiator (D) and an organic solvent (E). The pigment (A) includes a first pigment (A-1), and the first pigment (A-1) is a brominated-diketo-pyrrolo-pyrrole pigment. The aforementioned red photosensitive resin composition is advantageously applied for the color filter with better brightness, contrast, temporal stability of sensitivity and development resistance.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: June 23, 2015
    Assignee: CHI MEI CORPORATION
    Inventor: Wei-Kai Ho
  • Publication number: 20140343185
    Abstract: The present invention relates to a red photosensitive resin composition for a color filter and an application of the same. The red photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a cationic polymerized compound (C), a cationic photo-initiator (D) and an organic solvent (E). The pigment (A) includes a first pigment (A-1), and the first pigment (A-1) is a brominated-diketo-pyrrolo-pyrrole pigment. The aforementioned red photosensitive resin composition is advantageously applied for the color filter with better brightness, contrast, temporal stability of sensitivity and development to resistance.
    Type: Application
    Filed: May 6, 2014
    Publication date: November 20, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: Wei-Kai HO