Abstract: Embodiments of the invention include a unidirectional exhalation valve for a respiratory device such as a facemask. The valve opens to vent air out of the interior of the facemask and closes to prevent the inflow of ambient air. The valve is comprised of a valve body, a valve cover and a membrane. The membrane is secured to the valve body around its perimeter by the valve cover. The membrane is comprised of two or more flaps that flex toward a central region, in a direction away from the valve body, to open the unidirectional valve.

Abstract: Discloses a respiratory device comprising a mask positioned around the mouth and nose of a wearer to form a relative closed area sealed from the ambient air, at least one unidirectional valve for mounting of an active venting system, installed onto the mask for exhausting warm, moist exhaled air from the interior space of the respirators and at least one active venting system attached onto the valve and operated during the exhalation cycle. The top housing of the unidirectional valve has an attachment member for attaching the active venting system onto it. The active venting system can be attachable or detachable onto the valve. The valve attached with active venting system together effectively and quickly exchanges the air from the interior of the mask during exhalation cycle. When the AVS is not attached onto the valve, a simple valve cap can be attached on instead, for aesthetic purposes.

Abstract: Discloses a respiratory device comprising a mask positioned around the mouth and nose of a wearer to form a relative closed area sealed from the ambient air, at least one unidirectional valve for mounting of an active venting system, installed onto the mask for exhausting warm, moist exhaled air from the interior space of the respirators and at least one active venting system attached onto the valve and operated during the exhalation cycle. The top housing of the unidirectional valve has an attachment member for attaching the active venting system onto it. The active venting system can be attachable or detachable onto the valve. The valve attached with active venting system together effectively and quickly exchanges the air from the interior of the mask during exhalation cycle. When the AVS is not attached onto the valve, a simple valve cap can be attached on instead, for aesthetic purposes.

Abstract: A variable gain amplifier circuit has an amplifier, a string of resistors, a plurality of gain switches, a current source, and at least two current switches. A first input terminal of the amplifier receives an input voltage signal. The string of resistors are coupled between an output terminal of the amplifier and a bias voltage input terminal. Each of the gain switches is coupled between a second input terminal of the amplifier and one of connection nodes between two of the resistors. Each of the current switches is coupled between the current source and one of the connection nodes. The current source provides a current through the turned-on current switch.

Abstract: The present invention relates to a bladder of floating-assistant vest in which a chest bladder and a back bladder are provided and fit with the ergonomic of human being's shoulder; the waterproof fabric blanks are tailored so a W-shaped sheet member composed by the two tailored waterproof fabric blanks is formed, the top end of the concave collar located at the center of the sheet member is provided with a rear sheet, the two ends of the rear sheet are respectively provided with a front sheet that downwardly and tiltingly extends, and a connecting sheet is upwardly and tiltingly extended from each bottom end of the front sheets, then the edge of the W-shaped sheet members is sealed so a hollow bladder member is formed; the shoulder portions of the two ends of the collar are tilted with an angle by the two front sheets closing to each other.

Abstract: A variable gain amplifier circuit has a variable gain amplifier (VGA), a string of resistors, a plurality of gain switches, a current source, and at least two current switches. A first input terminal of the VGA receives an input voltage signal. The string of resistors are coupled between an output terminal of the VGA and a bias voltage input terminal. Each of the gain switches is coupled between a second input terminal of the VGA and one of connection nodes between two of the resistors. Each of the current switches is coupled between the current source and one of the connection nodes. The current source provides a current through the turned-on current switch.

Abstract: An operative method of a manufacturing system for processing a substrate is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.

Abstract: An analog level shifter is provided, receiving an input voltage to generate an output voltage. In the analog level shifter, a NMOS transistor has a gate coupled to an input node where the input voltage is input. A resistance device comprises a first end coupled to source of the NMOS transistor, and a second end coupled to an output node where the output voltage is output. A current source is coupled to the output node, sinking a first current therefrom to ground.

Abstract: A manufacturing system is provided. The manufacturing system includes at least a handling system, two deposition apparatus groups, an etching apparatus group, a photolithography apparatus group and two photoresist-striping apparatus groups. The handling system has a plurality of handling paths comprising at least two connected ring paths, which are connected in a common path. These deposition apparatus groups and the photoresist-striping apparatus groups are located on the two ring paths respectively. The etching apparatus group is located on the common path. The photolithography apparatus group is located on the two ring paths between the two deposition apparatus groups. The manufacturing system of the present invention thus combines the advantages of the group-type manufacturing system and the continuous-type manufacturing system.