Patents by Inventor Wei-Liang Yang

Wei-Liang Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11916077
    Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.
    Type: Grant
    Filed: May 24, 2021
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chih-Liang Chen, Cheng-Chi Chuang, Chih-Ming Lai, Chia-Tien Wu, Charles Chew-Yuen Young, Hui-Ting Yang, Jiann-Tyng Tzeng, Ru-Gun Liu, Wei-Cheng Lin, Lei-Chun Chou, Wei-An Lai
  • Patent number: 8088266
    Abstract: An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: January 3, 2012
    Assignee: Asia Union Electronic Chemical Corporation
    Inventors: Curtis Douglas Dove, Goang Cheng Chang, Wei-Liang Yang
  • Publication number: 20100213077
    Abstract: An electrodialysis method for the treatment of silicate-containing potassium hydroxide etching waste solution is provided. The method comprises: providing a reaction tank including a cathode, an anode, and two cation dialysis membranes, wherein the reaction tank is divided by the cation dialysis membranes into a cathode chamber, an anode chamber and a waste solution disposing chamber located therebetween; filling a sulfuric acid solution into the anode chamber; filling a potassium hydroxide solution into the cathode chamber; introducing a silicate-containing potassium hydroxide etching waste solution into the waste solution disposing chamber; and applying a voltage and a current density to each of the chambers to render potassium ions to transport from the waste solution chamber through the cation dialysis membrane to the cathode chamber.
    Type: Application
    Filed: February 20, 2009
    Publication date: August 26, 2010
    Inventors: CURTIS DOUGLAS DOVE, Goang Cheng Chang, Wei-Liang Yang
  • Patent number: 7541095
    Abstract: The disclosed invention relates to black multi-layer coatings for metallic substrates (1) or substrates having a metallic coating (2) and to articles covered, or partially covered with such coatings. The black coating consists of a black first layer (3) substantially comprised of nickel and a second polymeric silicate inorganic layer (4). The present invention may additionally have a third layer comprised substantially of organic constituents (5). This invention offers properties currently unavailable or insufficient in existing technologies. The present invention provides enhanced corrosion resistant, adherent black coatings which are thin enough to allow application to fasteners while providing a uniform black color, the combination of which have only been available previously with the use of hexavalent or trivalent chromium conversion coatings.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: June 2, 2009
    Assignees: Elisha Holding LLC, Kismart Corporation
    Inventors: Wan-Chu Wu, Wei-Liang Yang, Wen-Chi Chang
  • Publication number: 20080102297
    Abstract: The disclosed invention relates to black multi-layer coatings for metallic substrates (1) or substrates having a metallic coating (2) and to articles covered, or partially covered with such coatings. The black coating consists of a black first layer (3) substantially comprised of nickel and a second polymeric silicate inorganic layer (4). The present invention may additionally have a third layer comprised substantially of organic constituents (5). This invention offers properties currently unavailable or insufficient in existing technologies. The present invention provides enhanced corrosion resistant, adherent black coatings which are thin enough to allow application to fasteners while providing a uniform black color, the combination of which have only been available previously with the use of hexavalent or trivalent chromium conversion coatings.
    Type: Application
    Filed: October 26, 2007
    Publication date: May 1, 2008
    Applicants: ELISHA HOLDING LLC, KISMART CORPORATION
    Inventors: Wan-Chu Wu, Wei-Liang Yang, Wen-Chi Chang