Patents by Inventor WEI-REN YOU

WEI-REN YOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11268187
    Abstract: Disclosed are a porous aluminum macroscopic body, a fabrication system, and a method therefor, where the porous aluminum macroscopic body is a three-dimensional full-through-hole structure formed by connecting hollow aluminum wires, and the wall thickness of the hollow aluminum wires is 7-100 micrometers. The fabrication system comprises a magnetron sputtering subsystem, a high-temperature aluminum vapor subsystem, a low-temperature aluminum deposition subsystem, an aluminum vapor recovery subsystem, and a porous polymer film conveying subsystem. A preparation method therefor comprises first utilizing a magnetron sputtering method to rapidly sputter on a porous polymer film to form an aluminum layer that has a thickness of 1-500 nm, and then continuing to deposit the aluminum layer to a thickness of 7-100 micrometers while decomposing the polymer film in-situ so as to obtain the porous aluminum macroscopic body.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: March 8, 2022
    Assignees: JIANGSU ZHONGTIAN TECHNOLOGY CO., LTD., ZHONGTIAN SUPERCAPACITOR TECHNOLOGY CO., LTD., Tsinghua University
    Inventors: Wei-Zhong Qian, Ji-Ping Xue, Zhou-Fei Yang, Wei-Ren You, Ying Jin, Sun-Wang Gu
  • Publication number: 20200299827
    Abstract: Disclosed are a porous aluminum macroscopic body, a fabrication system, and a method therefor, where the porous aluminum macroscopic body is a three-dimensional full-through-hole structure formed by connecting hollow aluminum wires, and the wall thickness of the hollow aluminum wires is 7-100 micrometers. The fabrication system comprises a magnetron sputtering subsystem, a high-temperature aluminum vapor subsystem, a low-temperature aluminum deposition subsystem, an aluminum vapor recovery subsystem, and a porous polymer film conveying subsystem. A preparation method therefor comprises first utilizing a magnetron sputtering method to rapidly sputter on a porous polymer film to form an aluminum layer that has a thickness of 1-500 nm, and then continuing to deposit the aluminum layer to a thickness of 7-100 micrometers while decomposing the polymer film in-situ so as to obtain the porous aluminum macroscopic body.
    Type: Application
    Filed: June 5, 2020
    Publication date: September 24, 2020
    Inventors: WEI-ZHONG QIAN, JI-PING XUE, ZHOU-FEI YANG, WEI-REN YOU, YING JIN, SUN-WANG GU