Patents by Inventor Wei-Te LI

Wei-Te LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11937266
    Abstract: A method and apparatus are disclosed. In an example from the perspective of a first device, a grant is received from a network node. The grant allocates a set of sidelink data resources. One or more sidelink data transmissions are performed on the set of sidelink data resources. A second feedback information associated with the one or more sidelink data transmissions is received and/or detected. An uplink resource is derived. A first feedback information is transmitted on the uplink resource to the network node. The first feedback information is set based upon the second feedback information.
    Type: Grant
    Filed: October 17, 2022
    Date of Patent: March 19, 2024
    Assignee: ASUSTek Computer Inc.
    Inventors: Ming-Che Li, Li-Chih Tseng, Wei-Yu Chen, Li-Te Pan
  • Publication number: 20230274906
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: September 1, 2022
    Publication date: August 31, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
  • Patent number: 11469076
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: October 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Gerardus Maria Johannes Massen, Joost Jeroen Ottens, Long Ma, Youfei Jiang, Weihua Yin, Wei-Te Li, Xuedong Liu
  • Publication number: 20210217582
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: June 7, 2019
    Publication date: July 15, 2021
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU