Patents by Inventor Wei-tien Huang

Wei-tien Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955338
    Abstract: A method includes providing a substrate having a surface such that a first hard mask layer is formed over the surface and a second hard mask layer is formed over the first hard mask layer, forming a first pattern in the second hard mask layer, where the first pattern includes a first mandrel oriented lengthwise in a first direction and a second mandrel oriented lengthwise in a second direction different from the first direction, and where the first mandrel has a top surface, a first sidewall, and a second sidewall opposite to the first sidewall, and depositing a material towards the first mandrel and the second mandrel such that a layer of the material is formed on the top surface and the first sidewall but not the second sidewall of the first mandrel.
    Type: Grant
    Filed: January 30, 2023
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang, Yung-Sung Yen, Ru-Gun Liu, Chin-Hsiang Lin, Yu-Tien Shen
  • Patent number: 6306284
    Abstract: An apparatus and a method for determining concentration of fluorine ions in aqueous solutions are provided. In the apparatus, a pH sensor is provided for sensing a pH value of an aqueous solution to be determined. A pH controller is then used to compare the pH value determined with stored pH data to determine whether the aqueous solution is acidic or alkalinic. An acid dispenser or a base dispenser is then used to dispense either an acid or a base into the pH adjustment tank for adjusting the pH value of the aqueous solution to within a desirable range. For instance, for the detection of fluorine ions, a suitable pH range is between about 4 and about 10. After the pH value is stabilized in the aqueous solution, a fluorine ion sensor may be used to sense the fluorine ion concentration in the aqueous solution. A common acid and base which may be used to bring the pH value within the desirable range may be H2SO4 and NaOH.
    Type: Grant
    Filed: February 3, 1999
    Date of Patent: October 23, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Feng-Yi Yang, Wei-tien Huang