Abstract: A lid attach process includes dipping a periphery of a lid in a dipping tank of adhesive material such that the adhesive material attaches to the periphery of the lid. The lid attach process further includes positioning the lid over a die attached to a substrate using a lid carrier, wherein the periphery of the lid is aligned with a periphery of the lid carrier. The lid attach process further includes attaching the lid to the substrate with the adhesive material forming an interface with the substrate. The lid attach process further includes contacting a thermal interface material (TIM) on the die with the lid.

Abstract: A photographing lens assembly includes, in order from an object side to an image side: a first, a second, a third, a fourth, a fifth and a sixth lens elements. The first lens element with negative refractive power has an object-side surface being concave in a paraxial region thereof, wherein the object-side surface has at least one convex critical point in an off-axis region thereof. The third lens element has an image-side surface being convex in a paraxial region thereof. The fourth lens element has positive refractive power. The fifth lens element with negative refractive power has an object-side surface being concave in a paraxial region thereof, and an image-side surface being convex in a paraxial region thereof. The sixth lens element has an image-side surface being concave in a paraxial region thereof, wherein the image-side surface has at least one convex critical point in an off-axis region thereof.

Abstract: A method for determining parameters of nanostructures, wherein the method includes steps as follows: Firstly, an X-ray reflection intensity measurement curve of a nanostructure to be tested is obtained by radiating the nanostructure to be tested with X-ray. The X-ray reflection intensity measurement curve is compared with an X-ray reflection intensity standard curve to obtain a comparison result. Subsequently, at least one parameter existing in the nanostructure to be tested is determined according to the comparison result.

Abstract: This disclosure relates to an X-ray reflectometry apparatus and a method for measuring a three-dimensional nanostructure on a flat substrate. The X-ray reflectometry apparatus comprises an X-ray source, an X-ray reflector, a 2-dimensional X-ray detector, and a two-axis moving device. The X-ray source is for emitting X-ray. The X-ray reflector is configured for reflecting the X-ray onto a sample surface. The 2-dimensional X-ray detector is configured to collect a reflecting X-ray signal from the sample surface. The two-axis moving device is configured to control two-axis directions of the 2-dimensional X-ray detector to move on at least one of x-axis and z-axis with a formula concerning an incident angle of the X-ray with respect to the sample surface for collecting the reflecting X-ray signal.

Abstract: A high-throughput automated preprocessing method and a system are applied to a nucleic acid preprocessing apparatus including a control system, a sample transfer area, a nucleic acid extraction area, and a reagent setup area. The control system includes a user interface and guides a user to set up on the user interface. In the sample transfer area, the method includes steps of: a user selecting a sampling tube type, a test protocol and an extraction protocol on the user interface, and the control system performing a sample transfer task. In the nucleic acid extraction area, the method includes steps of: the control system performing a nucleic acid extraction task based on the selected extraction protocol. In the reagent setup area, the method includes steps of: the control system performing a reagent deployment task based on the selected test protocol, and the control system performing a nucleic acid transfer task.

Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.

Abstract: The present disclosure is directed to an in situ closed-loop radio frequency (RF) power management on RF processes such as a plasma etch process, a plasma chemical vapor deposition process, a plasma physical vapor deposition process, a plasma clean process, or the like. An RF power measurement device according to one or more embodiments of the present disclosure assists the in situ closed-loop RF power management on RF processes. In some embodiments, the RF power measurement device includes a coil-shaped current sensor that is wound around the path between an RF generator and a chamber. The coil-shaped current sensor senses the current flowing through this path so that the power of the RF generator may be calibrated without having to separate the RF generator for separate analysis and calibration. The RF power measurement device allows management of RF power in an in situ closed-loop manner.

Abstract: The present disclosure describes an apparatus with a local interconnect structure. The apparatus can include a first transistor, a second transistor, a first interconnect structure, a second interconnect structure, and a third interconnect structure. The local interconnect structure can be coupled to gate terminals of the first and second transistors and routed at a same interconnect level as reference metal lines coupled to ground and a power supply voltage. The first interconnect structure can be coupled to a source/drain terminal of the first transistor and routed above the local interconnect structure. The second interconnect structure can be coupled to a source/drain terminal of the second transistor and routed above the local interconnect structure. The third interconnect structure can be routed above the local interconnect structure and at a same interconnect level as the first and second interconnect structures.

Abstract: A freehub of a bicycle contains: a body fitted and rotating on a rotary shaft. A receiving sleeve is connected with the body and fitted on the rotary shaft, and the receiving sleeve includes an accommodation holder configured to accommodate a freewheel. A ratchet assembly is mounted between the body and the receiving sleeve, the ratchet assembly includes multiple chutes, and a central axis of a respective chute is not parallel to a central axis of the rotary shaft. A toothed ring is fitted between the fixing element and the body. The ratchet assembly includes multiple teeth, multiple engagement elements, and multiple resilient elements. A respective resilient element abuts against the respective chute and a respective engagement element, such that the respective engagement element is urged by the respective resilient element to linearly move toward the respective tooth so as to engage with the respective tooth.

Abstract: A quick-release includes axle having a head and an outer threaded end formed to two ends thereof. The axle is threadedly connected to the chain stay of a bicycle. The axle includes a passage defined axially therethrough. A groove is formed radially through the head, and two recesses are respectively formed in two insides of the groove. A knob is fitted in the groove of the head. A rod is movably located in the passage and has an engaging end which is connected to the knob. A ball is formed to the rod. A non-circular hole is formed in the ball. When the rod is pulled and the ball is rotatably engaged with the two recesses, the rod is pivoted and partially engaged with the groove so as to rotate the axle to esparto the wheels from the chain stay.

Abstract: The present disclosure is directed to an in situ closed-loop radio frequency (RF) power management on RF processes such as a plasma etch process, a plasma chemical vapor deposition process, a plasma physical vapor deposition process, a plasma clean process, or the like. An RF power measurement device according to one or more embodiments of the present disclosure assists the in situ closed-loop RF power management on RF processes. In some embodiments, the RF power measurement device includes a coil-shaped current sensor that is wound around the path between an RF generator and a chamber. The coil-shaped current sensor senses the current flowing through this path so that the power of the RF generator may be calibrated without having to separate the RF generator for separate analysis and calibration. The RF power measurement device allows management of RF power in an in situ closed-loop manner.

Abstract: The present disclosure is directed to an in situ closed-loop radio frequency (RF) power management on RF processes such as a plasma etch process, a plasma chemical vapor deposition process, a plasma physical vapor deposition process, a plasma clean process, or the like. An RF power measurement device according to one or more embodiments of the present disclosure assists the in situ closed-loop RF power management on RF processes. In some embodiments, the RF power measurement device includes a coil-shaped current sensor that is wound around the path between an RF generator and a chamber. The coil-shaped current sensor senses the current flowing through this path so that the power of the RF generator may be calibrated without having to separate the RF generator for separate analysis and calibration. The RF power measurement device allows management of RF power in an in situ closed-loop manner.

Abstract: A freehub of a bicycle contains: a body fitted and rotating on a rotary shaft. A receiving sleeve is connected with the body and fitted on the rotary shaft, and the receiving sleeve includes an accommodation holder configured to accommodate a freewheel. A ratchet assembly is mounted between the body and the receiving sleeve, the ratchet assembly includes multiple chutes, and a central axis of a respective chute is not parallel to a central axis of the rotary shaft. A toothed ring is fitted between the fixing element and the body. The ratchet assembly includes multiple teeth, multiple engagement elements, and multiple resilient elements. A respective resilient element abuts against the respective chute and a respective engagement element, such that the respective engagement element is urged by the respective resilient element to linearly move toward the respective tooth so as to engage with the respective tooth.

Abstract: The present disclosure discloses a goggle device and a spectacle frame thereof. The spectacle frame includes a buckling structure arranged on an end portion thereof. The buckling structure has an accommodating space and an entrance in spatial communication with the accommodating space. The buckling structure includes a cantilever arranged in the accommodating space and a retaining wall that is arranged in the accommodating space and is spaced apart from the cantilever. A free end portion of the cantilever is arranged adjacent to the entrance, and the cantilever is rotatable between a lock position and an unlock position. When the cantilever is at the lock position, the free end portion shields the entrance. When the cantilever is rotated to the unlock position by an external force, the free end portion does not shield the entrance, and the cantilever is deformed to store an elastic force.

Abstract: A snow goggle device includes a spectacle frame, two pivoting members movably connected to the spectacle frame, and a curved lens pivotally connected to the two pivoting members. Each pivoting member is cooperated with the spectacle frame to form with a first segment movable along a straight path and a second segment movable along an arced path, and includes a third segment synchronously movable with the first segment and the second segment. When the first and the second segments of each pivoting member are synchronously moved, the third segments drive the curved lens to move with respect to the spectacle frame between a closed position and an open position, synchronously causing a deformation of the curved lens. When the curved lens is at the closed position or the open position, the curved lens receives a stress that is smaller than a stress generated from the deformation.

Abstract: A buckling module of a goggle device includes a buckling structure, a flexible belt body and an inserting member fixed on the belt body. The buckling structure has an accommodating space and an entrance in spatial communication with the accommodating space. The buckling structure includes a front positioning portion and a rear positioning portion both arranged at two opposite sides of the entrance. When a front end portion of the inserting member is inserted into the accommodating space by passing through the entrance, the front end portion moves toward an inner surface of the front positioning portion, and a first portion of the belt body adjacent to the front end portion is resiliently squeezed by the front positioning portion, so that the squeezed portion of the belt body drives a rear end portion of the inserting member to move toward an inner surface of the rear positioning portion.

Abstract: A buckling module of a goggle device includes a buckling structure, a flexible belt body and an inserting member fixed on the belt body. The buckling structure has an accommodating space and an entrance in spatial communication with the accommodating space. The buckling structure includes a front positioning portion and a rear positioning portion both arranged at two opposite sides of the entrance. When a front end portion of the inserting member is inserted into the accommodating space by passing through the entrance, the front end portion moves toward an inner surface of the front positioning portion, and a first portion of the belt body adjacent to the front end portion is resiliently squeezed by the front positioning portion, so that the squeezed portion of the belt body drives a rear end portion of the inserting member to move toward an inner surface of the rear positioning portion.

Abstract: The present disclosure discloses a goggle device and a spectacle frame thereof. The spectacle frame includes a buckling structure arranged on an end portion thereof. The buckling structure has an accommodating space and an entrance in spatial communication with the accommodating space. The buckling structure includes a cantilever arranged in the accommodating space and a retaining wall that is arranged in the accommodating space and is spaced apart from the cantilever. A free end portion of the cantilever is arranged adjacent to the entrance, and the cantilever is rotatable between a lock position and an unlock position. When the cantilever is at the lock position, the free end portion shields the entrance. When the cantilever is rotated to the unlock position by an external force, the free end portion does not shield the entrance, and the cantilever is deformed to store an elastic force.

Abstract: A snow goggle device includes a spectacle frame, two pivoting members movably connected to the spectacle frame, and a curved lens pivotally connected to the two pivoting members. Each pivoting member is cooperated with the spectacle frame to form with a first segment movable along a straight path and a second segment movable along an arced path, and includes a third segment synchronously movable with the first segment and the second segment. When the first and the second segments of each pivoting member are synchronously moved, the third segments drive the curved lens to move with respect to the spectacle frame between a closed position and an open position, synchronously causing a deformation of the curved lens. When the curved lens is at the closed position or the open position, the curved lens receives a stress that is smaller than a stress generated from the deformation.

Abstract: A hinge structure includes a first base, a second base, a first linking rod, a second linking rod, and a torque assembly. The first linking rod has a first pivot part, a first sliding part, and a second pivot part. The first pivot part is pivoted to the first base, and the first sliding part is slidably connected to the second base. The second linking rod has a second sliding part, a shaft part, a third pivot part, and a fourth pivot part. The second sliding part is slidably connected to the first base. The third pivot part is pivoted to the second base. The second pivot part is pivoted to the fourth pivot part. The torque assembly has a sleeve part sleeved on the shaft part and a connection part connected to the second base. The sleeve part generates torque during rotation with respect to the shaft part.