Patents by Inventor WEI-TSE CHANG

WEI-TSE CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11309159
    Abstract: The present invention discloses a structure of an emitter electrode for enhancing ion currents, including a tip end part and a shank part. The tip end part has a pinpoint, a first diameter, and a radius of curvature. A length of the tip end part with the shank part is from the pinpoint to a first position of the shank part and a distance between the first position and the pinpoint is 300 times the first diameter. The radius of curvature of the tip end part ranges from 50 nanometers to 5 micrometers. The first diameter is 2 times the radius of curvature.
    Type: Grant
    Filed: August 23, 2021
    Date of Patent: April 19, 2022
    Assignee: ALES TECH INC.
    Inventors: Wei-Chaio Lai, Chun-Yueh Lin, Ing-Shouh Hwang, Wei-Tse Chang, Ching-Yu Hsiao, Yu-Fong Yu, Zong-Yu Yang
  • Publication number: 20220068583
    Abstract: The present invention discloses a structure of an emitter electrode for enhancing ion currents, including a tip end part and a shank part. The tip end part has a pinpoint, a first diameter, and a radius of curvature. A length of the tip end part with the shank part is from the pinpoint to a first position of the shank part and a distance between the first position and the pinpoint is 300 times the first diameter. The radius of curvature of the tip end part ranges from 50 nanometers to 5 micrometers. The first diameter is 2 times the radius of curvature.
    Type: Application
    Filed: August 23, 2021
    Publication date: March 3, 2022
    Inventors: Wei-Chaio Lai, Chun-Yueh Lin, Ing-Shouh Hwang, Wei-Tse Chang, Ching-Yu Hsiao, Yu-Fong Yu, Zong-Yu Yang
  • Patent number: 8966661
    Abstract: Disclosed is a method for fabricating a nanoscale probe. A first conductor and a second conductor are immersed into an electrolyte contained in an electrolytic tank. The first conductor and the second conductor are connected to a power source respectively. An electrolytic reaction is established when an electrical circuit is established between the first conductor and the second conductor. The second conductor is configured to output electrons. The first conductor is configured to receive electrons. Therefore, the first conductor is etched when the electrical circuit is established between the first conductor and the second conductor. A necking portion is created at the first conductor approximately near the surface of the electrolyte. A nanoscale probe is fabricated when first conductor breaks at the necking portion.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: February 24, 2015
    Assignee: Academia Sinica
    Inventors: Wei-Tse Chang, Ing-Shouh Hwang
  • Publication number: 20140033374
    Abstract: Disclosed is a method for fabricating a nanoscale probe. A first conductor and a second conductor are immersed into an electrolyte contained in an electrolytic tank. The first conductor and the second conductor are connected to a power source respectively. An electrolytic reaction is established when an electrical circuit is established between the first conductor and the second conductor. The second conductor is configured to output electrons. The first conductor is configured to receive electrons. Therefore, the first conductor is etched when the electrical circuit is established between the first conductor and the second conductor. A necking portion is created at the first conductor approximately near the surface of the electrolyte. A nanoscale probe is fabricated when first conductor breaks at the necking portion.
    Type: Application
    Filed: July 23, 2013
    Publication date: January 30, 2014
    Applicant: ACADEMIA SINICA
    Inventors: WEI-TSE CHANG, ING-SHOUH HWANG