Patents by Inventor Wei-Tuzo LIN

Wei-Tuzo LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for cleaning wafer and scrubber
    Patent number: 10522369
    Abstract: A method of cleaning a wafer in semiconductor fabrication is provided. The method includes cleaning a wafer using a wafer scrubber. The method further includes moving the wafer scrubber into an agitated cleaning fluid. The method also includes creating a contact between the wafer scrubber and a cleaning stage in the agitated cleaning fluid. In addition, the method includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning fluid.
    Type: Grant
    Filed: February 26, 2015
    Date of Patent: December 31, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chien-Chun Hu, Chen-Liang Chang, Ju-Ru Hsieh, Po-Chia Chen, Shun-Yu Chuang, Wei-Tuzo Lin
  • METHOD AND SYSTEM FOR CLEANING WAFER AND SCRUBBER
    Publication number: 20160254170
    Abstract: A method of cleaning a wafer in semiconductor fabrication is provided. The method includes cleaning a wafer using a wafer scrubber. The method further includes moving the wafer scrubber into an agitated cleaning fluid. The method also includes creating a contact between the wafer scrubber and a cleaning stage in the agitated cleaning fluid. In addition, the method includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning fluid.
    Type: Application
    Filed: February 26, 2015
    Publication date: September 1, 2016
    Inventors: Chien-Chun HU, Chen-Liang CHANG, Ju-Ru HSIEH, Po-Chia CHEN, Shun-Yu CHUANG, Wei-Tuzo LIN