Abstract: Some implementations described herein provide a semiconductor device and methods of formation. The semiconductor device includes a gate-all-around transistor having one or more dielectric regions that include or more dielectric gases. The dielectric regions may include a first dielectric region between epitaxial regions (e.g., source/drain regions) and a first portion of a gate structure of the gate-all-around transistor. The dielectric regions may further include a second dielectric region between a contact structure of gate-all-around transistor and a second portion of the gate structure. By including the dielectric regions in the gate-all-around transistor, a parasitic capacitance associated with the gate-all-around transistor may be reduced relative to another gate-all-around transistor not including the dielectric regions.

Abstract: An integrated circuit (IC) structure includes a gate structure, a source epitaxial structure, a drain epitaxial structure, a front-side interconnection structure, a backside dielectric layer, and a backside via. The source epitaxial structure and the drain epitaxial structure are respectively on opposite sides of the gate structure. The front-side interconnection structure is on a front-side of the source epitaxial structure and a front-side of the drain epitaxial structure. The backside dielectric layer is on a backside of the source epitaxial structure and a backside of the drain epitaxial structure and has an air gap therein. The backside via extends through the backside dielectric layer to a first one of the source epitaxial structure and the drain epitaxial structure.

Abstract: An electronic device has a narrow viewing angle state and a wide viewing angle state, and includes a panel and a light source providing a light passing through the panel. In the narrow viewing angle state, the light has a first relative light intensity and a second relative light intensity. The first relative light intensity is the strongest light intensity, the second relative light intensity is 50% of the strongest light intensity, the first relative light intensity corresponds to an angle of 0°, the second relative light intensity corresponds to a half-value angle, and the half-value angle is between ?15° and 15°. In the narrow angle state, a third relative light intensity at each angle between 20° and 60° or each angle between ?20° and ?60° is lower than 20% of the strongest light intensity.

Abstract: An immersion cooling system is provided. It includes a pressure seal tank, an electronic module, a blower, and a distributor plate. The pressure seal tank contains a cooling liquid, and a gas outlet is disposed on the top or a sidewall of the pressure seal tank, a gas inlet is disposed on the bottom of the pressure seal tank. The gas outlet is higher than the liquid level of the cooling liquid. The electronic module is disposed in the pressure seal tank and immersed in the cooling liquid. The blower is communicated with the pressure seal tank and configured to extract the gas from the gas outlet and inject the gas into the pressure seal tank via the gas inlet. The distributor plate is disposed in the pressure seal tank and located between the electronic module and the gas inlet.

Abstract: A method includes providing a fin extending from a substrate, the fin including a plurality of semiconductor channel layers, and where a gate is disposed over the fin. A first spacer layer is deposited over the gate and over the fin in a source/drain region. The first spacer layer has a first etch rate. A second spacer layer is deposited over the first spacer layer. The second spacer layer has a second etch rate less than the first etch rate. The plurality of semiconductor channel layers are removed from the source/drain region to form a trench having a funnel shape. After forming the trench, inner spacers are formed along a sidewall surface of the trench. In various embodiments, lateral sidewall surfaces of each semiconductor channel layer of the plurality of semiconductor channel layers is substantially free of an inner spacer material.

Abstract: Semiconductor structures and methods for manufacturing the same are provided. The semiconductor structure includes a first channel member suspended over a substrate and a second channel member suspended over the first channel member and spaced apart from the first channel member along a first direction. The semiconductor structure also includes a gate structure wrapping around the first channel member and the second channel member and a dielectric structure encircled by the first channel member, the second channel member, the gate structure, and the source/drain structure. In addition, the dielectric structure includes a porous material or an air gap. The semiconductor structure also includes a first epitaxial layer attached to the first channel member, and the first epitaxial layer has a first extending portion protruding from a bottom surface of the first channel member along the first direction and extending into the dielectric structure.

Abstract: Semiconductor structures and methods of forming the same are provided. In an embodiment, an exemplary semiconductor structure includes a vertical stack of channel members disposed over a substrate, a gate structure wrapping around each channel member of the vertical stack of channel members, a source/drain feature coupled to the vertical stack of channel members and adjacent the gate structure; and a dielectric feature disposed between the source/drain feature and the substrate, in a cross-sectional view, the dielectric feature includes a V-shape sidewall surface.

Abstract: An integrated circuit (IC) structure includes a gate structure, a source epitaxial structure, a drain epitaxial structure, a front-side interconnection structure, a backside dielectric layer, and a backside via. The source epitaxial structure and the drain epitaxial structure are respectively on opposite sides of the gate structure. The front-side interconnection structure is on a front-side of the source epitaxial structure and a front-side of the drain epitaxial structure. The backside dielectric layer is on a backside of the source epitaxial structure and a backside of the drain epitaxial structure and has an air gap therein. The backside via extends through the backside dielectric layer to a first one of the source epitaxial structure and the drain epitaxial structure.

Abstract: A creased sticky note with a sticky body, an adhesive layer and at least one crease is provided. The sticky body has an adhesion portion and a flexible portion disposed adjacent to the adhesion portion. The adhesive layer is disposed on the adhesion portion. The at least one crease is disposed on the adhesion portion, or is disposed between the adhesion portion and the flexible portion, or is disposed on a stress hinders area of the flexible portion which is near the adhesion portion.

Abstract: A creased sticky note with a sticky body, an adhesive layer and at least one crease is provided. The sticky body has an adhesion portion and a flexible portion disposed adjacent to the adhesion portion. The adhesive layer is disposed on the adhesion portion. The at least one crease is disposed on the adhesion portion, or is disposed between the adhesion portion and the flexible portion, or is disposed on a stress hinders area of the flexible portion which is near the adhesion portion.