Abstract: Exemplary subpixel structures include a directional light-emitting diode structure characterized by a full-width-half-maximum (FWHM) of emitted light having a divergence angle of less than or about 10°. The subpixel structure further includes a lens positioned a first distance from the light-emitting diode structure, where the lens is shaped to focus the emitted light from the light-emitting diode structure. The subpixel structure still further includes a patterned light absorption barrier positioned a second distance from the lens. The patterned light absorption barrier defines an opening in the barrier, and the focal point of the light focused by the lens is positioned within the opening. The subpixels structures may be incorporated into a pixel structure, and pixel structures may be incorporated into a display that is free of a polarizer layer.

Abstract: The present disclosure is generally related to 3D imaging capable OLED displays. A light field display comprises an array of 3D light field pixels, each of which comprises an array of corrugated OLED pixels, a metasurface layer disposed adjacent to the array of 3D light field pixels, and a plurality of median layers disposed between the metasurface layer and the corrugated OLED pixels. Each of the corrugated OLED pixels comprises primary or non-primary color subpixels, and produces a different view of an image through the median layers to the metasurface to form a 3D image. The corrugated OLED pixels combined with a cavity effect reduce a divergence of emitted light to enable effective beam direction manipulation by the metasurface. The metasurface having a higher refractive index and a smaller filling factor enables the deflection and direction of the emitted light from the corrugated OLED pixels to be well controlled.

Abstract: A foot sensor and analysis device, which includes a pressure sensing layer arranged inside the insole and a sensing module installed inside the insole. The sensing module is electrically coupled with the pressure sensing layer for receiving and processing detected electronic signals, where sensing module includes an inductance coil to perform wireless charging to the battery. The pressure sensing layer and the sensing module are integrally formed inside the insole.

Abstract: A semiconductor device includes a source/drain feature over a semiconductor substrate, channel layers over the semiconductor substrate and connected to the source/drain feature, a gate portion between vertically adjacent channel layers, and an inner spacer between the source/drain feature and the gate portion and between adjacent channel layers. The semiconductor device further includes an air gap between the inner spacer and the source/drain feature.

Abstract: A package structure including a redistribution circuit structure, a wiring substrate, first conductive terminals, an insulating encapsulation, and a semiconductor device is provided. The redistribution circuit structure includes stacked dielectric layers, redistribution wirings and first conductive pads. The first conductive pads are disposed on a surface of an outermost dielectric layer among the stacked dielectric layers, the first conductive pads are electrically connected to outermost redistribution pads among the redistribution wirings by via openings of the outermost dielectric layer, and a first lateral dimension of the via openings is greater than a half of a second lateral dimension of the outermost redistribution pads. The wiring substrate includes second conductive pads. The first conductive terminals are disposed between the first conductive pads and the second conductive pads. The insulating encapsulation is disposed on the surface of the redistribution circuit structure.

Abstract: A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

Abstract: An exemplary active matrix LCD (200) includes an LCD panel, a gate driver (211), a data driver (212), and a voltage compensating circuit (240). The LCD panel includes a plurality of gate lines (221) and a plurality of data lines (222) crossing the data lines to define a plurality of pixel units (230). Each pixel unit includes a liquid crystal capacitor (227) and a TFT (223). The liquid crystal capacitor includes a pixel electrode (224) and a common electrode (225). The voltage compensating circuit is configured for detecting a first voltage of a source electrode of one of the TFTs when the TFT turns on, detecting a second voltage of a drain electrode of the TFT when the TFT turns off, and then outputting a compensating voltage according to the first voltage and the second voltage for compensating a kick-back voltage of the TFT.

Abstract: Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.

Abstract: A method for reducing defect levels in a photomask by employing a cleaning process which does not degrade the photomask after multiple cycles of cleaning. The method is suitable for patterned metal stencil photomasks and phase shift photomasks. The method employs an alkaline aqueous cleaning solution for a particular time in a particular temperature range. The method results in improved photomask yield after multiple cleaning cycles.

Abstract: An exemplary active matrix LCD (200) includes an LCD panel, a gate driver (211), a data driver (212), and a voltage compensating circuit (240). The LCD panel includes a plurality of gate lines (221) and a plurality of data lines (222) crossing the data lines to define a plurality of pixel units (230). Each pixel unit includes a liquid crystal capacitor (227) and a TFT (223). The liquid crystal capacitor includes a pixel electrode (224) and a common electrode (225). The voltage compensating circuit is configured for detecting a first voltage of a source electrode of one of the TFTs when the TFT turns on, detecting a second voltage of a drain electrode of the TFT when the TFT turns off, and then outputting a compensating voltage according to the first voltage and the second voltage for compensating a kick-back voltage of the TFT.

Abstract: A container includes a top wall, side walls, and a bottom wall, designed to enclose a space for storing an insulating object, the top, side and bottom walls having internal surfaces facing the enclosed space and external surface facing away from the enclosed space; and a metallic coating layer disposed on and substantially covering external surfaces of the top, side and bottom walls.

Abstract: A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: A pod for transporting reticles is made with a reticle support that has a ?-shape and is provided with pins, whose arrangement matches the location of chrome-free areas on a reticle base. Due to that, the pins, when supporting the reticle, come into contact with the reticle in chrome-free areas thereof. Thus, scratching the metallic areas and releasing metallic particles is prevented from occurring.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An anti-static layer comprised of an ammonium salt is formed on both sides of a pellicle which is then attached to a metal frame that has been coated with an anti-static layer of the ammonium salt. The frame with attached pellicle is connected to a reticle by an adhesive. Any electrostatic charges that form on the surface of the anti-static layers or on the reticle are conducted into the metal frame where they are dissipated. The ammonium salt is preferably (RN4+) Cl— in which (RN4+) has the structure: where Y is an alkyl group or C6H4, m=1 to 10000, and X? is Cl?.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: A pod for transporting reticles is made with a reticle support that has a &pgr;-shape and is provided with pins, whose arrangement matches the location of chrome-free areas on a reticle base. Due to that, the pins, when supporting the reticle, come into contact with the reticle in chrome-free areas thereof. Thus, scratching the metallic areas and releasing metallic particles is prevented from occurring.