Patents by Inventor Weidung Yang

Weidung Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7729873
    Abstract: Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters and used to generate a library of difference diffraction signals. A measured diffraction signal adjusted by the simulated approximation diffraction signal is matched against the library to determine at least one profile parameter of the structure.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: June 1, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Wei Liu, Shifang Li, Weidung Yang
  • Patent number: 7627392
    Abstract: Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters. A measured diffraction signal is input into the trained second machine learning system to determine at least one profile parameter.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: December 1, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Wei Liu, Shifang Li, Weidung Yang, Manuel Madriaga
  • Publication number: 20090063077
    Abstract: Provided is a method of controlling a fabrication cluster using a machine learning system, the machine learning system trained developed using an optical metrology model, the optical metrology model comprising a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signal is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A first machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A library of simulated fine diffraction signals and profile parameters is generated using the trained first machine learning system and using ranges and corresponding resolutions of the profile parameters.
    Type: Application
    Filed: August 30, 2007
    Publication date: March 5, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: WEI LIU, SHIFANG LI, WEIDUNG YANG, MANUEL MADRIAGA