Patents by Inventor Weihua Yin
Weihua Yin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230274906Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: ApplicationFiled: September 1, 2022Publication date: August 31, 2023Applicant: ASML Netherlands B.V.Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
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Publication number: 20230223233Abstract: A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.Type: ApplicationFiled: March 3, 2023Publication date: July 13, 2023Applicant: ASML Netherlands B.V.Inventors: Diego MARTINEZ NEGRETE GASQUE, Vincent Claude BEUGIN, Weihua YIN
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Patent number: 11469076Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: GrantFiled: June 7, 2019Date of Patent: October 11, 2022Assignee: ASML Netherlands B.V.Inventors: Martinus Gerardus Maria Johannes Massen, Joost Jeroen Ottens, Long Ma, Youfei Jiang, Weihua Yin, Wei-Te Li, Xuedong Liu
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Publication number: 20220102111Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.Type: ApplicationFiled: October 5, 2021Publication date: March 31, 2022Inventors: Weihua YIN, Youfei JIANG
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Patent number: 11152191Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.Type: GrantFiled: December 27, 2019Date of Patent: October 19, 2021Assignee: ASML Netherlands B.V.Inventors: Weihua Yin, Youfei Jiang
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Publication number: 20210217582Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.Type: ApplicationFiled: June 7, 2019Publication date: July 15, 2021Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
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Publication number: 20200211818Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.Type: ApplicationFiled: December 27, 2019Publication date: July 2, 2020Inventors: Weihua YIN, Youfei JIANG
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Patent number: 8725115Abstract: A message processing method is provided. The method includes the following steps. A message containing flag information is received. The received message containing the flag information is identified. If the message is a real-time message, the message is sent. If the message is a non-real time message, the non-real time message sent from a sender is combined and sent. A message processing system and a message combining device are further provided. Through the method, the device, and the system, the real-time messages are immediately delivered to subscribers, various types of non-real time messages are combined, converted to one or more messages, and delivered to the subscribers according to time assigned by the subscribers, thereby clearing a message space, and preventing interference to the subscribers.Type: GrantFiled: November 12, 2009Date of Patent: May 13, 2014Assignee: Huawei Technologies Co., Ltd.Inventors: Qingquan Liu, Lixin Hu, Yang Wang, Weihua Yin, Ning Chen
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Publication number: 20100056110Abstract: A message processing method is provided. The method includes the following steps. A message containing flag information is received. The received message containing the flag information is identified. If the message is a real-time message, the message is sent. If the message is a non-real time message, the non-real time message sent from a sender is combined and sent. A message processing system and a message combining device are further provided. Through the method, the device, and the system, the real-time messages are immediately delivered to subscribers, various types of non-real time messages are combined, converted to one or more messages, and delivered to the subscribers according to time assigned by the subscribers, thereby clearing a message space, and preventing interference to the subscribers.Type: ApplicationFiled: November 12, 2009Publication date: March 4, 2010Applicant: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Qingquan Liu, Lixin Hu, Yang Wang, Weihua Yin, Ning Chen
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Publication number: 20090181705Abstract: A mail transmission system and method is disclosed, where a push mail server stores a mobile terminal identification and email-box information in an email server bound to the identification. The push mail server further retrieves an email from the email-box in the email server and converts the email into a mobile network message, and transmits the mobile network message and the mobile terminal identification bound to the email-box to a mobile network server. The mobile network server transmits the received mobile network message to a corresponding mobile terminal according to the received mobile terminal identification. A push mail server, a mobile mail receiving/sending system and a method for sending and receiving a mail by a mobile terminal are disclosed. The technical solutions of various embodiments of the invention enable a mobile terminal to receive and send emails based on an open communication protocol.Type: ApplicationFiled: March 20, 2009Publication date: July 16, 2009Applicant: Huawei Technologies Co., Ltd.Inventor: Weihua YIN