Patents by Inventor Weihua Yin

Weihua Yin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230274906
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: September 1, 2022
    Publication date: August 31, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
  • Publication number: 20230223233
    Abstract: A charged particle system generates a charged particle multi beam along a multi beam path. The charged particle system comprises an aperture array, a beam limit array and a condenser lens. In the aperture array are an array of apertures to generate from an up-beam charged particle source charged particle paths down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.
    Type: Application
    Filed: March 3, 2023
    Publication date: July 13, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Diego MARTINEZ NEGRETE GASQUE, Vincent Claude BEUGIN, Weihua YIN
  • Patent number: 11469076
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: October 11, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Gerardus Maria Johannes Massen, Joost Jeroen Ottens, Long Ma, Youfei Jiang, Weihua Yin, Wei-Te Li, Xuedong Liu
  • Publication number: 20220102111
    Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
    Type: Application
    Filed: October 5, 2021
    Publication date: March 31, 2022
    Inventors: Weihua YIN, Youfei JIANG
  • Patent number: 11152191
    Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: October 19, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Weihua Yin, Youfei Jiang
  • Publication number: 20210217582
    Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.
    Type: Application
    Filed: June 7, 2019
    Publication date: July 15, 2021
    Inventors: Martinus Gerardus, Maria, Johannes MAASSEN, Joost Jeroen OTTENS, Long MA, Youfei JIANG, Weihua YIN, Wei-Te LI, Xuedong LIU
  • Publication number: 20200211818
    Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 2, 2020
    Inventors: Weihua YIN, Youfei JIANG
  • Patent number: 8725115
    Abstract: A message processing method is provided. The method includes the following steps. A message containing flag information is received. The received message containing the flag information is identified. If the message is a real-time message, the message is sent. If the message is a non-real time message, the non-real time message sent from a sender is combined and sent. A message processing system and a message combining device are further provided. Through the method, the device, and the system, the real-time messages are immediately delivered to subscribers, various types of non-real time messages are combined, converted to one or more messages, and delivered to the subscribers according to time assigned by the subscribers, thereby clearing a message space, and preventing interference to the subscribers.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: May 13, 2014
    Assignee: Huawei Technologies Co., Ltd.
    Inventors: Qingquan Liu, Lixin Hu, Yang Wang, Weihua Yin, Ning Chen
  • Publication number: 20100056110
    Abstract: A message processing method is provided. The method includes the following steps. A message containing flag information is received. The received message containing the flag information is identified. If the message is a real-time message, the message is sent. If the message is a non-real time message, the non-real time message sent from a sender is combined and sent. A message processing system and a message combining device are further provided. Through the method, the device, and the system, the real-time messages are immediately delivered to subscribers, various types of non-real time messages are combined, converted to one or more messages, and delivered to the subscribers according to time assigned by the subscribers, thereby clearing a message space, and preventing interference to the subscribers.
    Type: Application
    Filed: November 12, 2009
    Publication date: March 4, 2010
    Applicant: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Qingquan Liu, Lixin Hu, Yang Wang, Weihua Yin, Ning Chen
  • Publication number: 20090181705
    Abstract: A mail transmission system and method is disclosed, where a push mail server stores a mobile terminal identification and email-box information in an email server bound to the identification. The push mail server further retrieves an email from the email-box in the email server and converts the email into a mobile network message, and transmits the mobile network message and the mobile terminal identification bound to the email-box to a mobile network server. The mobile network server transmits the received mobile network message to a corresponding mobile terminal according to the received mobile terminal identification. A push mail server, a mobile mail receiving/sending system and a method for sending and receiving a mail by a mobile terminal are disclosed. The technical solutions of various embodiments of the invention enable a mobile terminal to receive and send emails based on an open communication protocol.
    Type: Application
    Filed: March 20, 2009
    Publication date: July 16, 2009
    Applicant: Huawei Technologies Co., Ltd.
    Inventor: Weihua YIN