Abstract: Provided in the present invention is an adjustment and design method of an illumination system matched with multiple objective lenses in an extreme ultraviolet lithography machine; the illumination system to which the method is applied comprises a light source, a collection lens, a field compound eye, a pupil compound eye and a relay lens group; the method specifically comprises the steps: before a projection objective lens of an extreme ultraviolet lithography machine is replaced, calculating aperture angles of emergent ray of a relay lens A on a meridian plane and a sagittal plane by means of ray tracing; after the projection objective lens of the extreme ultraviolet lithography machine is replaced, taking out a central point of a exit pupil plane as an object point for ray tracing; adjusting inclination angles and positions of the relay lens A and a relay lens B, and adjusting inclination angles of central compound eye units of the pupil compound eye and the field compound eye, till an image plane of a cur