Patents by Inventor Weijun Liu

Weijun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250223453
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein at least 90 wt % of the polymerizable material may comprise acrylate monomers including an aromatic group. The photocurable composition can have a viscosity of not greater than 15 mPa·s, the total carbon content of the photocurable composition after curing can be at least 73%, and the Ohnishi number may be not greater than 3.0.
    Type: Application
    Filed: March 31, 2025
    Publication date: July 10, 2025
    Inventors: Fei LI, Weijun Liu
  • Publication number: 20250206979
    Abstract: A curable composition can comprise a first alkyl-acrylate polymer (AAP1) consisting essentially of the elements carbon, hydrogen, and oxygen; a second alkyl-acrylate polymer (AAP2) consisting essentially of the elements carbon, hydrogen, oxygen, and fluorine; a thermal acid generator; and a solvent, wherein a weight percent ratio of AAP1 to AAP2 is at least 2:1. The curable composition can be used for coating a superstrate blank to form a coated superstrate having excellent hydrophobic surface properties.
    Type: Application
    Filed: December 26, 2023
    Publication date: June 26, 2025
    Inventors: Kui XU, Weijun LIU, Timothy Brian STACHOWIAK, Fen WAN
  • Patent number: 12325046
    Abstract: A superstrate can include a body, a first layer, and a second layer, wherein the first layer is disposed between the body and the second layer. Each of the first and second layers has a proximal surface and a distal surface opposite the proximal surface, wherein the body is closer to the proximal surface than to the distal surface. An Ra of the distal surface of the second layer is less than an Ra of the distal surface of the first layer. In a method of making the superstrate, the relatively high Ra of the distal surface of the first layer may be related to the process or equipment used in forming the first layer. The second layer can be formed using another superstrate, where the Ra of the distal surface of the second layer is substantially the same as the contact surface of the other superstrate.
    Type: Grant
    Filed: June 28, 2022
    Date of Patent: June 10, 2025
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Niyaz Khusnatdinov, Weijun Liu, James W. Irving
  • Publication number: 20250164896
    Abstract: A system can include a first radiation exposure station including a first actinic radiation source, a superstrate removal tool, a second radiation exposure station located remotely with respect to the first radiation exposure station, and a controller. The second radiation exposure station can include a second actinic radiation source and a heating means for heating a photocurable composition. The controller can be configured to activate the superstrate removal tool to remove the superstrate after a first radiation exposure within the first radiation exposure station and before a second radiation exposure within the second radiation exposure station, and control the heating means to heat the photocurable composition to the radiation exposure temperature. The system can perform a method that includes radiation exposure at a first temperature and radiation exposure at a second temperature that is greater than an ambient temperature and different from the first temperature.
    Type: Application
    Filed: November 21, 2023
    Publication date: May 22, 2025
    Inventors: Timothy Brian STACHOWIAK, Weijun Liu
  • Patent number: 12275854
    Abstract: A curable composition containing a polymerizable compound (a), a photopolymerization initiator (b), and a solvent (c), wherein the curable composition has viscosity of not less than 2 mPa·s and not more than 60 mPa·s at 23° C., a content of the solvent (d) with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %, a boiling point of the solvent (d) at normal pressure is less than 250° C., and the polymerizable compound (a) contains a compound (a-1) containing not less than one aromatic ring or aromatic heterocycle, and not less than four vinyl groups directly bonding to the aromatic ring or the aromatic heterocycle.
    Type: Grant
    Filed: November 21, 2022
    Date of Patent: April 15, 2025
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yuto Ito, Toshiki Ito, Isao Kawata, Fen Wan, Timothy Stachowiak, Weijun Liu
  • Publication number: 20250109097
    Abstract: A phthalonitrile monomer can have a structure of formula (1): (R2)n—X—(R1)m (1), wherein X is a substituted or unsubstituted aryl or aryl-alkyl; R1 R2 is —CH?CH2; n is 1 to 4; and m is 1-4. A curable composition can comprise a polymerizable material, wherein the polymerizable material may include the phthalonitrile monomer of formula (1).
    Type: Application
    Filed: September 29, 2023
    Publication date: April 3, 2025
    Inventors: Fen WAN, Weijun Liu
  • Publication number: 20250084269
    Abstract: A curable composition can comprise a polymerizable material and an initiator, wherein the polymerizable material can comprise at least one multi-functional vinylbenzene monomer in an amount of at least 70 wt % based on the total weight of the polymerizable material; the at least one initiator includes an azo-compound; and wherein a cured layer of the curable composition has a linear shrinkage after a baking treatment at 350° C. of not greater than 3.0%.
    Type: Application
    Filed: September 12, 2023
    Publication date: March 13, 2025
    Inventors: Timothy Brian STACHOWIAK, Weijun Liu
  • Patent number: 12247133
    Abstract: A photocurable composition can comprise a polymerizable material, and a photoinitiator, wherein the polymerizable material can comprise at least one polymerizable monomer and at least one reactive polymer. The reactive polymer can have a carbon content of at least 75% based on the total weight of the reactive polymer; a molecular weight of the at least one reactive polymer can be at least 400 g/mol and not greater than 50,000 g/mol; an amount of the reactive polymer may be at least 5 wt %; and a viscosity of the photocurable composition may be not greater than 100 mPa s. The photocurable composition may have a low linear shrinkage after curing, a high carbon content and high etch resistance and being suitable for AIP or NIL processing.
    Type: Grant
    Filed: February 17, 2022
    Date of Patent: March 11, 2025
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Timothy Brian Stachowiak, Weijun Liu
  • Publication number: 20250043138
    Abstract: A curable composition containing a polymerizable compound (a), a photopolymerization initiator (b), and a solvent (c), wherein the curable composition has viscosity of not less than 2 mPas and not more than 60 mPa·s at 23° C., a content of the solvent (d) with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %, a boiling point of the solvent (d) at normal pressure is less than 250° C., and the polymerizable compound (a) contains a compound (a-1) containing not less than one aromatic ring or aromatic heterocycle, and not less than four vinyl groups directly bonding to the aromatic ring or the aromatic heterocycle.
    Type: Application
    Filed: October 10, 2024
    Publication date: February 6, 2025
    Inventors: YUTO ITO, TOSHIKI ITO, ISAO KAWATA, Fen WAN, Timothy STACHOWIAK, Weijun LIU
  • Publication number: 20240411225
    Abstract: A system can include a heating means for heating a photocurable composition over a substrate; an actinic radiation source configured to emit actinic radiation at a wavelength less than 700 nm; and a controller configured to determine a targeted temperature to be produced by the first heating means to achieve a photocuring temperature of the photocurable composition when the photocurable composition is exposed by the actinic radiation source, wherein the photocuring temperature is greater than an ambient temperature. A method can include dispensing the photocurable composition over a substrate; photocuring a layer of the photocurable composition at a photocuring temperature higher than ambient temperature to form a cured layer; and baking the cured layer to form a baked layer. The system and method can allow a thickness change of layer to be 0% or closer to 0%.
    Type: Application
    Filed: June 9, 2023
    Publication date: December 12, 2024
    Inventors: Timothy Brian STACHOWIAK, Fen Wan, Weijun Liu
  • Publication number: 20240402595
    Abstract: A photocurable composition can comprise a polymerizable material, an organic ionic compound and a photoinitiator, wherein an amount of the organic ionic compound may be not greater than 1.5 wt %, the organic ionic compound comprises an organic cation, and a conductivity of the photocurable composition can be at least 20 ?S/cm. The photocurable composition can have an improved drop spreading and merging of drops in comparison to the same composition but not including the organic ionic compound.
    Type: Application
    Filed: August 12, 2024
    Publication date: December 5, 2024
    Inventors: Fen WAN, Weijun Liu
  • Publication number: 20240376328
    Abstract: A photocurable composition can comprising a polymerizable material, a hindered stabilizer, and a photoinitiator, wherein the polymerizable material comprises at least one multi-functional aromatic vinyl monomer; and the hindered stabilizer is a hindered amine of formula (1) or a hindered phenol of formula (2) wherein X is H, CH3, or Y—Z; Y is CH2, O, S, or N; Z is an organic substituent; R1 is H, CH3, OH, OR5, CO—CH3, or C(?O)R5; R2, R3, R4, R5 is an organic substituent.
    Type: Application
    Filed: May 10, 2023
    Publication date: November 14, 2024
    Inventors: Fen WAN, Weijun LIU
  • Patent number: 12136564
    Abstract: A superstrate can comprise a superstrate blank and a coating overlying an outer surface of the superstrate blank. The superstrate blank can comprises a central region and a tapered edge region, wherein the tapered edge region has an average taper angle of not greater than 20 degrees relative to a length direction of the superstrate blank. In one embodiment, the coating of the superstrate can be applied by spin coating and may have an edge bead below a plane of the coating surface within the central region.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: November 5, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Publication number: 20240327665
    Abstract: A photocurable composition can comprise a polymerizable material, an evaporative diluent, and a photoinitiator, wherein the polymerizable material can comprise at least one first polymerizable monomer having a boiling point at 1 atm of at least 250° C. in an amount of at least 80 wt %; the evaporative diluent can have a boiling point at 1 atm of not greater than 200° C.; an amount of the evaporative diluent can be at least 5 wt % and not greater than 40 wt %; a vapor pressure of the evaporative diluent can be at least five times greater than a vapor pressure of the at least one polymerizable monomer; a difference in a surface tension of the evaporative diluent to a surface tension of the photocurable composition can be not greater than 5 mN/m; and a viscosity of the photocurable composition may be not greater than 20 mPa·s.
    Type: Application
    Filed: March 28, 2023
    Publication date: October 3, 2024
    Inventors: Fen WAN, Weijun Liu
  • Patent number: 12105416
    Abstract: A photocurable composition can comprise a polymerizable material, an organic ionic compound and a photoinitiator, wherein an amount of the organic ionic compound may be not greater than 1.5 wt %, the organic ionic compound comprises an organic cation, and a conductivity of the photocurable composition can be at least 20 ?S/cm. The photocurable composition can have an improved drop spreading and merging of drops in comparison to the same composition but not including the organic ionic compound.
    Type: Grant
    Filed: January 28, 2021
    Date of Patent: October 1, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Patent number: 12065573
    Abstract: A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can include at least one first multi-functional monomer containing an allyloxymethyl methacrylate structure in an amount at least 5 wt % and not greater than 20 wt % based on the polymerizable material. The photocurable composition can be suitable for use in inkjet adaptive planarization and may be adapted to form cured layers having a glass transition temperature of at least 120° C.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: August 20, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fei Li, Weijun Liu
  • Patent number: 12061416
    Abstract: A photocurable composition can comprise a polymerizable material, a fullerene or fullerene derivative in an amount of at least 0.2 wt % and not greater than 5.0 wt %, and a photoinitiator and may be adapted for AIP or NIL processing. A photo-cured layer made from the photocurable composition can have an improved thermal stability in comparison to a photo-cured layer made from the same photocurable composition except not containing a fullerene or fullerene derivative.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: August 13, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Patent number: 12030992
    Abstract: A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise at least one 1,3-benzoxazine monomer and at least one acrylate monomer, and may have a viscosity of not greater than 20 mPa·s. The photocurable composition can be suitable for use in inkjet adaptive planarization and is adapted to form cured layers having exceptional heat stability up to 320° C.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: July 9, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fei Li, Weijun Liu
  • Patent number: 12024209
    Abstract: The present disclosure provides a method and an apparatus for vehicle control. The method includes: obtaining (101) manual operation information of a vehicle; determining (102) an intervention intention of a driver based on the manual operation information; and controlling (103), when the vehicle is currently in an automated driving mode and the intervention intention is determined to be a slow intervention, the vehicle to reach a predetermined safe state and handing corresponding control of the vehicle over to the driver. The method and apparatus can solve potential safety problems in vehicle control and improve safety of the vehicle control.
    Type: Grant
    Filed: November 14, 2022
    Date of Patent: July 2, 2024
    Assignee: BEIJING TUSEN WEILAI TECHNOLOGY CO., LTD.
    Inventors: Qiyuan Liu, Nan Wu, Weijun Liu
  • Publication number: 20240199816
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one silicon-containing monomer having a structure of formula (1) with R1, R2: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R3, R4: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R5: C1-C5-alkyl, aryl, alkylaryl; R6: -R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl; X: acrylate or methacrylate; and n: 0-4. The amount of silicon (Si) in the photocurable composition can be at least 15 wt % based on the total weight of the photocurable composition.
    Type: Application
    Filed: December 6, 2022
    Publication date: June 20, 2024
    Inventors: Fen WAN, Weijun Liu