Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein at least 90 wt % of the polymerizable material may comprise acrylate monomers including an aromatic group. The photocurable composition can have a viscosity of not greater than 15 mPa·s, the total carbon content of the photocurable composition after curing can be at least 73%, and the Ohnishi number may be not greater than 3.0.

Abstract: A curable composition can comprise a first alkyl-acrylate polymer (AAP1) consisting essentially of the elements carbon, hydrogen, and oxygen; a second alkyl-acrylate polymer (AAP2) consisting essentially of the elements carbon, hydrogen, oxygen, and fluorine; a thermal acid generator; and a solvent, wherein a weight percent ratio of AAP1 to AAP2 is at least 2:1. The curable composition can be used for coating a superstrate blank to form a coated superstrate having excellent hydrophobic surface properties.

Abstract: A superstrate can include a body, a first layer, and a second layer, wherein the first layer is disposed between the body and the second layer. Each of the first and second layers has a proximal surface and a distal surface opposite the proximal surface, wherein the body is closer to the proximal surface than to the distal surface. An Ra of the distal surface of the second layer is less than an Ra of the distal surface of the first layer. In a method of making the superstrate, the relatively high Ra of the distal surface of the first layer may be related to the process or equipment used in forming the first layer. The second layer can be formed using another superstrate, where the Ra of the distal surface of the second layer is substantially the same as the contact surface of the other superstrate.

Abstract: A system can include a first radiation exposure station including a first actinic radiation source, a superstrate removal tool, a second radiation exposure station located remotely with respect to the first radiation exposure station, and a controller. The second radiation exposure station can include a second actinic radiation source and a heating means for heating a photocurable composition. The controller can be configured to activate the superstrate removal tool to remove the superstrate after a first radiation exposure within the first radiation exposure station and before a second radiation exposure within the second radiation exposure station, and control the heating means to heat the photocurable composition to the radiation exposure temperature. The system can perform a method that includes radiation exposure at a first temperature and radiation exposure at a second temperature that is greater than an ambient temperature and different from the first temperature.

Abstract: A curable composition containing a polymerizable compound (a), a photopolymerization initiator (b), and a solvent (c), wherein the curable composition has viscosity of not less than 2 mPa·s and not more than 60 mPa·s at 23° C., a content of the solvent (d) with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %, a boiling point of the solvent (d) at normal pressure is less than 250° C., and the polymerizable compound (a) contains a compound (a-1) containing not less than one aromatic ring or aromatic heterocycle, and not less than four vinyl groups directly bonding to the aromatic ring or the aromatic heterocycle.

Abstract: A phthalonitrile monomer can have a structure of formula (1): (R2)n—X—(R1)m (1), wherein X is a substituted or unsubstituted aryl or aryl-alkyl; R1 R2 is —CH?CH2; n is 1 to 4; and m is 1-4. A curable composition can comprise a polymerizable material, wherein the polymerizable material may include the phthalonitrile monomer of formula (1).

Abstract: A curable composition can comprise a polymerizable material and an initiator, wherein the polymerizable material can comprise at least one multi-functional vinylbenzene monomer in an amount of at least 70 wt % based on the total weight of the polymerizable material; the at least one initiator includes an azo-compound; and wherein a cured layer of the curable composition has a linear shrinkage after a baking treatment at 350° C. of not greater than 3.0%.

Abstract: A photocurable composition can comprise a polymerizable material, and a photoinitiator, wherein the polymerizable material can comprise at least one polymerizable monomer and at least one reactive polymer. The reactive polymer can have a carbon content of at least 75% based on the total weight of the reactive polymer; a molecular weight of the at least one reactive polymer can be at least 400 g/mol and not greater than 50,000 g/mol; an amount of the reactive polymer may be at least 5 wt %; and a viscosity of the photocurable composition may be not greater than 100 mPa s. The photocurable composition may have a low linear shrinkage after curing, a high carbon content and high etch resistance and being suitable for AIP or NIL processing.

Abstract: A curable composition containing a polymerizable compound (a), a photopolymerization initiator (b), and a solvent (c), wherein the curable composition has viscosity of not less than 2 mPas and not more than 60 mPa·s at 23° C., a content of the solvent (d) with respect to the whole curable composition is not less than 5 vol % and not more than 95 vol %, a boiling point of the solvent (d) at normal pressure is less than 250° C., and the polymerizable compound (a) contains a compound (a-1) containing not less than one aromatic ring or aromatic heterocycle, and not less than four vinyl groups directly bonding to the aromatic ring or the aromatic heterocycle.

Abstract: A system can include a heating means for heating a photocurable composition over a substrate; an actinic radiation source configured to emit actinic radiation at a wavelength less than 700 nm; and a controller configured to determine a targeted temperature to be produced by the first heating means to achieve a photocuring temperature of the photocurable composition when the photocurable composition is exposed by the actinic radiation source, wherein the photocuring temperature is greater than an ambient temperature. A method can include dispensing the photocurable composition over a substrate; photocuring a layer of the photocurable composition at a photocuring temperature higher than ambient temperature to form a cured layer; and baking the cured layer to form a baked layer. The system and method can allow a thickness change of layer to be 0% or closer to 0%.

Abstract: A photocurable composition can comprise a polymerizable material, an organic ionic compound and a photoinitiator, wherein an amount of the organic ionic compound may be not greater than 1.5 wt %, the organic ionic compound comprises an organic cation, and a conductivity of the photocurable composition can be at least 20 ?S/cm. The photocurable composition can have an improved drop spreading and merging of drops in comparison to the same composition but not including the organic ionic compound.

Abstract: A photocurable composition can comprising a polymerizable material, a hindered stabilizer, and a photoinitiator, wherein the polymerizable material comprises at least one multi-functional aromatic vinyl monomer; and the hindered stabilizer is a hindered amine of formula (1) or a hindered phenol of formula (2) wherein X is H, CH3, or Y—Z; Y is CH2, O, S, or N; Z is an organic substituent; R1 is H, CH3, OH, OR5, CO—CH3, or C(?O)R5; R2, R3, R4, R5 is an organic substituent.

Abstract: A superstrate can comprise a superstrate blank and a coating overlying an outer surface of the superstrate blank. The superstrate blank can comprises a central region and a tapered edge region, wherein the tapered edge region has an average taper angle of not greater than 20 degrees relative to a length direction of the superstrate blank. In one embodiment, the coating of the superstrate can be applied by spin coating and may have an edge bead below a plane of the coating surface within the central region.

Abstract: A photocurable composition can comprise a polymerizable material, an evaporative diluent, and a photoinitiator, wherein the polymerizable material can comprise at least one first polymerizable monomer having a boiling point at 1 atm of at least 250° C. in an amount of at least 80 wt %; the evaporative diluent can have a boiling point at 1 atm of not greater than 200° C.; an amount of the evaporative diluent can be at least 5 wt % and not greater than 40 wt %; a vapor pressure of the evaporative diluent can be at least five times greater than a vapor pressure of the at least one polymerizable monomer; a difference in a surface tension of the evaporative diluent to a surface tension of the photocurable composition can be not greater than 5 mN/m; and a viscosity of the photocurable composition may be not greater than 20 mPa·s.

Abstract: A photocurable composition can comprise a polymerizable material, an organic ionic compound and a photoinitiator, wherein an amount of the organic ionic compound may be not greater than 1.5 wt %, the organic ionic compound comprises an organic cation, and a conductivity of the photocurable composition can be at least 20 ?S/cm. The photocurable composition can have an improved drop spreading and merging of drops in comparison to the same composition but not including the organic ionic compound.

Abstract: A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can include at least one first multi-functional monomer containing an allyloxymethyl methacrylate structure in an amount at least 5 wt % and not greater than 20 wt % based on the polymerizable material. The photocurable composition can be suitable for use in inkjet adaptive planarization and may be adapted to form cured layers having a glass transition temperature of at least 120° C.

Abstract: A photocurable composition can comprise a polymerizable material, a fullerene or fullerene derivative in an amount of at least 0.2 wt % and not greater than 5.0 wt %, and a photoinitiator and may be adapted for AIP or NIL processing. A photo-cured layer made from the photocurable composition can have an improved thermal stability in comparison to a photo-cured layer made from the same photocurable composition except not containing a fullerene or fullerene derivative.

Abstract: A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise at least one 1,3-benzoxazine monomer and at least one acrylate monomer, and may have a viscosity of not greater than 20 mPa·s. The photocurable composition can be suitable for use in inkjet adaptive planarization and is adapted to form cured layers having exceptional heat stability up to 320° C.

Abstract: The present disclosure provides a method and an apparatus for vehicle control. The method includes: obtaining (101) manual operation information of a vehicle; determining (102) an intervention intention of a driver based on the manual operation information; and controlling (103), when the vehicle is currently in an automated driving mode and the intervention intention is determined to be a slow intervention, the vehicle to reach a predetermined safe state and handing corresponding control of the vehicle over to the driver. The method and apparatus can solve potential safety problems in vehicle control and improve safety of the vehicle control.

Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one silicon-containing monomer having a structure of formula (1) with R1, R2: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R3, R4: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R5: C1-C5-alkyl, aryl, alkylaryl; R6: -R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl; X: acrylate or methacrylate; and n: 0-4. The amount of silicon (Si) in the photocurable composition can be at least 15 wt % based on the total weight of the photocurable composition.