Patents by Inventor Weimin Ma

Weimin Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11023276
    Abstract: Methods and apparatuses are provided for data processing. The method includes receiving a data packet; associating codes with the data packet, wherein the codes specify processing to be performed to the data packet; and performing the processing to the data packet in accordance with the codes. The apparatus includes a receiver, configured to receive a data packet; a processor; and a memory coupled to the processor, the memory configured to store instructions which when executed by the processor become operational with the processor to: associate codes with the data packet, wherein the codes specify processing to be performed to the data packet; and perform the processing to the data packet in accordance with the codes.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: June 1, 2021
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Zhaoli Zhang, Weimin Ma, Naihong Tang
  • Publication number: 20210105394
    Abstract: The embodiments of the present application provides an image capture device, a control method and a machine readable storage medium, the image capture device includes: a processor, an infrared lamp, and a white light lamp. The processor in the image capture device is used to control the infrared lamp and white light lamp. Specifically, the processor obtains current acquisition parameters of the image capture device, compares the magnification in the current acquisition parameters with a preset first magnification threshold and a preset second magnification threshold to obtain a comparison result, and controls switching states of the infrared lamp and the white light lamp according to the comparison result, the brightness of the environment and the gain, wherein, the first magnification threshold is less than the second magnification threshold.
    Type: Application
    Filed: November 24, 2020
    Publication date: April 8, 2021
    Applicant: Hangzhou Hikvision Digital Technology Co., Ltd.
    Inventors: Guoping ZHANG, Weimin MA
  • Patent number: 10805539
    Abstract: Provided in an embodiment of the present application are an anti-shake method for a camera and a camera. The method comprises: obtaining current shake data of a camera, wherein the shake data comprises position change data of the camera when the camera shakes, and the shake data is detected by a shake detector; determining, according to a preset relationship between position change of an anti-shake lens for shake compensation and shake data, movement data of the anti-shake lens; and adjusting a position of the anti-shake lens according to the movement data, so that an image sensor captures a shake-compensated image. By applying the embodiment of the present application, anti-shake processing can be performed for the higher or lower frequency shake, improving anti-shake performance.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: October 13, 2020
    Assignee: Hangzhou Hikvision Digital Technology Co., Ltd.
    Inventors: Weimin Ma, Chenyi Shen, Huan Wang, Can You
  • Patent number: 10789704
    Abstract: Methods, apparatuses, and systems for image-based abnormality detection for periodic patterns are provided. The method includes receiving an image pattern T determined from an inspection image, wherein T comprises multiple periodic segments along a spatial direction; determining, by a processor, a first reference pattern R1 by rearranging the multiple periodic segments of T in a first manner and a second reference pattern R2 by rearranging the multiple periodic segments of T in a second manner; determining whether an abnormality exists in T by comparing a part of T with a part of R1 and a part of R2; and determining that the abnormality exists in T based on a determination that the part of T is different from the part of R1 and the part of R2.
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: September 29, 2020
    Assignee: Zhongke Jingyuan Electron Limited
    Inventors: Zhaoli Zhang, Weimin Ma, Kangkang Yang, Yan Zhao
  • Publication number: 20200242746
    Abstract: Methods, apparatuses, and systems for image-based abnormality detection for periodic patterns are provided. The method includes receiving an image pattern T determined from an inspection image, wherein T comprises multiple periodic segments along a spatial direction; determining, by a processor, a first reference pattern R1 by rearranging the multiple periodic segments of T in a first manner and a second reference pattern R2 by rearranging the multiple periodic segments of T in a second manner; determining whether an abnormality exists in T by comparing a part of T with a part of R1 and a part of R2; and determining that the abnormality exists in T based on a determination that the part of T is different from the part of R1 and the part of R2.
    Type: Application
    Filed: February 20, 2019
    Publication date: July 30, 2020
    Inventors: Zhaoli Zhang, Weimin Ma, Kangkang Yang, Yan Zhao
  • Patent number: 10652452
    Abstract: Embodiments of the present application provide an automatic focusing method and a PTZ camera. The method is applicable to the PTZ camera and comprises: calculating a current target object distance from a lens of the PTZ camera to a monitored target monitoring plane based on a pre-established spatial object distance parameter; wherein, the spatial object distance parameter contains a spatial plane equation of a reference monitoring plane; the reference monitoring plane is an equivalent plane of the target monitoring plane; searching in a preset relation table based on the current target object distance, a current magnification of the PTZ camera, determining a position information corresponding to a focus motor of the PTZ camera, the preset relation table including the relationship of the object distance, the magnification and the position information of the focus motor, and driving the focus motor to a position corresponding to the determined position information.
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: May 12, 2020
    Assignee: HANGZHOU HIKVISION DIGITAL TECHNOLOGY CO., LTD.
    Inventors: Qi Gong, Weimin Ma, Can You, Peng Xu
  • Publication number: 20190342503
    Abstract: Embodiments of the present application provide an automatic focusing method and a PTZ camera. The method is applicable to the PTZ camera and comprises: calculating a current target object distance from a lens of the PTZ camera to a monitored target monitoring plane based on a pre-established spatial object distance parameter; wherein, the spatial object distance parameter contains a spatial plane equation of a reference monitoring plane; the reference monitoring plane is an equivalent plane of the target monitoring plane; searching in a preset relation table based on the current target object distance, a current magnification of the PTZ camera, determining a position information corresponding to a focus motor of the PTZ camera, the preset relation table including the relationship of the object distance, the magnification and the position information of the focus motor, and driving the focus motor to a position corresponding to the determined position information.
    Type: Application
    Filed: November 1, 2017
    Publication date: November 7, 2019
    Inventors: Qi GONG, Weimin MA, Can YOU, Peng XU
  • Publication number: 20190320118
    Abstract: Provided in an embodiment of the present application are an anti-shake method for a camera and a camera. The method comprises: obtaining current shake data of a camera, wherein the shake data comprises position change data of the camera when the camera shakes, and the shake data is detected by a shake detector; determining, according to a preset relationship between position change of an anti-shake lens for shake compensation and shake data, movement data of the anti-shake lens; and adjusting a position of the anti-shake lens according to the movement data, so that an image sensor captures a shake-compensated image. By applying the embodiment of the present application, anti-shake processing can be performed for the higher or lower frequency shake, improving anti-shake performance.
    Type: Application
    Filed: November 30, 2017
    Publication date: October 17, 2019
    Inventors: Weimin Ma, Chenyi Shen, Huan Wang, Can You
  • Publication number: 20190163525
    Abstract: Methods and apparatuses are provided for data processing. The method includes receiving a data packet; associating codes with the data packet, wherein the codes specify processing to be performed to the data packet; and performing the processing to the data packet in accordance with the codes. The apparatus includes a receiver, configured to receive a data packet; a processor; and a memory coupled to the processor, the memory configured to store instructions which when executed by the processor become operational with the processor to: associate codes with the data packet, wherein the codes specify processing to be performed to the data packet; and perform the processing to the data packet in accordance with the codes.
    Type: Application
    Filed: December 28, 2018
    Publication date: May 30, 2019
    Inventors: Zhaoli Zhang, Weimin Ma, Naihong Tang
  • Publication number: 20190088442
    Abstract: Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, columns of sensing mechanism in an inspection station are configured with different functions, weights and performances to inspect a sample to significantly reduce the time that would be otherwise needed when all the columns were equally applied.
    Type: Application
    Filed: November 13, 2018
    Publication date: March 21, 2019
    Inventors: Weimin Ma, Weiqiang Sun
  • Patent number: 10223615
    Abstract: Methods, apparatuses and systems for classifying defects for a defect inspection system are disclosed. The defect inspection system can be used to inspect and manage wafer or reticle defects. The method includes receiving a defect record based on an inspection of a target specimen, the defect record comprising a defect image associated with an unknown defect, selecting, by a computing device using a first processing unit, components ranked by significance from the defect image using a first learning technique, and determining, by the computing device using the first processing unit, whether the defect image is associated with a known defect type based on the components ranked by significance using a second learning technique.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: March 5, 2019
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Weimin Ma, Jian Zhang, Zhaoli Zhang
  • Patent number: 10134124
    Abstract: A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: November 20, 2018
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Weimin Ma, Zongqiang Yu
  • Patent number: 10134560
    Abstract: Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, an electron beam inspection system includes multiple stages or multiple chambers, where the chambers/stages (N?2) are organized to form one or more paths for wafer/mask inspection. An inspection procedure in each chamber (or at each stage) is determined by its order in the path and the relative columns used. For a system with N chambers/stages, a maximum number of N wafers/masks can be processed simultaneously.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: November 20, 2018
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Weimin Ma, Weiqiang Sun
  • Patent number: 10042233
    Abstract: The present invention relates to the field of video camera image processing. Disclosed are an intelligent adjustment method when a video camera performs automatic exposure and an apparatus therefor. In the present invention, a first corresponding relationship between a rate and an aperture is pre-set. The first corresponding relationship records corresponding upper and lower aperture limits required by each rate for achieving the best depth of field of an image. The method comprises the following steps: acquiring the current rate of a video camera; searching for upper and lower aperture limits corresponding to the current rate in a first corresponding relationship; if the current aperture value exceeds the range of the searched upper and lower aperture limits corresponding to the current rate, adjusting the current aperture value to be within the range of the upper and lower aperture limits; and according to the adjusted aperture value, adjusting exposure time and gain to satisfy the need of image brightness.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: August 7, 2018
    Assignee: HANGZHOU HIKVISION DIGITAL TECHNOLOGY CO., LTD.
    Inventors: Weimin Ma, Can You
  • Patent number: 9928446
    Abstract: A method for managing defects for an augmented automatic defect classification (ADC) process is disclosed. The method includes receiving a defect record based on an inspection of a target specimen; extracting, from a design database, relevant design data associated with a patch surrounding a location of a defect from the defect record; performing, by a processor, lithographic simulation on the relevant design data associated with the patch to determine a context patch; comparing, by the processor, the context patch with an image of the defect from the defect record to determine whether there exists a match between the context patch and the image of the defect; and defining the defect as a systematic defect based on a determination that there exists a match between the context patch and the image of the defect.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: March 27, 2018
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Weimin Ma, Xiaomei Wu, Zhaoli Zhang
  • Publication number: 20180060702
    Abstract: Methods, apparatuses and systems for classifying defects for a defect inspection system are disclosed. The defect inspection system can be used to inspect and manage wafer or reticle defects. The method includes receiving a defect record based on an inspection of a target specimen, the defect record comprising a defect image associated with an unknown defect, selecting, by a computing device using a first processing unit, components ranked by significance from the defect image using a first learning technique, and determining, by the computing device using the first processing unit, whether the defect image is associated with a known defect type based on the components ranked by significance using a second learning technique.
    Type: Application
    Filed: October 5, 2016
    Publication date: March 1, 2018
    Inventors: Weimin Ma, Jian Zhang, Zhaoli Zhang
  • Publication number: 20180053291
    Abstract: A method for reference image contour generation includes generating a mask pattern based on design target information, generating a reference image based on a simulation of photolithographic effects on the mask pattern, generating a reference image contour pattern based on edge detection in the reference image, and generating a scanned image contour pattern as a function of the reference image contour pattern and a scanned image of an integrated circuit.
    Type: Application
    Filed: October 5, 2016
    Publication date: February 22, 2018
    Inventors: Weimin Ma, Zongqiang Yu
  • Publication number: 20180018542
    Abstract: A method for managing defects for an augmented automatic defect classification (ADC) process is disclosed. The method includes receiving a defect record based on an inspection of a target specimen; extracting, from a design database, relevant design data associated with a patch surrounding a location of a defect from the defect record; performing, by a processor, lithographic simulation on the relevant design data associated with the patch to determine a context patch; comparing, by the processor, the context patch with an image of the defect from the defect record to determine whether there exists a match between the context patch and the image of the defect; and defining the defect as a systematic defect based on a determination that there exists a match between the context patch and the image of the defect.
    Type: Application
    Filed: October 5, 2016
    Publication date: January 18, 2018
    Inventors: Weimin Ma, Xiaomei Wu, Zhaoli Zhang
  • Publication number: 20170301508
    Abstract: Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, an electron beam inspection system includes multiple stages or multiple chambers, where the chambers/stages (N?2) are organized to form one or more paths for wafer/mask inspection. An inspection procedure in each chamber (or at each stage) is determined by its order in the path and the relative columns used. For a system with N chambers/stages, a maximum number of N wafers/masks can be processed simultaneously.
    Type: Application
    Filed: May 26, 2016
    Publication date: October 19, 2017
    Inventors: Weimin Ma, Weiqiang Sun
  • Patent number: D903205
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: November 24, 2020
    Inventor: Weimin Ma