Patents by Inventor Weiming Qiu

Weiming Qiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7438995
    Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.
    Type: Grant
    Filed: May 14, 2002
    Date of Patent: October 21, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Roger Harquail French, Robert Clayton Wheland, Weiming Qiu
  • Patent number: 7435528
    Abstract: Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: October 14, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Sheng Peng, Weiming Qiu, Roger Harquail French
  • Publication number: 20080039605
    Abstract: A composition comprising a copolymer having repeating units in any sequence of Formula I wherein Rf is a straight or branched perfluoroalkyl group having from about 1 to about 20 carbon atoms, or a mixture thereof, which is optionally interrupted by at least one oxygen atom, X3 is oxygen or X1, each X1 is independently an organic divalent linking group having from about 1 to about 20 carbon atoms, optionally containing an oxygen, nitrogen, or sulfur, or a combination thereof, G is F or CF3, A is an amide, j is zero or positive integer, X2 is an organic linking group, Y is O, N or S, h is zero when Y is N, and h is one when Y is O or S, Z is H, a straight or branched alkyl group having from about 1 to about 4 carbon atoms, or halide, B is H or wherein Rf, X1, X3, G, A, and j are as defined above, provided that when B is H, j is a positive integer, m is a positive integer, q is zero or a positive integer when Y is O, and q is a positive integer when Y is N or S, p is zero or a positive integer
    Type: Application
    Filed: August 8, 2006
    Publication date: February 14, 2008
    Inventor: Weiming Qiu
  • Patent number: 7301059
    Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2?C(R)CF2OSO2F, wherein R is a linear branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2?C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.
    Type: Grant
    Filed: March 22, 2007
    Date of Patent: November 27, 2007
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Victor Filippovich Cherstkov, Nina Ivanova Delyagina, Viacheslav A. Petrov, Weiming Qiu, Paul R. Resnick
  • Publication number: 20070215846
    Abstract: The present invention is drawn to the use of alkanes that are highly transparent to UV wavelengths ranging from about 170 nm to 260 nm in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
    Type: Application
    Filed: March 15, 2007
    Publication date: September 20, 2007
    Applicant: E. I. DUPONT DE NEMOURS AND COMPANY
    Inventors: Roger French, Sheng Peng, Weiming Qiu, Robert Wheland
  • Publication number: 20070167652
    Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2?C(R)CF2OSO2F, wherein R is a linear branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2?C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.
    Type: Application
    Filed: March 22, 2007
    Publication date: July 19, 2007
    Inventors: Victor Cherstkov, Nina Delyagina, Richard Fernandez, Viacheslav Petrov, Weiming Qiu, Paul Resnick, Robert Wheland
  • Publication number: 20070167640
    Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2?C(R)CF2OSO2F, wherein R is a linear branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2?C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.
    Type: Application
    Filed: March 22, 2007
    Publication date: July 19, 2007
    Inventors: Victor Cherstkov, Nina Delyagina, Viacheslav Petrov, Weiming Qiu, Paul Resnick
  • Publication number: 20060281028
    Abstract: Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
    Type: Application
    Filed: June 9, 2005
    Publication date: December 14, 2006
    Inventors: Sheng Peng, Weiming Qiu, Roger French
  • Patent number: 7084314
    Abstract: Polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycyclic fluoroallkanes are suitable for use in a variety of applications, particularly in the vacuum UV and deep UV region of the electromagnetic spectrum. For example, the polycyclic fluoroalkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: August 1, 2006
    Assignee: E. I du Pont de Nemours and Company
    Inventors: Roger Harquail French, Weiming Qiu, Sheng Peng
  • Patent number: 7078575
    Abstract: Processes for preparing high purity polycyclic fluoroalkanes are provided. The polycyclic fluoroalkanes are useful as solvents, cleaning agents, heat transfer fluids, refrigerants, lubricants, and, in a preferred embodiment, by virtue of high refractive index and high transparency to UV wavelengths, optical applications in the vacuum ultraviolet (VUV).
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: July 18, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Weiming Qiu, Sheng Peng
  • Patent number: 7071365
    Abstract: The compositions 3-alkylated-5,5?,6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol and 3,3?-dialkylated-5,5?,6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol are disclosed, as well as various processes for making them, all involving the alkylation of 5,5?,6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: July 4, 2006
    Assignee: Invista North America S.A.R.L.
    Inventors: Helen S. M. Lu, Weiming Qiu, Rafael Shapiro
  • Publication number: 20060115506
    Abstract: This invention provides a method for preserving wood by treating the wood with a composition comprising a dispersion of colloidal silica or colloidal alumina particles in a solvent and one or more organic biocides.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: Mark Harmer, Weiming Qiu, Zhixiong Xue
  • Patent number: 7022457
    Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: April 4, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: William Brown Farnham, Andrew Edward Feiring, Frank Leonard Schadt, III, Weiming Qiu
  • Patent number: 6984604
    Abstract: Supported bis(phosphorus) ligands are disclosed for use in a variety of catalytic processes, including the isomerization, hydrogenation, hydroformylation, and hydrocyanation of unsaturated organic compounds. Catalysts are formed when the ligands are combined with a catalytically active metal, such as nickel.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: January 10, 2006
    Assignee: Invista North America S.A.R.L.
    Inventors: Michael W. Cobb, Weiming Qiu
  • Publication number: 20050182279
    Abstract: The compositions 3-alkylated-5,5?,6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol and 3,3?-dialkylated-5,5?, 6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol are disclosed, as well as various processes for making them, all involving the alkylation of 5,5?,6,6?,7,7?,8,8?-octahydro-2,2?-binaphthol.
    Type: Application
    Filed: April 11, 2005
    Publication date: August 18, 2005
    Inventors: Helen Lu, Weiming Qiu, Rafael Shapiro
  • Publication number: 20040142286
    Abstract: Disclosed are partially fluorinated that are substantially transparent to ultraviolet radiation at wavelengths from approximately 150 nanometer to 260 nanometers.
    Type: Application
    Filed: October 16, 2003
    Publication date: July 22, 2004
    Inventors: Roger Harquail French, Robert Clayton Wheland, Weiming Qiu
  • Publication number: 20040126697
    Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.
    Type: Application
    Filed: September 24, 2003
    Publication date: July 1, 2004
    Inventors: William Brown Farnham, Andrew Edward Feiring, Frank Leonard Schadt, Weiming Qiu
  • Publication number: 20040054237
    Abstract: The compositions 3-alkylated-5,5′,6,6′,7,7′,8,8′-octahydro-2,2′-binaphthol and 3,3′-dialkylated-5,5′,6,6′,7,7′,8,8′-octahydro-2,2′-binaphthol are disclosed, as well as various processes for making them, all involving the alkylation of 5,5′,6,6′,7,7′,8,8′-octahydro-2,2′-binaphthol.
    Type: Application
    Filed: July 23, 2003
    Publication date: March 18, 2004
    Inventors: Helen S.M. Lu, Weiming Qiu, Rafael Shapiro
  • Publication number: 20040019237
    Abstract: Hexafluoroisobutylene and its higher homologs are easily reacted with SO3 to give fluorosulfates of the formula CH2═C(R)CF2OSO2F, wherein R is a linear, branched or cyclic fluoroalkyl group comprised of 1 to 10 carbon atoms and may contain ether oxygen. These compounds react under mild conditions with many nucleophiles to give CH2═C(R)CF2X, where X is derived from the nucleophile. This reaction provides a route to many substituted hexafluoroisobutylenes, which copolymerize easily with other fluoro- and hydrocarbon monomers such as vinylidene fluoride and ethylene.
    Type: Application
    Filed: May 9, 2003
    Publication date: January 29, 2004
    Inventors: Victor Filippovich Cherstkov, Nina Ivanova Delyagina, Richard E. Fernandez, Viacheslav A. Petrov, Weiming Qiu, Paul R. Resnick, Robert Clayton Wheland
  • Publication number: 20030153691
    Abstract: Supported bis(phosphorus) ligands are disclosed for use in a variety of catalytic processes, including the isomerization, hydrogenation, hydroformylation, and hydrocyanation of unsaturated organic compounds. Catalysts are formed when the ligands are combined with a catalytically active metal, such as nickel.
    Type: Application
    Filed: November 26, 2002
    Publication date: August 14, 2003
    Inventors: Michael W. Cobb, Weiming Qiu