Patents by Inventor WeiWu ZHONG

WeiWu ZHONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240363311
    Abstract: A substrate processing system includes a plasma generator configured to supply (radio frequency) RF power to an electrode arranged in a processing chamber. A sensor is configured to sense a parameter of the RF power supplied to the electrode. A controller is configured to compensate variations in a rate of a plasma process due to variations in bulk resistivity of a substrate arranged on a substrate support by causing the sensor to sense the parameter at least one of prior to plasma processing of the substrate and after a predetermined period after the plasma processing of the substrate begins; and adjusting the parameter of the RF power for the substrate during the plasma processing of the substrate based on the parameter sensed for the substrate.
    Type: Application
    Filed: July 9, 2024
    Publication date: October 31, 2024
    Inventors: Weiyi LUO, Youn Gi HONG, WeiWu ZHONG, Himanshu CHOKSHI
  • Patent number: 12057295
    Abstract: A substrate processing system includes a plasma generator configured to supply (radio frequency) RF power to an electrode arranged in a processing chamber. A sensor is configured to sense a parameter of the RF power supplied to the electrode. A controller is configured to compensate variations in a rate of a plasma process due to variations in bulk resistivity of a substrate arranged on a substrate support by causing the sensor to sense the parameter at least one of prior to plasma processing of the substrate and after a predetermined period after the plasma processing of the substrate begins; and adjusting the parameter of the RF power for the substrate during the plasma processing of the substrate based on the parameter sensed for the substrate.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: August 6, 2024
    Assignee: Lam Research Corporation
    Inventors: Wei Yi Luo, Youn Gi Hong, WeiWu Zhong, Himanshu Chokshi
  • Publication number: 20210313152
    Abstract: A substrate processing system includes a plasma generator configured to supply (radio frequency) RF power to an electrode arranged in a processing chamber. A sensor is configured to sense a parameter of the RF power supplied to the electrode. A controller is configured to compensate variations in a rate of a plasma process due to variations in bulk resistivity of a substrate arranged on a substrate support by causing the sensor to sense the parameter at least one of prior to plasma processing of the substrate and after a predetermined period after the plasma processing of the substrate begins; and adjusting the parameter of the RF power for the substrate during the plasma processing of the substrate based on the parameter sensed for the substrate.
    Type: Application
    Filed: August 8, 2019
    Publication date: October 7, 2021
    Inventors: Wei Yi LUO, Youn Gi HONG, WeiWu ZHONG, Himanshu CHOKSHI