Patents by Inventor Weixuan HU
Weixuan HU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12242201Abstract: A method of hot spot ranking for a patterning process. The method includes obtaining (i) a set of hot spots of a patterning process, (ii) measured values of one or more parameters of the patterning process corresponding to the set of hot spots, and (ii) simulated values of the one or more parameters of the patterning process corresponding to the set of hot spots; determining a measurement feedback based on the measured values and the simulated values of the one or more parameters of the patterning process; and determining, via simulation of a process model of the patterning process, a ranking of a hot spot within the set of hot spots based on the measurement feedback.Type: GrantFiled: September 20, 2019Date of Patent: March 4, 2025Assignee: ASML NETHERLANDS B.V.Inventors: Youping Zhang, Weixuan Hu, Fei Yan, Wei Peng, Vivek Kumar Jain
-
Publication number: 20240323458Abstract: This application discloses techniques of playing videos. The techniques comprise caching a video resource of a target onto a plurality of content delivery network (CDN) nodes; establishing a long link with each of a plurality of client computing devices in response to detecting that the plurality of client computing devices access a playback page of the target video; simultaneously sending, via the established long links, signals indicative of a start state of the target video to all of the plurality of client computing devices, wherein each of the plurality of client computing devices simultaneously plays the video resource while separately obtaining the video resource from a corresponding CDN node; simultaneously sending, via the established long links, signals indicative of an end state of the target video to all of the plurality of client computing devices that access the playback page.Type: ApplicationFiled: August 9, 2021Publication date: September 26, 2024Inventors: Junqi CHEN, Mengyuan TANG, Ruipeng CHEN, Le YIN, Weixuan HU, Xiaoxuan ZHANG
-
Publication number: 20240313710Abstract: The present disclosure provides a method and device for digital signal compensation. The method for signal compensation includes: generating a digital compensation signal at least partially based on smoothing, in real time, a digital input signal or a signal that is derived from the digital input signal; delaying the digital input signal such that the delayed digital input signal is aligned with the digital compensation signal in the time domain; and generating a digital compensated signal by combining the delayed digital input signal with the digital compensation signal.Type: ApplicationFiled: July 20, 2021Publication date: September 19, 2024Inventor: Weixuan HU
-
Patent number: 12038694Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: GrantFiled: March 7, 2023Date of Patent: July 16, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Youping Zhang, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
-
Publication number: 20240186953Abstract: The present disclosure provides a method (200) for power amplifier compensation. The method (200) includes: determining (210) a compensation value for each of a plurality of power ranges; determining (220) one of the plurality of power ranges to which transmission power of an initial symbol belongs; and compensating (230) the initial symbol with the compensation value for the one power range to obtain a compensated symbol. for transmission after passing through a power amplifier.Type: ApplicationFiled: April 9, 2021Publication date: June 6, 2024Applicant: Telefonaktiebolaget LM Ericsson (publ)Inventor: Weixuan HU
-
Publication number: 20230273528Abstract: A method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.Type: ApplicationFiled: July 29, 2021Publication date: August 31, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Rencheng SUN, Qi JIA, Meng LIU, Weixuan HU, Jen-Yi WUU, Hao CHEN
-
Publication number: 20230236512Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: ApplicationFiled: March 7, 2023Publication date: July 27, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Youping ZHANG, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
-
Patent number: 11635699Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: GrantFiled: December 4, 2019Date of Patent: April 25, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Youping Zhang, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
-
Publication number: 20220043356Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.Type: ApplicationFiled: December 4, 2019Publication date: February 10, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Youping ZHANG, Maxime Philippe Frederic GENIN, Cong WU, Jing SU, Weixuan HU, Yi ZOU
-
Publication number: 20220035256Abstract: A method of hot spot ranking for a patterning process. The method includes obtaining (i) a set of hot spots of a patterning process, (ii) measured values of one or more parameters of the patterning process corresponding to the set of hot spots, and (ii) simulated values of the one or more parameters of the patterning process corresponding to the set of hot spots; determining a measurement feedback based on the measured values and the simulated values of the one or more parameters of the patterning process; and determining, via simulation of a process model of the patterning process, a ranking of a hot spot within the set of hot spots based on the measurement feedback.Type: ApplicationFiled: September 20, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Youping ZHANG, Weixuan HU, Fei YAN, Wei PENG, Vivek Kumar JAIN