Patents by Inventor Weiyu Han

Weiyu Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230322887
    Abstract: The present invention provides a GLP-1/glucagon dual agonist and an application thereof. Specifically, the present invention provides a GLP-1 mutation protein, and the GLP-1 mutation protein simultaneously has the activity of binding and activating a class B G protein-coupled receptor GLP-1R, and the activity of a glucagon receptor. By applying a compound, calorie consumption can be increased by means of glucagon activity so as to effectively reduce a body weight, thereby relieving or preventing obesity-related diseases or other metabolic diseases.
    Type: Application
    Filed: May 28, 2021
    Publication date: October 12, 2023
    Inventor: Weiyue HAN
  • Patent number: 6311003
    Abstract: An optical electronic integrated circuit (OEIC) having optical waveguides as device interconnects. An optical waveguide is formed by depositing, in an oxygen-free atmosphere, a film of semiconductor material on a semiconductor substrate at a temperature that substantially diminishes the porosity of the film and the diffusion of material from the substrate into the film. The semiconductor film, which has an index of refraction greater than that of the substrate, is etched to form the optical waveguide on the substrate. The substrate also supports a plurality of active optical devices between which the optical waveguide extends. The substrate is preferably formed from gallium-arsenide and the waveguide from germanium. The active devices may also include these materials as well as aluminum-gallium-arsenide.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: October 30, 2001
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Madan Dubey, Kenneth A. Jones, Weiyu Han, Lawrence C. West
  • Patent number: 6051445
    Abstract: An optical electronic integrated (circuit (OEIC) having optical waveguides s device interconnects. An optical waveguide is formed by depositing, in an oxygen-free atmosphere, a film of semiconductor material on a semiconductor substrate at a temperature that substantially diminishes the porosity of the film and the diffusion of material from the substrate into the film. The semiconductor film, which has an index of refraction greater than that of the substrate, is etched to form the optical waveguide on the substrate. The substrate also supports a plurality of active optical devices between which the optical waveguide extends. The substrate is preferably formed from gallium-arsenide and the waveguide from germanium. The active devices may also include these materials as well as aluminum-gallium-arsenide. When using these materials, the germanium film is deposited in an oxygen-free environment at about 100 degrees centigrade.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: April 18, 2000
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Madan Dubey, Kenneth A. Jones, Weiyu Han, Lawrence C. West
  • Patent number: 5917967
    Abstract: An optical electronic integrated circuit (OEIC) having optical waveguides as device interconnects. An optical waveguide is formed by depositing, in an oxygen-free atmosphere, a film of semiconductor material on a semiconductor substrate at a temperature that substantially diminishes the porosity of the film and the diffusion of material from the substrate into the film. The semiconductor film, which has an index of refraction greater than that of the substrate, is etched to form the optical waveguide on the substrate. The substrate also supports a to plurality of active optical devices between which the optical waveguide extends. The substrate is preferably formed from gallium-arsenide and the waveguide from germanium. The active devices may also include these materials as well as aluminum-gallium-arsenide. When using these materials, the germanium film is deposited in an oxygen-free environment at about 100 degrees centigrade.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: June 29, 1999
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Madan Dubey, Kenneth A. Jones, Weiyu Han, Lawrence C. West
  • Patent number: 5898210
    Abstract: A Schottky diode having a series of stacked layers starting with a conventional substrate having a semi-insulating GaAs layer and an un-doped GaAs buffer layer. An n-type Si--GaAs channel layer is grown on the GaAs buffer layer. A low-temperature-grown GaAs barrier layer covers the center portion of the upper surface of the n-type channel layer. The Schottky diode comprises two terminals. One diode terminal comprises a ohmic contact deposited on the upper surface of the channel layer. This ohmic contact, which is ring-shaped, encircles the barrier layer. The other diode terminal includes a metal layer that forms a Schottky contact with the upper surface of the barrier layer. The Ga-to-As ratio in the low-temperature-grown GaAs barrier layer is adjusted so that the barrier layer contains a sufficient number of free electrons to support current flow for bias voltages above the Schottky barrier height.
    Type: Grant
    Filed: June 14, 1996
    Date of Patent: April 27, 1999
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventors: Weiyu Han, Peter G. Newman