Abstract: A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

Abstract: An exemplary active matrix LCD (200) includes an LCD panel, a gate driver (211), a data driver (212), and a voltage compensating circuit (240). The LCD panel includes a plurality of gate lines (221) and a plurality of data lines (222) crossing the data lines to define a plurality of pixel units (230). Each pixel unit includes a liquid crystal capacitor (227) and a TFT (223). The liquid crystal capacitor includes a pixel electrode (224) and a common electrode (225). The voltage compensating circuit is configured for detecting a first voltage of a source electrode of one of the TFTs when the TFT turns on, detecting a second voltage of a drain electrode of the TFT when the TFT turns off, and then outputting a compensating voltage according to the first voltage and the second voltage for compensating a kick-back voltage of the TFT.

Abstract: Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.

Abstract: A method for reducing defect levels in a photomask by employing a cleaning process which does not degrade the photomask after multiple cycles of cleaning. The method is suitable for patterned metal stencil photomasks and phase shift photomasks. The method employs an alkaline aqueous cleaning solution for a particular time in a particular temperature range. The method results in improved photomask yield after multiple cleaning cycles.

Abstract: An exemplary active matrix LCD (200) includes an LCD panel, a gate driver (211), a data driver (212), and a voltage compensating circuit (240). The LCD panel includes a plurality of gate lines (221) and a plurality of data lines (222) crossing the data lines to define a plurality of pixel units (230). Each pixel unit includes a liquid crystal capacitor (227) and a TFT (223). The liquid crystal capacitor includes a pixel electrode (224) and a common electrode (225). The voltage compensating circuit is configured for detecting a first voltage of a source electrode of one of the TFTs when the TFT turns on, detecting a second voltage of a drain electrode of the TFT when the TFT turns off, and then outputting a compensating voltage according to the first voltage and the second voltage for compensating a kick-back voltage of the TFT.

Abstract: A container includes a top wall, side walls, and a bottom wall, designed to enclose a space for storing an insulating object, the top, side and bottom walls having internal surfaces facing the enclosed space and external surface facing away from the enclosed space; and a metallic coating layer disposed on and substantially covering external surfaces of the top, side and bottom walls.

Abstract: A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: A pod for transporting reticles is made with a reticle support that has a ?-shape and is provided with pins, whose arrangement matches the location of chrome-free areas on a reticle base. Due to that, the pins, when supporting the reticle, come into contact with the reticle in chrome-free areas thereof. Thus, scratching the metallic areas and releasing metallic particles is prevented from occurring.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: The present invention is a method of protecting reticles from electrostatic damage during their use in manufacturing lines and while patterning photoresist films on device substrates. An anti-static layer comprised of an ammonium salt is formed on both sides of a pellicle which is then attached to a metal frame that has been coated with an anti-static layer of the ammonium salt. The frame with attached pellicle is connected to a reticle by an adhesive. Any electrostatic charges that form on the surface of the anti-static layers or on the reticle are conducted into the metal frame where they are dissipated. The ammonium salt is preferably (RN4+) Cl— in which (RN4+) has the structure: where Y is an alkyl group or C6H4, m=1 to 10000, and X? is Cl?.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: A pod for transporting reticles is made with a reticle support that has a &pgr;-shape and is provided with pins, whose arrangement matches the location of chrome-free areas on a reticle base. Due to that, the pins, when supporting the reticle, come into contact with the reticle in chrome-free areas thereof. Thus, scratching the metallic areas and releasing metallic particles is prevented from occurring.