Patents by Inventor Wen'ai LI

Wen'ai LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8541146
    Abstract: The invention relates to methods of preparing metal particles on a support material, including platinum-containing nanoparticles on a carbon support. Such materials can be used as electrocatalysts, for example as improved electrocatalysts in polymer electrolyte membrane fuel cells (PEM-FCs).
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: September 24, 2013
    Assignees: Toyota Motor Engineering & Manufacturing North America, Inc., Toyota Motor Corporation, Sandia Corporation, Operator of Sandia National Laboratories
    Inventors: Wen Li, Tetsuo Kawamura, Tetsuo Nagami, Hiroaki Takahashi, John Muldoon, John A. Shelnutt, Yujiang Song, James E. Miller, Michael A. Hickner, Craig Medforth
  • Publication number: 20130246981
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having an main feature, the main feature including two corners and an edge spanning between the two corners; performing a feature adjustment to the edge; performing a dissection to the edge such that the edge is divided to include two corner segments and one center segment between the two corner segments; performing a first optical proximity correction (OPC) to the main feature for a center target associated with the center segment; thereafter, performing a second OPC to the main feature for two corner targets associated with the corner segments; and thereafter, performing a third OPC to main feature for the center target, resulting in a modified design layout.
    Type: Application
    Filed: March 14, 2012
    Publication date: September 19, 2013
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ping Chiang, Tsong-Hua Ou, Yu-Po Tang, Ming-Hui Chih, Wen-Li Cheng, Cheng Kun Tsai, Wen-Chun Huang, Ru-Gun Liu
  • Publication number: 20130233724
    Abstract: A system for electrolytic deburring of metal workpieces includes a power supply case, an electrolyte chamber, an anode, a cathode and a nozzle. The power supply case includes an anode connector and a cathode connector. Electrolyte is received in the electrolyte chamber. The anode holds at least one of workpiece and is immersed in the electrolyte, and electrically connected to the anode connector. The cathode is positioned in the electrolyte chamber and electrically connected to the cathode connector , and at least a part of the cathode is immersed in the electrolyte. The nozzle is positioned in the electrolyte chamber and sprays the electrolyte under pressure to form a vortex and turbulence for deburring metal. The disclosure also supplies a method of electrolytic deburring of metal.
    Type: Application
    Filed: December 17, 2012
    Publication date: September 12, 2013
    Applicants: Hon Hai Precision Industry Co., Ltd., Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd
    Inventors: HSING-JEN HSU, HAO-CHUNG LEE, YAO-GANG ZHANG, WEN-LI WANG, TIAN-FENG HUANG
  • Publication number: 20130230134
    Abstract: An apparatus for reducing photodiode thermal gain coefficient includes a bulk semiconductor material having a light-illumination side. The bulk semiconductor material includes a minority charge carrier diffusion length property configured to substantially match a predetermined hole diffusion length value and a thickness configured to substantially match a predetermined photodiode layer thickness. The apparatus also includes a dead layer coupled to the light-illumination side of the bulk semiconductor material, the dead layer having a thickness configured to substantially match a predetermined thickness value and wherein an absolute value of a thermal coefficient of gain due to the minority carrier diffusion length property of the bulk semiconductor material is configured to substantially match an absolute value of a thermal coefficient of gain due to the thickness of the dead layer.
    Type: Application
    Filed: March 29, 2013
    Publication date: September 5, 2013
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Wen Li, Jonathan David Short, George Edward Possin
  • Publication number: 20130228455
    Abstract: A support mechanism used in an electro plasma polishing process includes a support beam, a first electrically conducting assembly, and a second electrically conducting assembly. The first electrically conducting assembly and the second electrically conducting assembly are mounted on the support beam. The first electrically conducting assembly is electrically insulated from the second electrically conducting assembly.
    Type: Application
    Filed: February 28, 2013
    Publication date: September 5, 2013
    Applicants: HON HAI PRECISION INDUSTRY CO., LTD., HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD
    Inventors: TIAN-FENG HUANG, BO LI, WEN-LI WANG, HAO-CHUNG LEE
  • Patent number: 8527916
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes receiving an IC design layout having an main feature, the main feature including two corners and an edge spanning between the two corners; performing a feature adjustment to the edge; performing a dissection to the edge such that the edge is divided to include two corner segments and one center segment between the two corner segments; performing a first optical proximity correction (OPC) to the main feature for a center target associated with the center segment; thereafter, performing a second OPC to the main feature for two corner targets associated with the corner segments; and thereafter, performing a third OPC to main feature for the center target, resulting in a modified design layout.
    Type: Grant
    Filed: March 14, 2012
    Date of Patent: September 3, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ping Chiang, Tsong-Hua Ou, Yu-Po Tang, Ming-Hui Chih, Wen-Li Cheng, Cheng Kun Tsai, Wen-Chun Huang, Ru-Gun Liu
  • Patent number: 8512692
    Abstract: Liquid interferon compositions having a pH between 4.0 and 7.2 are described. The compositions comprise interferon-beta and a stabilizing agent at between about 0.3% and 5% by weight which is an amino acid selected from the group consisting of acidic amino acids, arginine and glycine. If needed, salt is added to provide sufficient ionic strength. The liquid composition has not been previously lyophilized or previously cavitated. The liquid is preferably contained within a vessel having at least one surface in contract with the liquid that is coated with a material inert to adsorption of interferon-beta. A kit for parenteral administration of a liquid interferon formulation and a method for stabilizing liquid interferon compositions are also described.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: August 20, 2013
    Assignee: Biogen Idec Ma Inc.
    Inventors: Mary D. DiBiase, Wen-Li Chung, Mark Staples, Eric Scharin
  • Patent number: 8512691
    Abstract: Liquid interferon compositions having a pH between 4.0 and 7.2 are described. The compositions comprise interferon-beta and a stabilizing agent at between about 0.3% and 5% by weight which is an amino acid selected from the group consisting of acidic amino acids, arginine and glycine. If needed, salt is added to provide sufficient ionic strength. The liquid composition has not been previously lyophilized or previously cavitated. The liquid is preferably contained within a vessel having at least one surface in contact with the liquid that is coated with a material inert to adsorption of interferon-beta. A kit for parenteral administration of a liquid interferon formulation and a method for stabilizing liquid interferon compositions are also described.
    Type: Grant
    Filed: October 18, 2007
    Date of Patent: August 20, 2013
    Assignee: Biogen Idec Ma Inc.
    Inventors: Mary D. DiBiase, Wen-Li Chung, Mark Staples, Eric Scharin
  • Patent number: 8516292
    Abstract: An apparatus and method is disclosed to compensate for skew and asymmetry of a locally processed system clock used to synchronize an output signal, e.g., a data signal or a timing signal, from a logic circuit, for example a memory device. A first phase detector, array of delay lock loop (DLL) delay elements and accompanying circuitry are disclosed to phase-lock the rising edge of the output signal with the rising edge of the system clock XCLK signal. Additionally, a comparator circuit, a register delay, an array of DLL delay elements and accompanying circuitry are disclosed to add or subtract delay from the falling edge of the DQ signal in order to produce a symmetrical output of the DQ signal.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: August 20, 2013
    Assignee: Round Rock Research, LLC
    Inventors: Wen Li, Aaron Schoenfeld, R. Jacob Baker
  • Patent number: 8495341
    Abstract: A method, information processing system, and computer program product manage variable operand length instructions. At least one variable operand length instruction is received. The at least one variable operand length instruction is analyzed. A length of at least one operand in the variable operand length instruction is identified based on the analyzing. The at least one variable operand length instruction is organized into a set of unit of operations. The set of unit of operations are executed. The executing increases one or more performance metrics of the at least one variable operand length instruction.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: July 23, 2013
    Assignee: International Business Machines Corporation
    Inventors: Fadi Busaba, Brian Curran, Bruce Giamei, Christian Jacobi, Wen Li
  • Patent number: 8487867
    Abstract: A behavior recognition system and method by combining an image and a speech are provided. The system includes a data analyzing module, a database, and a calculating module. A plurality of image-and-speech relation modules is stored in the database. Each image-and-speech relation module includes a feature extraction parameter and an image-and-speech relation parameter. The data analyzing module obtains a gesture image and a speech data corresponding to each other, and substitutes the gesture image and the speech data into each feature extraction parameter to generate image feature sequences and speech feature sequences. The data analyzing module uses each image-and-speech relation parameter to calculate image-and-speech status parameters.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: July 16, 2013
    Assignee: Institute for Information Industry
    Inventors: Chung-Hsien Wu, Jen-Chun Lin, Wen-Li Wei, Chia-Te Chu, Red-Tom Lin, Chin-Shun Hsu
  • Publication number: 20130177801
    Abstract: The present disclosure is directed to a primary electrochemical cell having an improved discharge performance, and/or improved reliability under physical abuse and/or partial discharge. More particularly, the present disclosure is directed to such a primary cell that comprises an improved cathode material comprising iron disulfide and a select pH-modifier and an improved non-aqueous electrolyte that comprises a solvent, a salt, pH-modifiers, and selected organic or inorganic additives, which improve cell stability and discharge performance.
    Type: Application
    Filed: July 11, 2012
    Publication date: July 11, 2013
    Applicant: ROVCAL, INC.
    Inventors: M. Edgar Armacanqui, Wen Li, John Hadley, Janna Rose
  • Publication number: 20130168750
    Abstract: Photodiode arrays and methods of fabrication are provided. One photodiode array includes a silicon wafer having a first surface and an opposite second surface and a plurality of conductive vias through the silicon wafer. The photodiode array further includes a patterned doped epitaxial layer on the first surface, wherein the patterned doped epitaxial layer and the substrate form a plurality of diode junctions. A patterned etching defines an array of the diode junctions.
    Type: Application
    Filed: January 4, 2012
    Publication date: July 4, 2013
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Abdelaziz Ikhlef, Wen Li
  • Publication number: 20130168796
    Abstract: Photodiode arrays and methods of fabrication are provided. One photodiode array includes a silicon wafer having a first surface and an opposite second surface. The photodiode array also includes a plurality of refilled conductive vias through the silicon wafer, wherein the refilled conductive vias have a doping type different than the doping type of the substrate, and an interface between the refilled conductive vias and the substrate form diode junctions. The photodiode array further includes a patterned doped layer on the first surface overlapping the refilled conductive vias, wherein the patterned doped layer defines an array of photodiodes.
    Type: Application
    Filed: January 4, 2012
    Publication date: July 4, 2013
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Abdelaziz Ikhlef, Wen Li
  • Patent number: 8465691
    Abstract: A method for manufacturing indium tin oxide nanowires by preparing a solution that includes an indium-containing species, a tin-containing species and a polymeric material, wherein the solution has a molar ratio of tin to indium in a range from about 5 to about 15 percent, electrospinning fibers using the solution, and heating the fibers to a calcination temperature and maintaining the fibers at the calcination temperature for a predetermined calcination time.
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: June 18, 2013
    Assignee: The Boeing Company
    Inventors: Chaoyin Zhou, Amanda Phelps, Richard W. Burns, Wen Li
  • Patent number: 8465857
    Abstract: A proton exchange membrane comprises a hybrid inorganic-organic polymer that includes implanted metal cations. Acid groups are bound to the hybrid inorganic-organic polymer through an interaction with the implanted metal cations. An example process for manufacturing a proton exchange membrane includes sol-gel polymerization of silane precursors in a medium containing the metal cations, followed by exposure of the metal-implanted hybrid inorganic-organic polymer to an acid compound.
    Type: Grant
    Filed: September 20, 2010
    Date of Patent: June 18, 2013
    Assignee: Toyota Motor Engineering & Manufacturing North America, Inc.
    Inventors: Wen Li, Siwen Li, Meilin Liu
  • Patent number: 8466420
    Abstract: The present disclosure relates to the correction of charge loss in a radiation detector. In one embodiment, correction factors for charge loss may be determined based on depth of interaction and lateral position within a radiation detector of a charge creating event. The correction factors may be applied to subsequently measured signals to correct for the occurrence of charge loss in the measured signals.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: June 18, 2013
    Assignee: General Electric Company
    Inventors: Kristen Ann Wangerin, Wen Li, Yanfeng Du, Floribertus Heukensfeldt Jansen
  • Publication number: 20130118913
    Abstract: Both the reaction of hydride-forming compositions with hydrogen to form hydrides, and the decomposition of such hydrides to release hydrogen may be promoted electrochemically. These reactions may be conducted reversibly, and if performed in a suitable cell, the cell will serve as a hydrogen storage and release device.
    Type: Application
    Filed: November 10, 2011
    Publication date: May 16, 2013
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventors: John J. Vajo, Wen Li, Ping Liu, Frederick E. Pinkerton
  • Patent number: 8436996
    Abstract: The present invention is an apparatus and method for enhancing the electromagnetic signal of a sample for ellipsometry which uses at least one auxiliary layer and at least one substrate layer.
    Type: Grant
    Filed: May 26, 2010
    Date of Patent: May 7, 2013
    Inventors: Wen-Li Wu, Shuhul Kang
  • Publication number: 20130101682
    Abstract: A composition and methods of its use, the composition comprising: a halogen source, urea, and an additional halogen stabilizer excluding urea, optionally an alkali in a concentration sufficient to provide said composition with a pH of greater than 10; and optionally excluding a stabilized bromine compound from said composition is disclosed. Additionally, a method for reducing biological activity in a process stream is disclosed. The method comprises: providing a composition to a process stream, wherein said composition contains: a halogen, urea, and an additional halogen stabilizer excluding urea, optionally an alkali in a concentration sufficient to provide said composition with a pH of greater than 10; and optionally excluding a stabilized bromine compound from said composition. The invention is also directed to compositions and methods of their use as effective biocidal agents for water streams.
    Type: Application
    Filed: November 4, 2011
    Publication date: April 25, 2013
    Applicant: NALCO COMPANY
    Inventors: Laura E. RICE, Andrew J. COOPER, Elisa M. LUTH, Wen Li TU