Patents by Inventor Wen-Chaing Tu

Wen-Chaing Tu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100096360
    Abstract: Methods and apparatus are provided for polishing barrier layer materials. In one embodiment, a composition is provided for removing at least a barrier material from a substrate surface, including includes a base composition, a silica abrasive, a solvent, a pH between about 7 and about 10, and one or more components selected from the group of a metal passivating compound, an oxidizer, and an alumina abrasive. The composition may be used to chemical mechanical polishing process a substrate surface having a ruthenium-based barrier and one or more material selected from the group of a polysilicon layer, a dielectric layer, or metal layer.
    Type: Application
    Filed: October 15, 2009
    Publication date: April 22, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: You Wang, Yuchun Wang, Yan Wang, Kuo-Lih Chang, Jin Xu, Wen-Chaing Tu