Patents by Inventor Wen-Che LIAO

Wen-Che LIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250140644
    Abstract: A contact structure according to the present disclosure includes a conductive feature, an etch stop layer (ESL) over the conductive feature, a dielectric layer over the ESL, and a contact feature extending through the dielectric layer and the ESL to contact the conductive feature. The dielectric layer includes a low-k dielectric matrix material, and nano-pipes disposed in the low-k dielectric matrix material and configured to reduce a thermal resistance of the dielectric layer.
    Type: Application
    Filed: January 25, 2024
    Publication date: May 1, 2025
    Inventors: Ming-Hsien Lin, Wen-Che Liao, Kun-Yen Liao, Hsiao-Kang Chang
  • Patent number: 11607533
    Abstract: A tattoo needle structure is provided. A tattoo needle has a plurality of needle tips, an ink holding space is formed by the arrangement of the needle tips, and a multi-component alloy film is deposited on each needle tip of the tattoo needle by sputtering technology, so that when the tattoo needle is dipped into the tattoo ink, the tattoo ink does not stick to the surface of the multi-component alloy film by the hydrophobic property of the multi-component alloy film, and the tattoo ink is contained in the ink holding space by the cohesive property of the tattoo ink. Thus, when the tattoo needle is dipped into the tattoo ink and the tattoo process is performed, the dyeing area of the skin with the tattoo ink is the cross-sectional area of the ink holding space, thereby achieving the technical effect of improving the contouring resolution of a tattoo.
    Type: Grant
    Filed: May 6, 2020
    Date of Patent: March 21, 2023
    Assignee: NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Jinn Chu, Wen-Che Liao, Pak-Man Yiu
  • Publication number: 20210260352
    Abstract: A tattoo needle structure is provided. A tattoo needle has a plurality of needle tips, an ink holding space is formed by the arrangement of the needle tips, and a multi-component alloy film is deposited on each needle tip of the tattoo needle by sputtering technology, so that when the tattoo needle is dipped into the tattoo ink, the tattoo ink does not stick to the surface of the multi-component alloy film by the hydrophobic property of the multi-component alloy film, and the tattoo ink is contained in the ink holding space by the cohesive property of the tattoo ink. Thus, when the tattoo needle is dipped into the tattoo ink and the tattoo process is performed, the dyeing area of the skin with the tattoo ink is the cross-sectional area of the ink holding space, thereby achieving the technical effect of improving the contouring resolution of a tattoo.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 26, 2021
    Inventors: Jinn CHU, Wen-Che LIAO, Pak-Man YIU
  • Publication number: 20150337339
    Abstract: A production method of enzyme containing Antrodia Cinnamomea component includes steps of: filling fruits of the season and Antrodia Cinnamomea in eighty percent full in the internal space of a container to be sealed off and adding a yeast for a first yeast fermentation for a period of 30 days; then stuffing the same container with the fruits of the season for a second yeast fermentation for a period of 30 days; injecting air into the container when alcohol level goes lower than 12% and adding an acetic acid bacteria for an acetic acid fermentation for a period of 120˜180 days. Through two times of alcoholic extraction, followed with the acetic acid extraction, the particular bioactive components of Antrodia Cinnamomea may be fully obtained and carried with the natural enzyme drinks.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 26, 2015
    Applicant: HU LU DAN BIOTECH CO., LTD.
    Inventors: Tseng Tsai CHEN, Yu Chuan SU, Han Shu WU, Kun Yi CHEN, Wen-Che LIAO