Abstract: A method for fabricating image sensor is disclosed. The method includes the steps of: providing a substrate, wherein the substrate comprises a plurality of photodiodes; forming at least one dielectric layer and a passivation layer on surface of the substrate; using a patterned photomask to perform a first pattern transfer process for forming a plurality of trenches corresponding to each photodiode in the passivation layer; forming a plurality of color filters in the trenches; covering a planarizing layer on the color filters; and using the patterned photomask to perform a second pattern transfer process for forming a plurality of microlenses corresponding to each color filter on the planarizing layer.

Abstract: A method of manufacturing image sensor includes the following steps. A substrate having a first region and a second region is provided. A plurality of image sensing components and a periphery circuit are formed on the substrate in the first region and the second region respectively. A first conductive layer and a first dielectric layer are formed on the substrate. An etch stop layer is formed on the first dielectric layer. A second conductive layer is formed on the etch stop layer in the second region. A second dielectric layer is formed on the substrate. The second dielectric layer on the etch stop layer in the first region is etched to be removed. The etch stop layer in the first region is removed to form a space. A color filter array is disposed in the space.

Abstract: A method for fabricating image sensor is disclosed. The method includes the steps of: providing a substrate, wherein the substrate comprises a plurality of photodiodes; forming at least one dielectric layer and a passivation layer on surface of the substrate; using a patterned photomask to perform a first pattern transfer process for forming a plurality of trenches corresponding to each photodiode in the passivation layer; forming a plurality of color filters in the trenches; covering a planarizing layer on the color filters; and using the patterned photomask to perform a second pattern transfer process for forming a plurality of microlenses corresponding to each color filter on the planarizing layer.