Abstract: A method of producing an antifuse includes introducing nitrogen by ion implantation means into the substrate. An oxide dielectric layer is then formed on the nitrided substrate in a wet oxidation ambient. The conditions of the ion implantation and the oxidation are controlled to generate a dielectric with uniform thickness and a low breakdown voltage when subjected to a high electric field.

Abstract: A key inputting circuit is disclosed herein. A key inputting circuit while pressing one of keys then an input reference voltage signal will have a predetermined voltage drop caused by a specific number of series resistances and a designated voltage signal will output to a CPU to determine which key is pressed.

Abstract: Growth of multiple gate oxides. By implanting different sites of a wafer with different doses of an oxide growth retardant, the entire wafer can grow oxides of different thicknesses even after being exposed to the same oxidation environment. The process is modular insofar as the implantation of one site has no effect on rate of growth of other sites.

Abstract: A local interconnect for an integrated circuit structure is described capable of bridging over a conductive element to electrically connect together, at the local interconnect level, non-adjacent conductive portions of the integrated circuit structure. After formation of active devices and a conductive element of an integrated circuit structure in a semiconductor substrate, a silicon oxide mask is formed over the structure, with the conductive element covered by the silicon oxide mask. Metal silicide is then formed in exposed silicon regions beneath openings in the mask. The portion of the silicon oxide mask covering the conductive element is then retained as insulation. A silicon nitride etch stop layer and a planarizable dielectric layer are then formed over the structure. An opening is then formed through such silicon nitride and dielectric layers over the conductive element and exposed metal silicide regions adjacent the conductive element.

Abstract: A metal silicide blocking process for preventing formation of metal silicide on a first device and allowing formation of metal silicide on elements of a second device of an integrated circuit substrate is described.

Abstract: A method for hardening of gate oxide without forming low dopant concentration regions at the gate oxide-polysilicon interface is described. Polysilicon is deposited onto gate oxide followed by nitrogen implantation and annealing. At this point nitrogen concentration peaks exist at the gate oxide interfaces with the single crystal substrate and the polysilicon gate electrode. This effectively hardens the gate oxide. A third polysilicon gate electrode exists in the bulk of the polysilicon gate electrode. In the described process the region of the polysilicon layer that contains the nitrogen concentration peak is removed. An electronically active dopant may then be implanted. Alternatively, a fresh polysilicon layer may then be deposited followed by implantation of an electronically active dopant. Thus, the method of the invention avoids retardation of electronically active dopant diffusion.

Abstract: An improved process is provided for amorphizing portions of a silicon substrate and a polysilicon gate electrode surface to be converted to metal silicide by subsequent reaction of the amorphized silicon with a metal layer applied over the silicon substrate and polysilicon gate electrode after the amorphizing step. The improvement comprises implanting the exposed surface of the silicon substrate and the surface of the polysilicon gate electrode with a beam of amorphizing ions at an angle of at least 15.degree. to a line perpendicular to the plane of the surface of the silicon substrate to thereby inhibit channeling of the implanted ions through the gate electrode to the underlying gate oxide and channel of the MOS structure. The implant angle of the beam of amorphizing ions is preferably at least 30.degree., but should not exceed 60.degree., with respect to a line perpendicular to the plane of the surface of the silicon substrate.

Abstract: A gate array is disclosed having a programmable polysilicon layer which serves as both the gate electrodes for MOS transistors and routing lines for some connections between gate electrodes. The gate array structure is formed on a semiconductor substrate and has an array of identical base cells located in a core region of the structure. Each such base cell des the following elements: (1) a plurality of transistors, each of which includes a gate electrode; and (2) one or more gate connection strips formed on the substrate and electrically connecting selected gate electrodes of two or more of the transistors. Preferably, the gate connection strips are made from the same material as the selected gate electrodes (e.g., polysilicon) and are integrally connected therewith. The gate connection strips may patterned (i.e., programmed) to form substrate level routing between gates of various transistors.

Abstract: A type of piezoelectric transformer (PT) which vibrates in length extensional mode is provided. The piezoelectric transformer (PT) has a piezoelectric substrate which has a first dimension, a second dimension and a third dimension with the first dimension being longest and the third dimension being shortest. The substrate has two polarization directions parallel to the first dimension near two terminals of the first dimension and at least two opposite polarization directions on a central portion of the substrate transversely to the first dimension. The substrate further has at least two electrodes on a portion horizontal to the first dimension. Comparing with traditional piezoelectric transformers, the new one can solve the polarization difficulties and reduce audio noise output without sacrificing the electrical properties or even have better voltage transformation characteristics.