Patents by Inventor Wen-Chong Chiang

Wen-Chong Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of calibrating WEE exposure tool
    Patent number: 6042976
    Abstract: The invention provides four sub-patterns located at the periphery of the wafer surface at 90-degree intervals. Each of the four sub-patterns is divided into four alignment scales where each alignment scale is yet again subdivided into a multiplicity of alignment marks. This multiplicity of sub-patterns and alignment scales with each scale having a multiplicity of alignment marks results in very accurate and convenient alignment capability.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: March 28, 2000
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Chong Chiang, Jung-Hau Hsiue, Shih-Chang Shih, Yung-Dar Chen