Abstract: A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa<9.0, a water-miscible solvent, and a mixture thereof. Employment of such composition exhibits efficient cleaning capability for Al substrates, minimal silicon etch while protecting aluminum for substrates comprising both materials.

Abstract: The present invention, in a preferred embodiment, is a photoresist stripper formulation, comprising: Hydroxylamine ; Water; a solvent selected from the group consisting of dimethylsulfoxide; N-methylpyrrrolidine; dimethylacetamide; dipropylene glycol monomethyl ether; monoethanolamine and mixtures thereof; a base selected from the group consisting of choline hydroxide, monoethanolamine, tetramethylammonium hydroxide; aminoethylethanolamine and mixtures thereof; a metal corrosion inhibitor selected from the group consisting of catechol, gallic acid, lactic acid, benzotriazole and mixtures thereof; and a bath life extending agent selected from the group consisting of glycerine, propylene glycol and mixtures thereof. The present invention is also a method for using formulations as exemplified in the preferred embodiment.

Abstract: The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.

Abstract: The present invention is a chemical stripper formulation for removing photoresist and the residue of etching and ashing of electronic device substrates, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride. The present invention is also a process for removing photoresist and the residue of etching and ashing of electronic device substrates by contacting the substrate with a formulation, comprising: deionized water, acetic acid, polyethylene glycol, dipropylene glycol monomethyl ether and ammonium fluoride.

Abstract: The present invention, in a preferred embodiment, is a photoresist stripper formulation, comprising: Hydroxylamine ; Water; a solvent selected from the group consisting of dimethylsulfoxide; N-methylpyrrrolidine; dimethylacetamide; dipropylene glycol monomethyl ether; monoethanolamine and mixtures thereof; a base selected from the group consisting of choline hydroxide, monoethanolamine, tetramethylammonium hydroxide; aminoethylethanolamine and mixtures thereof; a metal corrosion inhibitor selected from the group consisting of catechol, gallic acid, lactic acid, benzotriazole and mixtures thereof; and a bath life extending agent selected from the group consisting of glycerine, propylene glycol and mixtures thereof. The present invention is also a method for using formulations as exemplified in the preferred embodiment.

Abstract: A method for fabricating an optical recording medium is provided. A dye layer is formed on a molded substrate by spin-coating. A reflection layer is formed on the dye layer by sputtering so that the optical disc has enough reflection rate. The dye layer comprises a cyanine type dye and an azo metal chelate compound selected from the formula (I): wherein M is a metal ion; R1 is a hydrogen atom, a linear or branched alkyl group containing 1 to 6 carbon atoms, amino group, alkyl amino group or toluidinyl group; R2 is a hydrogen atom, a hydroxyl group, a halogen atom, an ether group, an ester group or a linear or branched alkyl group containing 1 to 6 carbon atoms; R3 is a hydrogen atom or a linear or branched alkyl group containing 1 to 6 carbon atoms; R4 is a hydrogen atom, a halogen atom or a linear or branched alkyl group containing 1 to 6 carbon atoms; A1 is a heterocyclic derivative group constituted by carbon atoms and nitrogen atoms.

Abstract: An optical recording medium dye is described. The optical recording medium dye is an azo metal chelate compound, wherein the azo metal chelate compound comprises the following structure: wherein R1 is a hydrogen atom, a C1-6 straight chain or branched alkyl group, an amino group, an alkylamino group or a tolylamino group; R2 is a hydrogen atom, a hydroxyl group, a halogen atom, an ether group, a C1-6 straight chain or branched alkyl group; R3 is a hydrogen atom, a C1-6 straight chain or branched alkyl group; R4 is a hydrogen atom, a C1-6 straight chain or branched alkyl group or a halogen atom; A3 is a residue forming a heterocyclic ring derivative together with a carbon atom and a nitrogen atom.

Abstract: A method for fabricating an optical recording medium is provided. A dye layer is formed on a molded substrate by spin-coating. A reflection layer is formed on the dye layer by sputtering so that the optical disc has enough reflection rate.

Abstract: An optical recording medium dye is described.