Patents by Inventor Wen-Fang Chou

Wen-Fang Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12150319
    Abstract: Provided is a semiconductor device having a dual gate field-effect transistor and a sensor in electrical communication with the transistor. The field-effect transistor can have a first gate electrode, a second gate electrode, a source electrode, a drain electrode, a semiconductor layer with parts in contact with the source and drain electrodes, a bi-layer gate insulator, and a second gate insulator. The bi-layer gate insulator can include a first layer and a second layer, the first layer located between the second layer and a first side of the semiconductor layer, the second layer located between the first layer and the first gate electrode. The second gate insulator can be located between the second gate electrode and a second side of the semiconductor layer, and the sensor can be in electrical communication with the second gate electrode.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: November 19, 2024
    Assignee: Georgia Tech Research Corporation
    Inventors: Canek Fuentes-Hernandez, Wen-Fang Chou, Xiaojia Jia, Bernard Kippelen
  • Publication number: 20220123240
    Abstract: Provided is a semiconductor device having a dual gate field-effect transistor and a sensor in electrical communication with the transistor. The field-effect transistor can have a first gate electrode, a second gate electrode, a source electrode, a drain electrode, a semiconductor layer with parts in contact with the source and drain electrodes, a bi-layer gate insulator, and a second gate insulator. The bi-layer gate insulator can include a first layer and a second layer, the first layer located between the second layer and a first side of the semiconductor layer, the second layer located between the first layer and the first gate electrode. The second gate insulator can be located between the second gate electrode and a second side of the semiconductor layer, and the sensor can be in electrical communication with the second gate electrode.
    Type: Application
    Filed: February 7, 2020
    Publication date: April 21, 2022
    Inventors: Canek Fuentes-Hernandez, Wen-Fang Chou, Xiaojia Jia, Bernard Kippelen
  • Patent number: 10763447
    Abstract: The disclosed technology includes systems, devices, and methods associate with producing an organic semiconductor film having electrical dopant molecules distributed to a controlled depth. In an example implementation, a semiconductor device is provided. The semiconductor device can include a first substrate and an organic semiconductor film disposed on the first substrate. The organic semiconductor film includes a first region characterized by electrical dopant molecules distributed to a controlled depth with respect to a first surface of the organic semiconductor film. The semiconductor device further can include an electrode in contact with at least a portion of the first region of the organic semiconductor film.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: September 1, 2020
    Assignee: Georgia Tech Research Corporation
    Inventors: Bernard Kippelen, Naoya Aizawa, Canek Fuentes-Hernandez, Junji Kido, Seth Marder, Felipe A. Larrain, Wen-Fang Chou, Vladimir Kolesov
  • Publication number: 20180175314
    Abstract: The disclosed technology includes systems, devices, and methods associate with producing an organic semiconductor film having electrical dopant molecules distributed to a controlled depth. In an example implementation, a semiconductor device is provided. The semiconductor device can include a first substrate and an organic semiconductor film disposed on the first substrate. The organic semiconductor film includes a first region characterized by electrical dopant molecules distributed to a controlled depth with respect to a first surface of the organic semiconductor film. The semiconductor device further can include an electrode in contact with at least a portion of the first region of the organic semiconductor film.
    Type: Application
    Filed: June 3, 2016
    Publication date: June 21, 2018
    Inventors: Bernard Kippelen, Naoya Aizawa, Canek Fuentes-Hernandez, Junji Kido, Seth Marder, Felipe A. Larrain, Wen-Fang Chou, Vladimir Kolesov