Patents by Inventor Wen-Feng Kuo

Wen-Feng Kuo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970235
    Abstract: An adaptive vehicle headlight is provided for being installed on a vehicle body for use. The adaptive vehicle headlight includes a light body, an optical lens, a driver, and a control unit. The optical lens, the driver, and the control unit are integrated into the light body. In practice, the optical lens can optionally include a light distributing member. The control unit can cause an operation of the driver according to a tilt angle of the vehicle body, such that the optical lens and/or the light distributing member are rotated to a predetermined angle, so as to produce an illumination pattern in a horizontal state.
    Type: Grant
    Filed: March 17, 2022
    Date of Patent: April 30, 2024
    Assignee: CHIAN YIH OPTOTECH CO., LTD.
    Inventors: Cheng Wang, Ming-Feng Kuo, Wen-Hong Zhang
  • Publication number: 20230261039
    Abstract: Capacitors for use in semiconductor devices including a plurality of first trenches in a first region of a substrate, the first trenches extending in a first direction, a plurality of second trenches in the first region of the substrate, the second trenches extending in a second direction other than the first direction, with the adjacent second trenches and first trenches cooperating to define protruding structures and island structures having an upper surface that is at or below a plane defined by a portion of an upper surface of a substrate surrounding the first region with a series of film pairs including a dielectric layer and a conductive layer formed in the first and second trenches and the protruding and island structures.
    Type: Application
    Filed: April 25, 2023
    Publication date: August 17, 2023
    Inventors: Wen-Feng KUO, Chung-Chuan TSENG, Chia-Ping LAI
  • Publication number: 20220271119
    Abstract: A method of manufacturing a capacitor including the operations of etching a plurality of primary trenches into a first region of a substrate, the primary trenches extending in a first direction, etching a plurality of secondary trenches into the first region of the substrate, the secondary trenches extending in a second direction other than the first direction, with the adjacent secondary trenches and adjacent primary trenches jointly defining an island structure having an upper surface that is recessed relative to an upper surface a surrounding substrate, and depositing a series of film pairs including a dielectric layer and a conductive layer.
    Type: Application
    Filed: May 9, 2022
    Publication date: August 25, 2022
    Inventors: Wen-Feng KUO, Chung-Chuan TSENG, Chia-Ping LAI
  • Patent number: 11329125
    Abstract: A capacitor comprises at least one primary trench in a substrate, extending in a first direction, and at least one secondary trench in the substrate, extending in a second direction different from the first direction. The capacitor further comprises a first dielectric material separating the substrate from the first capacitor plate of a plurality of capacitor plates, and a second dielectric material separating the first capacitor plate from a second capacitor plate of the plurality of capacitor plates, wherein the first dielectric material, the second dielectric material, the first capacitor plate and the second capacitor plate are at least partially within the at least one primary trench and the at least one secondary trench in the substrate.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 10, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Feng Kuo, Chung-Chuan Tseng, Chia-Ping Lai
  • Publication number: 20200098855
    Abstract: A capacitor comprises at least one primary trench in a substrate, extending in a first direction, and at least one secondary trench in the substrate, extending in a second direction different from the first direction. The capacitor further comprises a first dielectric material separating the substrate from the first capacitor plate of a plurality of capacitor plates, and a second dielectric material separating the first capacitor plate from a second capacitor plate of the plurality of capacitor plates, wherein the first dielectric material, the second dielectric material, the first capacitor plate and the second capacitor plate are at least partially within the at least one primary trench and the at least one secondary trench in the substrate.
    Type: Application
    Filed: July 22, 2019
    Publication date: March 26, 2020
    Inventors: Wen-Feng KUO, Chung-Chuan TSENG, Chia-Ping LAI
  • Patent number: 8420166
    Abstract: Methods for preparing a patterned metal/metal oxide layer by using a solution type precursor or sol-gel precursor are provided and, especially, a method for preparing a patterned carrier transport of a solar cell and a method for preparing biomedical material are provided, which comprise the following steps: (A) providing a substrate, and a mold with designed patterns formed thereon; (B) coating the substrate with a solution of a precursor to form a precursor layer, wherein the precursor is a metal precursor or a metal oxide precursor; (C) pressing the mold together with the precursor layer to transfer the patterns of the mold onto the precursor layer; (D) curing or pre-curing the precursor layer; (E) removing the mold; and (F) conducting an optional post-treatment, if it being demanded, to further modify the properties of precursor layer.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: April 16, 2013
    Assignee: National Tsing Hua University
    Inventors: Sun-Zen Chen, Wen-Feng Kuo, Ruo-Ying Wu, Yu-Cheng Tzeng, Ching-Wen Chang, Hong-Jum Tan
  • Publication number: 20110156320
    Abstract: Methods for preparing a patterned metal/metal oxide layer by using a solution type precursor or sol-gel precursor are provided and, especially, a method for preparing a patterned carrier transport of a solar cell and a method for preparing biomedical material are provided, which comprise the following steps: (A) providing a substrate, and a mold with designed patterns formed thereon; (B) coating the substrate with a solution of a precursor to form a precursor layer, wherein the precursor is a metal precursor or a metal oxide precursor; (C) pressing the mold together with the precursor layer to transfer the patterns of the mold onto the precursor layer; (D) curing or pre-curing the precursor layer; (E) removing the mold; and (F) conducting an optional post-treatment, if it being demanded, to further modify the properties of precursor layer.
    Type: Application
    Filed: March 23, 2010
    Publication date: June 30, 2011
    Applicant: National Tsing Hua University
    Inventors: Sun-Zen Chen, Wen-Feng Kuo, Ruo-Ying Wu, Yu-Cheng Tzeng, Ching-Wen Chang, Hong-Jum Tan
  • Publication number: 20110011148
    Abstract: A method for forming a patterned modified metal layer is disclosed, which comprises the following steps: (A) providing a metal base which is in the form of either a bulk metal or a metal coated substrate, and a mold with patterns; (B) applying the mold onto the metal base to transfer the patterns of the mold to the metal surface; (C) removing the mold; and (D) modifying the whole metal base or the, surface and a certain depth beneath the surface of metal base to form a modified metal layer with designated patterns.
    Type: Application
    Filed: September 23, 2009
    Publication date: January 20, 2011
    Applicant: National Tsing Hua University
    Inventors: Sun-Zen Chen, Tai-Bor Wu, Ching-Wen Chang, Wen-Feng Kuo, Ruo-Ying Wu