Patents by Inventor Wen-Fu LIN

Wen-Fu LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device having color resists pattern and method for manufacturing the same
    Patent number: 11656552
    Abstract: A device having color resists pattern and method for manufacturing are disclosed. The device includes a substrate, at least two color resist layers. The at least color resist layers are formed on the curved and construct a visible pattern, wherein at a boundary of the color resist pattern, the at least two color resist layers form a ramp structure and each of the at least two color resist layers contacts the substrate; and the ramp structure is formed in sequential order by one exposure process, one removal process and one baking process of the at least two color resist layers.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: May 23, 2023
    Inventors: Ming-An Hsu, Wen-Fu Lin
  • Curved shaped mask, curved device having color resists pattern and method for manufacturing the same
    Patent number: 10955748
    Abstract: The disclosure illustrates a curve-shaped mask, a curved device having color resist pattern and method for manufacturing the same. The curved device includes a curved substrate and at least two color resist layers. The at least two color resist layers are formed on the curved substrate, and construct a visible pattern together. The curved device is manufactured by a curve-shaped mask, which is a metal-containing material layer formed on the curved substrate and is visible.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: March 23, 2021
    Inventors: Ming-An Hsu, Wen-Fu Lin
  • THIN-FILM MASK, FITTING AIDS, FITTING AND EXPOSURE DEVICE AND FITTING METHOD FOR THE THIN-FILM MASK PASTED ON A CURVED SUBSTRATE
    Publication number: 20170108770
    Abstract: A thin-film mask, fitting aids, fitting and exposure assistant device and fitting method for the thin-film mask paste on a curved substrate is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the curved substrate. After the template device had formed, send the template device to the exposure machine, and the high resolution color photoresist pattern is made on the curved substrate.
    Type: Application
    Filed: October 14, 2016
    Publication date: April 20, 2017
    Inventors: Ming-An HSU, Wen-Fu LIN
  • DEVICE HAVING COLOR RESISTS PATTERN AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20170017159
    Abstract: A device having color resists pattern and method for manufacturing are disclosed. The device includes a substrate, at least two color resist layers. The at least color resist layers are formed on the curved and construct a visible pattern.
    Type: Application
    Filed: July 15, 2016
    Publication date: January 19, 2017
    Inventors: Ming-An HSU, Wen-Fu LIN
  • CURVED SHAPED MASK, CURVED DEVICE HAVING COLOR RESISTS PATTERN AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20170017160
    Abstract: The disclosure illustrates a curve-shaped mask, a curved device having color resist pattern and method for manufacturing the same. The curved device includes a curved substrate and at least two color resist layers. The at least two color resist layers are formed on the curved substrate, and construct a visible pattern together.
    Type: Application
    Filed: July 15, 2016
    Publication date: January 19, 2017
    Inventors: MING-AN HSU, WEN-FU LIN