Patents by Inventor Wen Hua Tai

Wen Hua Tai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220363990
    Abstract: The present invention relates to compositions and methods for selectively etching silicon nitride in the presence of silicon oxide, polysilicon and/or metal silicides at a high etch rate and with high selectivity. Additives are described that can be used at various dissolved silica loading windows to provide and maintain the high selective etch rate and selectivity.
    Type: Application
    Filed: May 12, 2022
    Publication date: November 17, 2022
    Inventors: Hsing-Chen Wu, Min-Chieh Yang, Ming-Chi Liao, Wen Hua Tai, Wei-Ling Lan