Abstract: A method of repairing a color filter and a pre-repair material used thereby are provided. The method includes the following steps. First, a color filter including a substrate and a color filter layer is provided, and the color filter layer having at least one defect pattern is disposed on the substrate. Then, a pre-repair layer is formed in the at least one defect pattern. After that, a repair layer is formed on the pre-repair layer, and the repair layer is connected to the substrate through the pre-repair layer.

Abstract: A color filter substrate for an in-cell optical touch display panel is provided, which includes a substrate, a visible-light shielding structure, a color filter layer and an infrared filter layer. The visible-light shielding structure is disposed on the substrate to define sub-pixel regions and touch sensor regions of the substrate. The color filter layer covers the sub-pixel regions. The infrared filter layer covers the touch sensor regions. The infrared filter layer is made of a single infrared-light permeable material, which has a light transmittance in infrared-light wavelength range greater than a light transmittance in visible-light wavelength range. An in-cell optical touch display panel including the color filter substrate and materials of the infrared filter layer are also provided.

Abstract: A method for forming multicolor color filters is disclosed. First, a first patterned color layer is formed on a substrate. Second, a second patterned color layer and a third patterned color layer are respectively formed on the substrate with the first patterned color layer. Then the first patterned color layer, the second patterned color layer and the third patterned color layer are baked together to simultaneously transform the first patterned color layer, the second patterned color layer and the third patterned color layer to respectively become a first pixel color layer, a second pixel color layer and a third pixel color layer of the multicolor color filters, respectively.

Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.

Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014?/?, and an optical density (OD) of each of the bumps is above 1.5.

Abstract: The present invention is to provide a hydrophilic monomer, and hydrophilic photoresist composition containing the same. The photoresist composition further comprises a hydrophilic resin. The hydrophilic monomer and the hydrophilic resin respectively have a hydrophilic group which is used to react to H2O for the purpose of solving them in pure water. The present invention is also to provide a resist pattern formation method comprising spin coating a hydrophilic photoresist composition on a surface of a substrate to limit a photoresist layer. As a result, the photoresist layer can be developed by pure water. The present invention seeks to overcome the deficiencies in prior art which result in pollution of the environment and cost of photolithography by using basic developing solvent.

Abstract: A color filter includes a transparent substrate, a transparent conductive layer, a plurality of filter layers, and a plurality of bumps. The filter layers are disposed between the transparent substrate and the transparent conductive layer, and the bumps are disposed on a plane of the transparent conductive layer. A sheet resistance of each of the bumps is above 1014?/?, and an optical density (OD) of each of the bumps is above 1.5.

Abstract: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at least double exposure processes, and the photo mask with a pattern is moved and aligned to another corresponding location over the photoresist layer during at least one exposure process; successively, at least one filter is provided to perform at least one exposure process, and the filter is placed above or below the photo mask; and the patterns with different dimensions are consequently formed on the substrate after partial photoresist is removed during a later developing process.

Abstract: A method of repairing a color filter and a pre-repair material used thereby are provided. The method includes the following steps. First, a color filter including a substrate and a color filter layer is provided, and the color filter layer having at least one defect pattern is disposed on the substrate. Then, a pre-repair layer is formed in the at least one defect pattern. After that, a repair layer is formed on the pre-repair layer, and the repair layer is connected to the substrate through the pre-repair layer.

Abstract: A manufacturing method for color filters is described. The manufacturing method is utilized to produce color filters of liquid crystal displays. The manufacturing method has following steps. First, a glass substrate is provided. Subsequently, a light shield layer and a photoresist layer are formed on the glass substrate and patterned. An inkjet technology is utilized to color the glass substrate. Finally, the photoresist layer is removed and a transparently conductive layer is formed thereon. The light shield layer is made of a resin, a metal chromium or a chromium oxide.