Patents by Inventor Wen-Jian Lin
Wen-Jian Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9025235Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.Type: GrantFiled: February 1, 2008Date of Patent: May 5, 2015Assignee: Qualcomm MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Patent number: 8004736Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.Type: GrantFiled: May 8, 2009Date of Patent: August 23, 2011Assignee: Qualcomm MEMS Technologies, Inc.Inventors: Wen-Jian Lin, Brian Arbuckle, Brian Gally, Philip Floyd, Lauren Palmateer
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Patent number: 7709964Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.Type: GrantFiled: October 26, 2007Date of Patent: May 4, 2010Assignee: QUALCOMM, Inc.Inventor: Wen-Jian Lin
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Patent number: 7706044Abstract: An optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.Type: GrantFiled: April 28, 2006Date of Patent: April 27, 2010Assignee: QUALCOMM MEMS Technologies, Inc.Inventors: Wen-Jian Lin, Hsiung-Kuang Tsai
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Publication number: 20090219605Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.Type: ApplicationFiled: May 8, 2009Publication date: September 3, 2009Applicant: QUALCOMM MEMS Technologies, IncInventors: Wen-Jian Lin, Brian Arbuckle, Brian Gally, Philip Floyd, Lauren Palmateer
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Patent number: 7547565Abstract: The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.Type: GrantFiled: May 20, 2005Date of Patent: June 16, 2009Assignee: Qualcomm MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Patent number: 7532385Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.Type: GrantFiled: March 24, 2004Date of Patent: May 12, 2009Assignee: QUALCOMM MEMS Technologies, Inc.Inventors: Wen-Jian Lin, Brian Arbuckle, Brian Gally, Philip Floyd, Lauren Palmateer
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Patent number: 7485236Abstract: An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.Type: GrantFiled: September 9, 2005Date of Patent: February 3, 2009Assignee: QUALCOMM MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Publication number: 20080157413Abstract: The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.Type: ApplicationFiled: March 18, 2008Publication date: July 3, 2008Applicant: Qualcomm MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Publication number: 20080137175Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.Type: ApplicationFiled: February 1, 2008Publication date: June 12, 2008Applicant: QUALCOMM MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Patent number: 7342709Abstract: An optical interference color display comprising a transparent substrate, an inner-front optical diffusion layer, a plurality of first electrodes, a patterned support layer, a plurality of optical films and a plurality of second electrodes is provided. The inner-front optical diffusion layer is on the transparent substrate and the first electrodes are on the inner-front optical diffusion layer. The patterned support layer is on the inner-front optical diffusion layer between the first electrodes. The optical film is on the first electrodes and the second electrodes are positioned over the respective first electrodes. The second electrodes are supported through the patterned support layer. Furthermore, there is an air gap between the second electrodes and their respective first electrodes.Type: GrantFiled: March 26, 2003Date of Patent: March 11, 2008Assignee: Qualcomm Mems Technologies, Inc.Inventor: Wen-Jian Lin
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Publication number: 20080055699Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.Type: ApplicationFiled: October 26, 2007Publication date: March 6, 2008Applicant: QUALCOMM MEMS TECHNOLOGIES, INCInventor: Wen-Jian Lin
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Publication number: 20080041817Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.Type: ApplicationFiled: October 26, 2007Publication date: February 21, 2008Applicant: QUALCOMM MEMS TECHNOLOGIES, INC.Inventor: Wen-Jian Lin
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Patent number: 7323217Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.Type: GrantFiled: October 31, 2005Date of Patent: January 29, 2008Assignee: QUALCOMM MEMS Technologies, Inc.Inventors: Wen-Jian Lin, Hsiung-Kuang Tsai
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Patent number: 7291921Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.Type: GrantFiled: March 29, 2004Date of Patent: November 6, 2007Assignee: Qualcomm Mems Technologies, Inc.Inventor: Wen-Jian Lin
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Patent number: 7198973Abstract: A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.Type: GrantFiled: November 13, 2003Date of Patent: April 3, 2007Assignee: Qualcomm MEMS Technologies, Inc.Inventors: Wen-Jian Lin, Hsiung-Kuang Tsai
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Patent number: 7193768Abstract: An optical interference display unit with a first electrode, a second electrode and support structures located between the two electrodes is provided. The second electrode has at least a first material layer and a second material layer. At least one material layer of the two is made from conductive material and the second conductive layer is used as a mask while an etching process is performed to etch the first material layer to define the second electrode.Type: GrantFiled: March 24, 2004Date of Patent: March 20, 2007Assignee: Qualcomm MEMS Technologies, Inc.Inventor: Wen-Jian Lin
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Patent number: 7172915Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.Type: GrantFiled: January 8, 2004Date of Patent: February 6, 2007Assignee: Qualcomm Mems Technologies Co., Ltd.Inventors: Wen-Jian Lin, Hung-Huei Hsu, Hsiung-Kuang Tsai
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Publication number: 20060257070Abstract: An optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.Type: ApplicationFiled: April 28, 2006Publication date: November 16, 2006Inventors: Wen-Jian Lin, Hsiung-Kuang Tsai
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Patent number: 7095465Abstract: There is provided a reflection type/transflection type thin film transistor liquid crystal display, including an insulating substrate, a thin film transistor formed on the insulating substrate, a transparent electrode made of indium-tin-oxide formed on the thin film transistor and electrically contacted with a source region and a drain region of the thin film transistor, and a curved conducting structure with an inclination of 3 to 20 degrees formed on the transparent electrode.Type: GrantFiled: May 7, 2002Date of Patent: August 22, 2006Assignee: Prime View International Co., Ltd.Inventor: Wen-Jian Lin