Patents by Inventor Wen-Ju Preet YANG

Wen-Ju Preet YANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11681850
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Grant
    Filed: May 21, 2021
    Date of Patent: June 20, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nien-Yu Tsai, Chin-Chang Hsu, Wen-Ju Preet Yang, Hsien-Hsin Sean Lee
  • Publication number: 20210279398
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Application
    Filed: May 21, 2021
    Publication date: September 9, 2021
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nien-Yu TSAI, Chin-Chang HSU, Wen-Ju Preet YANG, Hsien-Hsin Sean Lee
  • Patent number: 11017148
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Grant
    Filed: September 30, 2019
    Date of Patent: May 25, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nien-Yu Tsai, Chin-Chang Hsu, Wen-Ju Preet Yang, Hsien-Hsin Sean Lee
  • Publication number: 20200167519
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Application
    Filed: September 30, 2019
    Publication date: May 28, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nien-Yu TSAI, Chin-Chang HSU, Wen-Ju Preet YANG, Hsien-Hsin Sean Lee
  • Patent number: 10430544
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: October 1, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nien-Yu Tsai, Chin-Chang Hsu, Wen-Ju Preet Yang, Hsien-Hsin Sean Lee
  • Publication number: 20180068049
    Abstract: A method of generating a plurality of photomasks includes generating a circuit graph. The circuit graph comprises a plurality of vertices and a plurality of edges. Each of the plurality of vertices is representative of one of a plurality of conductive lines. The plurality of edges are representative of a spacing between the conductive lines less than an acceptable minimum distance. Kn+1 graph comprising a first set of vertices selected from the plurality of vertices connected in series by a first set of edges selected from the plurality of edges and having at least one non-series edge connection between a first vertex and a second vertex selected from the first set of vertices is reduced by merging a third vertex into a fourth vertex selected from the first set of the plurality of vertices. An n-pattern conflict check is performed and the photomasks generated based on the result.
    Type: Application
    Filed: September 2, 2016
    Publication date: March 8, 2018
    Inventors: Nien-Yu TSAI, Chin-Chang HSU, Wen-Ju Preet YANG, Hsien-Hsin Sean LEE