Abstract: A method that includes collecting, by a computer, social network posts by social network friends of a user containing images. The method further includes identifying, by the computer, images within the social network posts containing the user through facial image recognition based on an image of the user in a user social network profile and determining, by the computer, information from the identified images containing the user within the social network posts for inclusion in the user social network profile. The method may further include updating, by the computer, the profile information of the user social network profile to include the information from the identified images containing the user within the social network posts.

Abstract: A memory array and an operation method of the memory array are provided. The memory array includes first and second ferroelectric memory devices formed along a gate electrode, a channel layer and a ferroelectric layer between the gate electrode and the channel layer. The ferroelectric memory devices include: a common source/drain electrode and two respective source/drain electrodes, separately in contact with a side of the channel layer opposite to the ferroelectric layer, wherein the common source/drain electrode is disposed between the respective source/drain electrodes; and first and second auxiliary gates, capacitively coupled to the channel layer, wherein the first auxiliary gate is located between the common source/drain electrode and one of the respective source/drain electrodes, and the second auxiliary gate is located between the common source/drain electrode and the other respective source/drain electrode.

Abstract: A shielding assembly includes a frame including a main body, the main body defining at least one retaining hole; and a cover including a main board, the main panel including retaining elements and rims. The number of the retaining elements is the same as the number of the retaining holes, each rim protruding outwardly from a distal end of one of retaining elements. Each retaining element passes through one of the retaining holes, and each rim is latched with the portions of the frame surrounding the retaining holes.

Abstract: A shielding assembly includes a frame including a main body, the main body defining at least one retaining hole; and a cover including a main board, the main panel including retaining elements and rims. The number of the retaining elements is the same as the number of the retaining holes, each rim protruding outwardly from a distal end of one of retaining elements. Each retaining element passes through one of the retaining holes, and each rim is latched with the portions of the frame surrounding the retaining holes.

Abstract: The invention provides an apparatus for video encoding with decoupled data dependency. In one embodiment, the apparatus comprises a buffer, a hardware circuit, and a parameter determination module. The hardware circuit, coupled to the buffer, generates and stores data during performing motion estimation on a current frame and encoding a plurality of macroblocks of the current frame in the buffer. The parameter determination module, coupled to the hardware circuit and the buffer, retrieves the stored data from the buffer, generates at least one reference parameter for a plurality of macroblocks of a future frame according to the retrieved data, and updates data of the buffer with the generated reference parameters after receiving a triggering signal indicating start of data preparation for the future frame from the hardware circuit.

Abstract: Video encoding apparatuses and methods with decoupled data dependency are provided. An embodiment of a method for video encoding with decoupled data dependency contains at least steps as follows. Data generated from a macroblock of a previous frame is acquired. At least one reference parameter for a macroblock of a current frame is determined according to the acquired data. The macroblock of the current frame is encoded according to the determined reference parameter to generate an output bitstream.

Abstract: A solar energy air-conditioning auxiliary system includes a solar power supply, a voltage detector, a motor, a motive power allocation unit, an automobile air-conditioning system and an engine. While an automobile is being driven, the motive power allocation unit allocates and controls a motor power with a lower proportion of motor output and a higher proportion of engine output to start the operation of the automobile air-conditioning system, after the motive power allocation unit receives a signal detected by the voltage detector and the voltage of a cell is considered sufficient. The automobile air-conditioning system is operated completely by the motive power outputted by the engine to drive the automobile air-conditioning system to operate by a motive power output with the relative proportion.

Abstract: A mathematical calculation method for an image-capturing device includes steps: estimating a green value of a red, blue pixel; calculating four differences between an estimated red value and four neighboring green pixels, weighing proportions of the four neighboring green pixels, and summing up the differences between the four products induced by multiplying the four differences and the four proportions respectively, as a green value G3? in the red pixel. A green value of a blue pixel will be obtained by mentioned steps. A blue value of the red pixel occurs when the following steps: figuring out differences between four green values and four blue values of four neighboring blue pixels, averaging the four differences, and subtracting the average of the four differences from the green value of the red pixel. A red value of the blue pixel and a red, blue value of the green pixel can be estimated, too.

Abstract: A mathematical calculation method for an image-capturing device includes steps: estimating a green value of a red, blue pixel; calculating four differences between an estimated red value and four neighboring green pixels, weighing proportions of the four neighboring green pixels, and summing up the differences between the four products induced by multiplying the four differences and the four proportions respectively, as a green value G3? in the red pixel. A green value of a blue pixel will be obtained by mentioned steps. A blue value of the red pixel occurs when the following steps: figuring out differences between four green values and four blue values of four neighboring blue pixels, averaging the four differences, and subtracting the average of the four differences from the green value of the red pixel. A red value of the blue pixel and a red, blue value of the green pixel can be estimated, too.

Abstract: A method for dry plasma selective etching of a pattern in a silicon nitride dielectric layer formed over a semiconductor substrate employed within a microelectronics fabrication. There is provided a semiconductor substrate having formed thereupon a pad oxide layer over which is formed a silicon nitride dielectric layer. There is formed over the substrate a patterned photoresist etch mask layer. There is then selectively etched the pattern of the photoresist etch mask layer into the silicon nitride layer employing a four-step etching process with three plasma etching environments which include; (1) a “break-through” etching step; (2) a “bulk” etching step to remove a majority of the silicon nitride layer and a “buffer” etching step to remove the remainder of the silicon nitride layer; and (3) an “over-etch” step to complete removal of silicon nitride without excessive etching of underlying material.

Abstract: An improved method for removing a photoresist mask from an etched aluminum pattern after etching the pattern in a chlorine containing plasma has been developed. The method is a five step process, in which the first step is in a microwave generated plasma containing O2 and H2O; the second step is in a microwave generated plasma containing O2 and N2; the third step is in a microwave generated plasma containing H2O; the fourth step is in a microwave generated plasma containing O2 and N2; and the fifth step is in a microwave generated plasma containing H2O. The first step which initiates removal of photoresist while simultaneously beginning the passivation process causes residue-free removal of photoresist following etching of aluminum or aluminum-copper layers in chlorine bearing etchants.

Abstract: A novel anisotropic plasma etching process for forming patterned silicon nitride (Si.sub.3 N.sub.4) layers with improved critical dimension (CD) control while minimizing the Si.sub.3 N.sub.4 footing at the bottom edge of the Si.sub.3 N.sub.4 pattern is achieved. A pad oxide/silicon nitride layer is deposited on a silicon substrate. A patterned photoresist layer is used as an etching mask for etching the silicon nitride layer. By this invention, a chlorine (Cl.sub.2) breakthrough plasma pre-etch forms a protective polymer layer on the sidewalls of the patterned photoresist and removes residue in the open areas prior to etching the Si.sub.3 N.sub.4. The Si.sub.3 N.sub.4 is then aniso-tropically plasma etched using an etch gas containing SF.sub.6. The polymer layer, formed during the Cl.sub.2 pre-etch, reduces the lateral recessing of the photoresist when the Si.sub.3 N.sub.4 is etched, and results in improved patterned Si.sub.3 N.sub.4 profiles with reduced CD bias, and minimizes Si.sub.3 N.sub.