Patents by Inventor Wen-Jung Chen

Wen-Jung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145403
    Abstract: An electronic package is provided, in which electronic elements and at least one packaging module including a semiconductor chip and a shielding structure covering the semiconductor chip are disposed on a carrier structure, an encapsulation layer encapsulates the electronic elements and the packaging module, and a shielding layer is formed on the encapsulation layer and in contact with the shielding structure. Therefore, the packaging module includes the semiconductor chip and the shielding structure and has a chip function and a shielding wall function simultaneously.
    Type: Application
    Filed: February 6, 2023
    Publication date: May 2, 2024
    Applicant: SILICONWARE PRECISION INDUSTRIES CO., LTD.
    Inventors: Chih-Hsien CHIU, Wen-Jung TSAI, Chih-Chiang HE, Ko-Wei CHANG, Chia-Yang CHEN
  • Publication number: 20240102207
    Abstract: A temperature-sensing and humidity-controlling fiber includes a hydrophilic material and a temperature-sensing material. The temperature-sensing material has a lower critical solution temperature (LCST) between 31.2° C. and 32.5° C. when a light transmittance thereof is in a range from 3% to 80%, in which a wavelength of the light is between 450 nm and 550 nm.
    Type: Application
    Filed: December 6, 2023
    Publication date: March 28, 2024
    Inventors: Wen-Jung CHEN, Wei-Hsiang LIN, Chao-Huei LIU
  • Patent number: 11935795
    Abstract: Disclosed is a method for forming a crystalline protective polysilicon layer which does not create defective voids during subsequent processes so as to provide effective protection to devices underneath. In one embodiment, a method for forming a semiconductor device, includes: depositing a protective coating on a first polysilicon layer; forming an epitaxial layer on the protective coating; and depositing a second polysilicon layer over the epitaxial layer, wherein the protective coating comprises a third polysilicon layer, wherein the third polysilicon layer is deposited at a first temperature in a range of 600-700 degree Celsius, and wherein the third polysilicon layer in the protect coating is configured to protect the first polysilicon layer when the second polysilicon layer is etched.
    Type: Grant
    Filed: July 28, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Cheng-Hung Wang, Tsung-Lin Lee, Wen-Chih Chiang, Kuan-Jung Chen
  • Patent number: 11935947
    Abstract: An enhancement mode high electron mobility transistor (HEMT) includes a group III-V semiconductor body, a group III-V barrier layer and a gate structure. The group III-V barrier layer is disposed on the group III-V semiconductor body, and the gate structure is a stacked structure disposed on the group III-V barrier layer. The gate structure includes a gate dielectric and a group III-V gate layer disposed on the gate dielectric, and the thickness of the gate dielectric is between 15 nm to 25 nm.
    Type: Grant
    Filed: October 8, 2019
    Date of Patent: March 19, 2024
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Chih-Tung Yeh, Chun-Ming Chang, Bo-Rong Chen, Shin-Chuan Huang, Wen-Jung Liao, Chun-Liang Hou
  • Publication number: 20240071758
    Abstract: A method for fabricating a high electron mobility transistor (HEMT) includes the steps of forming a buffer layer on a substrate, forming a barrier layer on the buffer layer, forming a p-type semiconductor layer on the barrier layer, forming a gate electrode layer on the p-type semiconductor layer, and patterning the gate electrode layer to form a gate electrode. Preferably, the gate electrode includes an inclined sidewall.
    Type: Application
    Filed: September 23, 2022
    Publication date: February 29, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chih-Tung Yeh, You-Jia Chang, Bo-Yu Chen, Yun-Chun Wang, Ruey-Chyr Lee, Wen-Jung Liao
  • Patent number: 11885045
    Abstract: A temperature-sensing and humidity-controlling fiber includes a hydrophilic material and a temperature-sensing material. The temperature-sensing material has a lower critical solution temperature (LCST) between 31.2° C. and 32.5° C. when a light transmittance thereof is in a range from 3% to 80%, in which a wavelength of the light is between 450 nm and 550 nm.
    Type: Grant
    Filed: March 9, 2022
    Date of Patent: January 30, 2024
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Wen-Jung Chen, Wei-Hsiang Lin, Chao-Huei Liu
  • Publication number: 20220333275
    Abstract: A temperature-sensing and humidity-controlling fiber includes a hydrophilic material and a temperature-sensing material. The temperature-sensing material has a lower critical solution temperature (LCST) between 31.2° C. and 32.5° C. when a light transmittance thereof is in a range from 3% to 80%, in which a wavelength of the light is between 450 nm and 550 nm.
    Type: Application
    Filed: March 9, 2022
    Publication date: October 20, 2022
    Inventors: Wen-Jung CHEN, Wei-Hsiang LIN, Chao-Huei LIU
  • Patent number: 8870431
    Abstract: A mixing light module includes a matrix, a fluorescent film, and a plurality of micro-structures. The matrix includes an incidence surface, an emission surface and a reflective surface. The fluorescent film disposed on or above the emission surface has an upper surface and a lower surface and includes a plurality of fluorescent particles. The matrix receives a first light having a first wavelength, and the reflective surface reflects the first light to make the first light to be emitted from the emission surface. Since the plurality of fluorescent particles receives a part of the first light from the emission surface, the plurality of fluorescent particles is excited to emit a second light having a second wavelength. The second light and the first light are mixed into a predetermined light. The plurality of micro-structures is used to make the first light or the second light uniform.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: October 28, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Hui-Hsiung Lin, Chiun-Lern Fu, Hsiao-Wen Hung, Wen-Hsun Yang, Chi-Hung Liao, Wen-Jung Chen
  • Publication number: 20120170282
    Abstract: A mixing light module includes a matrix, a fluorescent film, and a plurality of micro-structures. The matrix includes an incidence surface, an emission surface and a reflective surface. The fluorescent film disposed on or above the emission surface has an upper surface and a lower surface and includes a plurality of fluorescent particles. The matrix receives a first light having a first wavelength, and the reflective surface reflects the first light to make the first light to be emitted from the emission surface. Since the plurality of fluorescent particles receives a part of the first light from the emission surface, the plurality of fluorescent particles is excited to emit a second light having a second wavelength. The second light and the first light are mixed into a predetermined light. The plurality of micro-structures is used to make the first light or the second light uniform.
    Type: Application
    Filed: December 20, 2011
    Publication date: July 5, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hui-Hsiung Lin, Chiun-Lern Fu, Hsiao-Wen Hung, Wen-Hsun Yang, Chi-Hung Liao, Wen-Jung Chen
  • Patent number: 8101257
    Abstract: An abrasion-resistant transfer printing structure to transfer patterns and texts to a targeted object surface by press printing includes a hardened protecting layer and a release base layer. The hardened protection layer includes a first surface and a second surface. The first surface allows a transfer printing glue to be bonded to the targeted object to cover at least an area corresponding to the patterns and texts. The release base layer is located on the second surface of the hardened protection layer by a releasable manner and can be separated from the hardened protection layer by applying a release force after the press printing process is finished. Thus the hardened protection layer is exposed to isolate the patterns and texts from in contact with the exterior. The surface of the targeted object also is abrasion resistant.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: January 24, 2012
    Assignee: SiPix Chemical Inc.
    Inventors: Shun-Cheng Wang, Shih-Min Huang, Wen-Jung Chen, Chih-Yuan Liao
  • Publication number: 20110297547
    Abstract: A virtual channel platform is disclosed. Said virtual channel platform comprises two spaced electrode plates, which can provide an electric field, and a voltage source electrically connected to the two electrode plates. Said plates define a virtual reservoir and a virtual channel. When the voltage source provides a voltage between the electrode plates, the electric field generates a force to drive a driven fluid streaming from the virtual reservoir to the virtual channel, allowing the virtual channel to be filled with the driven fluid fully.
    Type: Application
    Filed: August 22, 2011
    Publication date: December 8, 2011
    Applicant: NATIONAL CHIAO TUNG UNIVERSITY
    Inventors: SHIH-KANG FAN, WEN-JUNG CHEN
  • Publication number: 20100175998
    Abstract: A virtual channel platform is disclosed. Said virtual channel platform comprises two electrode plates, which can provide an electric field, and two spacers set between said plates. Said plates are separated by said spacers for forming a passageway. A driven fluid is injected into said passageway. When applying electric signals of different frequencies in said plates, said plates form said electric field to drive said working fluid in a virtual channel.
    Type: Application
    Filed: April 20, 2009
    Publication date: July 15, 2010
    Inventors: Shih-Kang Fan, Wen-Jung Chen
  • Publication number: 20100159216
    Abstract: An abrasion-resistant transfer printing structure to transfer patterns and texts to a targeted object surface by press printing includes a hardened protecting layer and a release base layer. The hardened protection layer includes a first surface and a second surface. The first surface allows a transfer printing glue to be bonded to the targeted object to cover at least an area corresponding to the patterns and texts. The release base layer is located on the second surface of the hardened protection layer by a releasable manner and can be separated from the hardened protection layer by applying a release force after the press printing process is finished. Thus the hardened protection layer is exposed to isolate the patterns and texts from in contact with the exterior. The surface of the targeted object also is abrasion resistant.
    Type: Application
    Filed: December 22, 2008
    Publication date: June 24, 2010
    Inventors: Shun-Cheng WANG, Shih-Min Huang, Wen-Jung Chen, Chih-Yuan Liao
  • Patent number: 6124496
    Abstract: The present invention relates to a synthesis method of thionate diamine by the reaction of alkali metal isethionate with diols to form alkali metal isethionate ethoxylate having the following structural formula:HO(CH.sub.2 CH.sub.2 O).sub.n CH.sub.2 CH.sub.2 SO.sub.3 AThe above isethionate ethoxylate is then reacted with aliphatic diamine having a Carbon number of 2 to 6 to form a series of N-(2-aminoalkyl)-2-aminoethyoxylate ethane sulfonate having the following structure formula:H.sub.2 N--(CH.sub.2).sub.m --NH--(CH.sub.2 CH.sub.2 O).sub.n CH.sub.2 CH.sub.2 SO.sub.
    Type: Grant
    Filed: October 16, 1998
    Date of Patent: September 26, 2000
    Assignee: China Textile Institute
    Inventors: Jong-Fu Wu, Kun-Lin Cheng, Wen-Jung Chen