Patents by Inventor Wenli TANG

Wenli TANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240114230
    Abstract: Embodiments of this disclosure provide a method, electronic device, and storage medium for capturing. The method includes: in response to a triggering operation of capturing guidance with a target posture template, displaying the target posture template over a preview image displayed in a capturing page, and displaying capturing prompt information in the capturing page, wherein the target posture template is used to guide a subject to present a corresponding capturing posture, and the capturing prompt information comprises at least one of capturing angle prompt information or capturing distance prompt information; and in response to a capturing instruction, controlling a camera to capture the subject.
    Type: Application
    Filed: December 14, 2023
    Publication date: April 4, 2024
    Inventors: Wenli Liu, Shijia Zhao, Tang Tang, Yang Li
  • Patent number: 10782614
    Abstract: An edge exposure apparatus and method are disclosed. The edge exposure apparatus includes: a base frame (1); an edge exposure unit (2) mounted on the base frame and configured to perform an edge exposure process on a wafer; a pre-alignment unit (3) for centering and orienting the wafer and cooperating with the edge exposure unit (2) in the edge exposure process; a cassette unit (4) for storing and detecting the wafer; a robotic arm (5) for transferring the wafer; and a master control unit (6) for controlling the above components of the edge exposure apparatus. The edge exposure unit (2) and the pre-alignment unit (3) share a common worktable, resulting in structural compactness. Alternatively, two pre-alignment units (3) and two edge exposure units (2) may be included in order to increase processing efficiency.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: September 22, 2020
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Jinguo Yang, Wenli Tang, Gang Wang, Xinke Lang, Jiaozeng Zheng
  • Publication number: 20200089119
    Abstract: An edge exposure apparatus and method are disclosed. The edge exposure apparatus includes: a base frame (1); an edge exposure unit (2) mounted on the base frame and configured to perform an edge exposure process on a wafer; a pre-alignment unit (3) for centering and orienting the wafer and cooperating with the edge exposure unit (2) in the edge exposure process; a cassette unit (4) for storing and detecting the wafer; a robotic arm (5) for transferring the wafer; and a master control unit (6) for controlling the above components of the edge exposure apparatus. The edge exposure unit (2) and the pre-alignment unit (3) share a common worktable, resulting in structural compactness. Alternatively, two pre-alignment units (3) and two edge exposure units (2) may be included in order to increase processing efficiency.
    Type: Application
    Filed: June 30, 2017
    Publication date: March 19, 2020
    Inventors: Jinguo YANG, Wenli TANG, Gang WANG, Xinke LANG, Jiaozeng ZHENG