Patents by Inventor Wen-Lung Liung

Wen-Lung Liung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HIGH-POWER PULSE MAGNETRON SPUTTERING APPARATUS AND SURFACE TREATMENT APPARATUS USING THE SAME
    Publication number: 20110011737
    Abstract: A magnetron sputtering apparatus suitable for coating on a workpiece is provided. The magnetron sputtering apparatus includes a vacuum chamber, a holder, a magnetron plasma source and a high-power pulse power supply set, wherein the magnetron plasma source includes a base, a magnetron controller and a target. A reactive gas is inputted into the vacuum chamber, and the holder supporting the workpiece is disposed inside the vacuum chamber. The magnetron plasma source is disposed opposite to the workpiece, wherein the magnetron controller is disposed in the base, and the target is disposed on the base. The high-power pulse power supply set is coupled to the vacuum chamber, the magnetron plasma source and the holder, and a high voltage pulse power is inputted to the magnetron plasma source to generate plasma to coat a film on the surface of the workpiece.
    Type: Application
    Filed: July 17, 2009
    Publication date: January 20, 2011
    Applicant: Institute of Nuclear Energy Research Atomic Energy Council, Executive Yuan
    Inventors: Jin-Yu Wu, Wen-Lung Liung, Ming-Jui Tsai, Der-Jun Jan, Cheng-Chang Hsieh, Shin-Wu Wei, Chia-Cheng Lee, Chi-Fong Ai