Patents by Inventor Wen Pin Chiu

Wen Pin Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7669872
    Abstract: The disclosed folding mechanism comprises a rear frame member of a bicycle, which has a combining structure positioned at a front portion thereof, wherein the combining structure includes a first joining surface; a front frame member of the bicycle, which has a second joining surface positioned at a rear portion thereof for being joined with the first joining surface; at least one pivot structure, which is provided at an edge of the combining structure for connecting the front frame member, such that the front and rear frame members can relatively move on the pivot structure; and at least one binder, which is deposited at the combining structure of the rear frame member and a position on the front frame member adjacent to the combining structure for fixing the second joining surface of the front frame member and the first joining surface of the rear frame member at a combining position where the two joining surfaces contact mutually.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: March 2, 2010
    Assignee: Cycling & Health Tech Industry R & D Center
    Inventors: Alfred Huang, Wen-Pin Chiu, Yung-Chen Lai, Yu-Che Huang
  • Publication number: 20090163327
    Abstract: A folding treadmill includes a tread base supported by a foot structure which has guide plates formed with elongated slots on two sides of the tread base. The tread base is connected pivotally on the base support through pivot members which are mounted movably within the respective slots so that the tread base is turnable between a folded position and an unfolded position and movable rearward when the tread base turns to the folded position or forward when the tread base turns to the unfolded position. The foot structure further includes a guide rail structure on two sides of the tread base to support movably a first roller which is attached to the tread base and a lifting device for lifting the tread base.
    Type: Application
    Filed: February 17, 2009
    Publication date: June 25, 2009
    Inventors: Te-Chang Huang, Chung-Tseng Hsu, Wen-Pin Chiu
  • Publication number: 20080067779
    Abstract: The disclosed folding mechanism comprises a rear frame member of a bicycle, which has a combining structure positioned at a front portion thereof, wherein the combining structure includes a first joining surface; a front frame member of the bicycle, which has a second joining surface positioned at a rear portion thereof for being joined with the first joining surface; at least one pivot structure, which is provided at an edge of the combining structure for connecting the front frame member, such that the front and rear frame members can relatively move on the pivot structure; and at least one binder, which is deposited at the combining structure of the rear frame member and a position on the front frame member adjacent to the combining structure for fixing the second joining surface of the front frame member and the first joining surface of the rear frame member at a combining position where the two joining surfaces contact mutually.
    Type: Application
    Filed: August 31, 2007
    Publication date: March 20, 2008
    Inventors: Alfred Huang, Wen-Pin Chiu, Yung-Chen Lai, Yu-Che Huang
  • Patent number: 7314809
    Abstract: A method for forming a shallow trench isolation (STI) structure with reduced stress is described. An amorphous silicon layer is deposited on a trench surface of a shallow trench isolation structure, and the amorphous silicon is then oxidized by thermal oxidation to form a liner oxide. The thickness of the liner oxide is uniform to reduce stress caused by a liner oxide having non-uniform thickness in the prior art, and the leakage risk between the semiconductor devices can thus be prevented.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: January 1, 2008
    Assignee: ProMOS Technologies Inc.
    Inventor: Wen-Pin Chiu
  • Publication number: 20060128115
    Abstract: A method for forming a shallow trench isolation (STI) structure with reduced stress is described. An amorphous silicon layer is deposited on a trench surface of a shallow trench isolation structure, and the amorphous silicon is then oxidized by thermal oxidation to form a liner oxide. The thickness of the liner oxide is uniform to reduce stress caused by a liner oxide having non-uniform thickness in the prior art, and the leakage risk between the semiconductor devices can thus be prevented.
    Type: Application
    Filed: March 11, 2005
    Publication date: June 15, 2006
    Inventor: Wen-Pin Chiu
  • Publication number: 20060019198
    Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of organic compound, wherein the recording layer selectively has a larger sensitivity at the wavelength of laser beam ranging between 300 nm and 550 nm.
    Type: Application
    Filed: July 26, 2004
    Publication date: January 26, 2006
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu
  • Publication number: 20060013954
    Abstract: A method for improving an atomic layer deposition process and the device thereof are described. A shield is first formed in a chamber to divide the chamber into a first sub-chamber and a second sub-chamber. Then a first precursor gas and a second precursor gas are introduced into the first sub-chamber and the second sub-chamber, respectively. A wafer is transferred into the first sub-chamber. When the surface of the wafer is saturated with the first precursor gas, the wafer is moved into the second sub-chamber by rotating a spindle, and the first precursor gas reacts with the second precursor gas. Further, the shield is employed to remove the excess first precursor gas and the unreacted second precursor gas. Subsequently, another wafer is transferred into the first sub-chamber, and hence two wafers are treated simultaneously to increase the throughput of the process.
    Type: Application
    Filed: September 28, 2004
    Publication date: January 19, 2006
    Inventor: Wen-Pin Chiu
  • Publication number: 20060003869
    Abstract: A folding treadmill includes a tread base supported by a foot structure which has guide plates formed with elongated slots on two sides of the tread base. The tread base is connected pivotally on the base support through pivot members which are mounted movably within the respective slots so that the tread base is turnable between a folded position and an unfolded position and movable rearward when the tread base turns to the folded position or forward when the tread base turns to the unfolded position. The foot structure further includes a guide rail structure on two sides of the tread base to support movably a first roller which is attached to the tread base and a lifting device for lifting the tread base.
    Type: Application
    Filed: July 2, 2004
    Publication date: January 5, 2006
    Inventors: Te-Chang Huang, Chung-Tseng Hsu, Wen-Pin Chiu
  • Publication number: 20050006232
    Abstract: An ionized physical vapor deposition (I-PVD) process is provided. A plasma reaction chamber is provided. The plasma reaction chamber comprises a metal target and a wafer pedestal set up on the top and bottom section inside the chamber, an ionization unit set up between the target and the wafer pedestal and a conductive mesh set up between the ionization unit and the wafer pedestal. A wafer is put on the wafer pedestal. Thereafter, a negative bias voltage is applied to the metal target and a smaller negative bias voltage is applied to the conductive mesh to deposit a thin film over the wafer. The ionized metallic atoms inside the chamber accelerate towards the conductive mesh but decelerate after passing though the mesh so that step coverage of the deposited thin film is improved without damaging the wafer through ion bombardments.
    Type: Application
    Filed: September 12, 2003
    Publication date: January 13, 2005
    Inventor: WEN-PIN CHIU
  • Patent number: 6835433
    Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of the trimethine-cyanine dyes and an additive, wherein the additive has a larger absorbability at the wavelength of laser beam.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: December 28, 2004
    Assignee: CMC Magnetics Corporation
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang
  • Publication number: 20040109973
    Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of the trimethine-cyanine dyes and an additive, wherein the additive has a larger absorbability at the wavelength of laser beam.
    Type: Application
    Filed: December 4, 2002
    Publication date: June 10, 2004
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang
  • Publication number: 20040102017
    Abstract: A method to form a trench isolation structure. Pre-amorphization is performed on the surface of a trench before liner oxidation, and particularly with the amorphization for the silicon crystals performed by quad ion implantation. Formation of the liner using the present method lowers process temperature and shortens process time.
    Type: Application
    Filed: March 18, 2003
    Publication date: May 27, 2004
    Inventors: Tsz-Lin Chang, Wen-Pin Chiu
  • Patent number: 6716509
    Abstract: An optical recording medium provided on a substrate with a recording layer, said recording layer comprising at least one kind of the trimethine-cyanine dye and an additive, wherein said the additive of recording layer selectively comprises the dye selected from the group consisting of the chemical compounds represented by the following general formula [10], [11], [12], and [13]: “EDG” represents any electron-withdrawing substituted group such as alkylamino or anino group.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: April 6, 2004
    Assignee: CMC Magnetics Corporation
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang, Lii-Chyuan Tsai
  • Publication number: 20040043179
    Abstract: An optical recording medium provided on a substrate with a recording layer, said recording layer comprising at least one kind of the trimethine-cyanine dye and an additive, wherein said the additive of recording layer selectively comprises the dye selected from the group consisting of the chemical compounds represented by the following general formula [10], [11], [12], and [13]: 1
    Type: Application
    Filed: August 20, 2002
    Publication date: March 4, 2004
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang, Lii-Chyuan Tsai
  • Patent number: 6667087
    Abstract: An optical information recording medium with a recording layer enables a recording and reproducing to be effected with a 650 nm (or further) laser beam, and the recording layer contains at least one kind of the trimethine-cyanine dye which is a compound represented by the following general formula [1], [2], [3], [4]. The “EWG” represents any electron-withdrawing substituted group such as cyano or nitro group.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: December 23, 2003
    Assignee: CMC Magnetics Corporation
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Lii-Chyuan Tsai
  • Publication number: 20030157290
    Abstract: An optical information recording medium with a recording layer enables a recording and reproducing to be effected with a 650 nm (or further) laser beam, and the recording layer contains at least one kind of the trimethine-cyanine dye which is a compound represented by the following general formula [1], [2], [3], [4].
    Type: Application
    Filed: November 30, 2001
    Publication date: August 21, 2003
    Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Lii-Chyuan Tsai
  • Patent number: 6464778
    Abstract: A tungsten deposition process. A crystal growth step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is conducted such that the supply of tungsten hexafluoride to the reaction chamber is cut but the supply of silane is continued. Furthermore, nitrogen is passed into the reaction chamber selectively. A main deposition step is finally conducted to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases.
    Type: Grant
    Filed: January 17, 2001
    Date of Patent: October 15, 2002
    Assignee: Promos Technologies Inc.
    Inventor: Wen Pin Chiu
  • Publication number: 20020132481
    Abstract: A tungsten deposition process. A crystal growth step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is conducted such that the supply of tungsten hexafluoride to the reaction chamber is cut but the supply of silane is continued. Furthermore, nitrogen is passed into the reaction chamber selectively. A main deposition step is finally conducted to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases.
    Type: Application
    Filed: January 17, 2001
    Publication date: September 19, 2002
    Inventor: Wen Pin Chiu