Patents by Inventor Wen Pin Chiu
Wen Pin Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7669872Abstract: The disclosed folding mechanism comprises a rear frame member of a bicycle, which has a combining structure positioned at a front portion thereof, wherein the combining structure includes a first joining surface; a front frame member of the bicycle, which has a second joining surface positioned at a rear portion thereof for being joined with the first joining surface; at least one pivot structure, which is provided at an edge of the combining structure for connecting the front frame member, such that the front and rear frame members can relatively move on the pivot structure; and at least one binder, which is deposited at the combining structure of the rear frame member and a position on the front frame member adjacent to the combining structure for fixing the second joining surface of the front frame member and the first joining surface of the rear frame member at a combining position where the two joining surfaces contact mutually.Type: GrantFiled: August 31, 2007Date of Patent: March 2, 2010Assignee: Cycling & Health Tech Industry R & D CenterInventors: Alfred Huang, Wen-Pin Chiu, Yung-Chen Lai, Yu-Che Huang
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Publication number: 20090163327Abstract: A folding treadmill includes a tread base supported by a foot structure which has guide plates formed with elongated slots on two sides of the tread base. The tread base is connected pivotally on the base support through pivot members which are mounted movably within the respective slots so that the tread base is turnable between a folded position and an unfolded position and movable rearward when the tread base turns to the folded position or forward when the tread base turns to the unfolded position. The foot structure further includes a guide rail structure on two sides of the tread base to support movably a first roller which is attached to the tread base and a lifting device for lifting the tread base.Type: ApplicationFiled: February 17, 2009Publication date: June 25, 2009Inventors: Te-Chang Huang, Chung-Tseng Hsu, Wen-Pin Chiu
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Publication number: 20080067779Abstract: The disclosed folding mechanism comprises a rear frame member of a bicycle, which has a combining structure positioned at a front portion thereof, wherein the combining structure includes a first joining surface; a front frame member of the bicycle, which has a second joining surface positioned at a rear portion thereof for being joined with the first joining surface; at least one pivot structure, which is provided at an edge of the combining structure for connecting the front frame member, such that the front and rear frame members can relatively move on the pivot structure; and at least one binder, which is deposited at the combining structure of the rear frame member and a position on the front frame member adjacent to the combining structure for fixing the second joining surface of the front frame member and the first joining surface of the rear frame member at a combining position where the two joining surfaces contact mutually.Type: ApplicationFiled: August 31, 2007Publication date: March 20, 2008Inventors: Alfred Huang, Wen-Pin Chiu, Yung-Chen Lai, Yu-Che Huang
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Patent number: 7314809Abstract: A method for forming a shallow trench isolation (STI) structure with reduced stress is described. An amorphous silicon layer is deposited on a trench surface of a shallow trench isolation structure, and the amorphous silicon is then oxidized by thermal oxidation to form a liner oxide. The thickness of the liner oxide is uniform to reduce stress caused by a liner oxide having non-uniform thickness in the prior art, and the leakage risk between the semiconductor devices can thus be prevented.Type: GrantFiled: March 11, 2005Date of Patent: January 1, 2008Assignee: ProMOS Technologies Inc.Inventor: Wen-Pin Chiu
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Publication number: 20060128115Abstract: A method for forming a shallow trench isolation (STI) structure with reduced stress is described. An amorphous silicon layer is deposited on a trench surface of a shallow trench isolation structure, and the amorphous silicon is then oxidized by thermal oxidation to form a liner oxide. The thickness of the liner oxide is uniform to reduce stress caused by a liner oxide having non-uniform thickness in the prior art, and the leakage risk between the semiconductor devices can thus be prevented.Type: ApplicationFiled: March 11, 2005Publication date: June 15, 2006Inventor: Wen-Pin Chiu
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Publication number: 20060019198Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of organic compound, wherein the recording layer selectively has a larger sensitivity at the wavelength of laser beam ranging between 300 nm and 550 nm.Type: ApplicationFiled: July 26, 2004Publication date: January 26, 2006Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu
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Publication number: 20060013954Abstract: A method for improving an atomic layer deposition process and the device thereof are described. A shield is first formed in a chamber to divide the chamber into a first sub-chamber and a second sub-chamber. Then a first precursor gas and a second precursor gas are introduced into the first sub-chamber and the second sub-chamber, respectively. A wafer is transferred into the first sub-chamber. When the surface of the wafer is saturated with the first precursor gas, the wafer is moved into the second sub-chamber by rotating a spindle, and the first precursor gas reacts with the second precursor gas. Further, the shield is employed to remove the excess first precursor gas and the unreacted second precursor gas. Subsequently, another wafer is transferred into the first sub-chamber, and hence two wafers are treated simultaneously to increase the throughput of the process.Type: ApplicationFiled: September 28, 2004Publication date: January 19, 2006Inventor: Wen-Pin Chiu
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Publication number: 20060003869Abstract: A folding treadmill includes a tread base supported by a foot structure which has guide plates formed with elongated slots on two sides of the tread base. The tread base is connected pivotally on the base support through pivot members which are mounted movably within the respective slots so that the tread base is turnable between a folded position and an unfolded position and movable rearward when the tread base turns to the folded position or forward when the tread base turns to the unfolded position. The foot structure further includes a guide rail structure on two sides of the tread base to support movably a first roller which is attached to the tread base and a lifting device for lifting the tread base.Type: ApplicationFiled: July 2, 2004Publication date: January 5, 2006Inventors: Te-Chang Huang, Chung-Tseng Hsu, Wen-Pin Chiu
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Publication number: 20050006232Abstract: An ionized physical vapor deposition (I-PVD) process is provided. A plasma reaction chamber is provided. The plasma reaction chamber comprises a metal target and a wafer pedestal set up on the top and bottom section inside the chamber, an ionization unit set up between the target and the wafer pedestal and a conductive mesh set up between the ionization unit and the wafer pedestal. A wafer is put on the wafer pedestal. Thereafter, a negative bias voltage is applied to the metal target and a smaller negative bias voltage is applied to the conductive mesh to deposit a thin film over the wafer. The ionized metallic atoms inside the chamber accelerate towards the conductive mesh but decelerate after passing though the mesh so that step coverage of the deposited thin film is improved without damaging the wafer through ion bombardments.Type: ApplicationFiled: September 12, 2003Publication date: January 13, 2005Inventor: WEN-PIN CHIU
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Patent number: 6835433Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of the trimethine-cyanine dyes and an additive, wherein the additive has a larger absorbability at the wavelength of laser beam.Type: GrantFiled: December 4, 2002Date of Patent: December 28, 2004Assignee: CMC Magnetics CorporationInventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang
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Publication number: 20040109973Abstract: An optical recording medium is provided on a substrate with a recording layer. The recording layer comprises at least one kind of the trimethine-cyanine dyes and an additive, wherein the additive has a larger absorbability at the wavelength of laser beam.Type: ApplicationFiled: December 4, 2002Publication date: June 10, 2004Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang
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Publication number: 20040102017Abstract: A method to form a trench isolation structure. Pre-amorphization is performed on the surface of a trench before liner oxidation, and particularly with the amorphization for the silicon crystals performed by quad ion implantation. Formation of the liner using the present method lowers process temperature and shortens process time.Type: ApplicationFiled: March 18, 2003Publication date: May 27, 2004Inventors: Tsz-Lin Chang, Wen-Pin Chiu
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Patent number: 6716509Abstract: An optical recording medium provided on a substrate with a recording layer, said recording layer comprising at least one kind of the trimethine-cyanine dye and an additive, wherein said the additive of recording layer selectively comprises the dye selected from the group consisting of the chemical compounds represented by the following general formula [10], [11], [12], and [13]: “EDG” represents any electron-withdrawing substituted group such as alkylamino or anino group.Type: GrantFiled: August 20, 2002Date of Patent: April 6, 2004Assignee: CMC Magnetics CorporationInventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang, Lii-Chyuan Tsai
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Publication number: 20040043179Abstract: An optical recording medium provided on a substrate with a recording layer, said recording layer comprising at least one kind of the trimethine-cyanine dye and an additive, wherein said the additive of recording layer selectively comprises the dye selected from the group consisting of the chemical compounds represented by the following general formula [10], [11], [12], and [13]: 1Type: ApplicationFiled: August 20, 2002Publication date: March 4, 2004Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Chiung-Man Huang, Lii-Chyuan Tsai
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Patent number: 6667087Abstract: An optical information recording medium with a recording layer enables a recording and reproducing to be effected with a 650 nm (or further) laser beam, and the recording layer contains at least one kind of the trimethine-cyanine dye which is a compound represented by the following general formula [1], [2], [3], [4]. The “EWG” represents any electron-withdrawing substituted group such as cyano or nitro group.Type: GrantFiled: November 30, 2001Date of Patent: December 23, 2003Assignee: CMC Magnetics CorporationInventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Lii-Chyuan Tsai
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Publication number: 20030157290Abstract: An optical information recording medium with a recording layer enables a recording and reproducing to be effected with a 650 nm (or further) laser beam, and the recording layer contains at least one kind of the trimethine-cyanine dye which is a compound represented by the following general formula [1], [2], [3], [4].Type: ApplicationFiled: November 30, 2001Publication date: August 21, 2003Inventors: Sue-Min Yeh, Kao-Ming Chang, Wen-Pin Chiu, Lii-Chyuan Tsai
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Patent number: 6464778Abstract: A tungsten deposition process. A crystal growth step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is conducted such that the supply of tungsten hexafluoride to the reaction chamber is cut but the supply of silane is continued. Furthermore, nitrogen is passed into the reaction chamber selectively. A main deposition step is finally conducted to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases.Type: GrantFiled: January 17, 2001Date of Patent: October 15, 2002Assignee: Promos Technologies Inc.Inventor: Wen Pin Chiu
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Publication number: 20020132481Abstract: A tungsten deposition process. A crystal growth step is carried out in a reaction chamber to form a tungsten crystal layer over a substrate using tungsten hexafluoride, silane and nitrogen as reactive gases. An intermediate step is conducted such that the supply of tungsten hexafluoride to the reaction chamber is cut but the supply of silane is continued. Furthermore, nitrogen is passed into the reaction chamber selectively. A main deposition step is finally conducted to form a tungsten layer over the tungsten crystal layer using tungsten hexafluoride, hydrogen and nitrogen as reactive gases.Type: ApplicationFiled: January 17, 2001Publication date: September 19, 2002Inventor: Wen Pin Chiu