Patents by Inventor Wen-Pin Hsieh

Wen-Pin Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060273817
    Abstract: The invention provides a wireless transmission device, including a first circuit board, a second circuit board and a third circuit board. The first circuit board at least disposes more than one electronic elements. The second circuit board has an antenna, and the antenna is electrically connected to the first circuit board. The second circuit board is arranged at a predetermined angle to the first circuit board to enhance the receiving ability. The third circuit board is connected to the first circuit board and disposes a USB connector electrically connected to the first circuit board so that the change in form of the device can be easily made.
    Type: Application
    Filed: June 2, 2006
    Publication date: December 7, 2006
    Applicant: BEHAVIOR TECH COMPUTER CORP.
    Inventors: Wen-Pin Hsieh, Wen-Sheng Kuo, Yen-Liang Kuan
  • Publication number: 20060133958
    Abstract: A fluid analytical device for separating and analyzing a fluid including a first component and a second component. The specific weight of the first component exceeds that of the second component. A rotating base includes a receiving chamber, a first separation well, a second separation well, a first connection channel, a second connection channel, and a vent channel. The receiving chamber receives the fluid. The first connection channel connects the receiving chamber to the first separation well. The second connection channel connects the first separation well to the second separation well. The vent channel is connected to the receiving chamber. The distance from the first separation well to the receiving chamber exceeds that from the second separation well to the receiving chamber. When the rotating base rotates, the first and second components of the fluid flow into the first and second separation wells by centrifugal force, respectively.
    Type: Application
    Filed: July 5, 2005
    Publication date: June 22, 2006
    Inventors: Wen-Pin Hsieh, Chin-Tang Chuang, Jian-Je Jian, Iany-H Liau, Ke-Shieng Yang
  • Patent number: 6241597
    Abstract: An apparatus for maintaining semiconductor is disclosed. The cleaning apparatus includes two parts of a maintaining apparatus and gas-absorbing apparatus The maintaining apparatus mainly comprises a container using for isolating poison gas outside and a inner vessel, both being shaped as a cylinder, having an absorption exit with hose extending. There are an entrance and an exit end for absorption exit of container as well. This absorption exit is formed as for receiving and passing toxic gas. The vessel is as like cylinder shape and which has a hole on the top, also a plurality of holes embodied on the vessel for gas exiting. A disk is provided for covering the vessel container, and also for isolating toxic gas and the natural atmosphere. A plurality of rollers is for providing both functions of loading and rotation of vessel. The gas-absorbing apparatus can provide a source for absorbing gas quickly as well.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: June 5, 2001
    Assignee: Mosel Vitelic Inc.
    Inventors: Wen-Peng Chiang, Wen-Pin Hsieh
  • Patent number: 6069088
    Abstract: The present invention relates to a method for prolonging life time of a dry etching chamber. A neck portion of the dry etching chamber, according to the present invention, is divided three sections, namely a first section, a second section and a third section in sequence from top of the neck portion to bottom thereof and each section has the same area. A first phase of a two-phase connection method, according to the present invention, then proceeds as the following. The first section is surrounded by an electrode coil connected to a rf power and the second section is surrounded by an electrode coil connected to the ground, not touching the electrode coil connected to the rf power, so that a plasma field within the dry etching chamber can be produced to perform a dry etching. The dry etching can be applied in production line until before life time of the first section comes to an end, i.e. about 95 % of life time of the dry etching chamber disclosed in prior art.
    Type: Grant
    Filed: March 11, 1999
    Date of Patent: May 30, 2000
    Assignee: Mosel Vitelic Incorporated
    Inventors: Wen-Peng Chiang, Wen-Pin Hsieh
  • Patent number: D491947
    Type: Grant
    Filed: November 25, 2003
    Date of Patent: June 22, 2004
    Assignee: Behavior Tech Computer Corp.
    Inventor: Wen-Pin Hsieh