Patents by Inventor Wen-Reng Huang

Wen-Reng Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPC-like repair method for attenuated phase shift masks
    Patent number: 6660436
    Abstract: A new process for repairing an attenuated phase-shifting photomask is described. A contact hole pattern is provided on an attenuating phase-shifting photomask. An aerial image is obtained of the contact hole pattern. The critical dimension of the contact hole pattern is predicted from the intensity of the aerial image. Thereafter, the critical dimension is adjusted by forming non-printable optical proximity or scattering bar correction patterns around abnormal defects in the contact hole pattern on the attenuated phase-shifting photomask. The non-printable correction patterns enhance or cancel light intensity to correct the adnormal defects.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: December 9, 2003
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Same-Ting Chen, Wen-Hong Huang, Wen-Reng Huang