Abstract: A semiconductor processing chamber may include a pedestal configured to support a substrate during a plasma-enhanced chemical-vapor deposition (PECVD) process that forms a film on a surface of the substrate. The chamber may also include one or more internal meshes embedded in the pedestal. The one or more internal meshes may be configured to deliver radio-frequency (RF) power to a plasma in the semiconductor processing chamber during the PECVD process. An outer diameter of the one or more internal meshes may be less that a diameter of the substrate. The chamber may further include an RF source configured to deliver the RF power to the one more internal meshes. This configuration may reduce arcing within the processing chamber.

Abstract: A micro-electro-mechanical system (MEMS) microphone is provided. The MEMS microphone includes a substrate, a backplate, an insulating layer, and a diaphragm. The substrate has an opening portion. The backplate is disposed on a side of the substrate, with protrusions protruding toward the substrate. The diaphragm is movably disposed between the substrate and the backplate and spaced apart from the backplate by a spacing distance. The protrusions are configured to limit the deformation of the diaphragm when air flows through the opening portion.

Abstract: A MEMS structure is provided. The MEMS structure includes a substrate and a backplate, the substrate has an opening portion, and the backplate is disposed on one side of the substrate and has acoustic holes. The MEMS structure also includes a diaphragm disposed between the substrate and the backplate, and the diaphragm extends across the opening portion of the substrate and includes outer ventilation holes and inner ventilation holes arranged in a concentric manner. The outer ventilation holes and the inner ventilation holes are relatively arranged in a ring shape and surround the center of the diaphragm. The MEMS structure further includes a pillar disposed between the backplate and the diaphragm. The pillar prevents the diaphragm from being electrically connected to the backplate.

Abstract: Modified cells suitable for the production of ergot alkaloids include engineered recombinant cells having one or more genes that code for one or more enzymes in the biosynthetic pathway from tryptophan to D-lysergic acid (DLA). Methods of culturing the engineered recombinant cells can be used for the production of DLA and other ergot alkaloids.

Abstract: A MEMS structure is provided. The MEMS structure includes a substrate having an opening portion and a backplate disposed on one side of the substrate. The MEMS structure also includes a diaphragm disposed between the substrate and the backplate. The opening portion of the substrate is under the diaphragm, and an air gap is formed between the diaphragm and the backplate. The MEMS structure further includes a pillar structure connected with the backplate and the diaphragm and a protection post structure extending from the backplate into the air gap. From a top view of the backplate, the protection post structure surrounds the pillar structure.

Abstract: A semiconductor device includes a substrate having a first conductivity type and including a cell region and a termination region. A trench is disposed in the substrate and located in the cell region, and a gate electrode disposed in the trench. A shielding doped region having a second conductivity type is disposed in the substrate and directly below the trench. A buried guard ring having the second conductivity type is disposed in the substrate and located in the termination region. The buried guard ring and the shielding doped region are disposed at the same depth in the substrate. In addition, a junction termination extension structure having the second conductivity type is disposed in the substrate, located directly above and separated from the buried guard ring.

Abstract: A semiconductor device includes a trench in a substrate, a gate electrode in the trench, a source contact region on a first surface of the substrate, a drain contact region on a second surface of the substrate, a heavily doped region directly below the trench, and a current spreading layer in the substrate to surround the bottom of the trench and the heavily doped region. The heavily doped region has a first conductivity type, and the width of the heavily doped region is smaller than the width of the trench in a first direction. The current spreading layer has a second conductivity type and a gradual doping concentration that is gradually increased along the first direction from the heavily doped region to the outside of the current spreading layer.

Abstract: A MEMS structure is provided. The MEMS structure includes a substrate having an opening portion and a backplate disposed on one side of the substrate. The backplate comprises a backplate conductive layer and a backplate insulating layer stacked with each other. The MEMS structure also includes a diaphragm disposed between the substrate and the backplate and extending across the opening portion of the substrate. The MEMS structure further includes a pillar structure connected with the backplate. The pillar structure comprises a pillar conductive layer and a pillar insulating layer stacked with each other.

Abstract: Disclosed herein include recombinant terminal deoxynucleotidyl transferases (TdTs). In some embodiments, the recombinant TdT comprises an amino acid sequence that is at least 80% identical to a bovine TdT, wherein the recombinant TdT comprises one or more amino acid substitution mutations at one or more positions functionally equivalent to Glu191, Lys193, Glu194, Asp242, Lys287, Phe296, Met299, Thr342, and His421 in the bovine TdT.

Abstract: A MEMS structure is provided. The MEMS structure includes a substrate having an opening portion and a backplate disposed on one side of the substrate and having acoustic holes. The MEMS structure also includes a diaphragm disposed between the substrate and the backplate and extending across the opening portion of the substrate. The diaphragm includes a ventilation hole, and an air gap is formed between the diaphragm and the backplate. The MEMS structure further includes a filler structure disposed on the diaphragm, and a portion of the filler structure is disposed in the ventilation hole.

Abstract: A semiconductor structure including a substrate, an epitaxy layer, an electrode structure, a first sidewall doping region, a second sidewall doping region, and a bottom doping region is provided. The substrate has a first conductivity type. The epitaxy layer has a first conductivity type and is disposed on the substrate. The electrode structure is disposed in the epitaxy layer. The electrode structure extends along a first direction. The first sidewall doping region has the first conductivity type and is disposed on one side of the electrode structure. The second sidewall doping region has a second conductivity type different than the first conductivity type and is disposed on the other side of the electrode structure. The bottom doping region has the second conductivity type and is disposed under the electrode structure. The second sidewall doping region is connected to the bottom doping region.

Abstract: A tracking system is provided. The tracking system includes a first tracking device, a second tracking device, and a wearable tracking device. The first tracking device is disposed on a vehicle and is configured to obtain map information and first measurement information. The second tracking device is disposed on the vehicle and is configured to obtain second measurement information. The wearable tracking device is disposed on a user in the vehicle and is configured to obtain third measurement information. Further, the wearable tracking device is configured to obtain location position information of the user based on the map information, the first measurement information, the second measurement information, and the third measurement information. Furthermore, the local position information indicates a user position of the user within the vehicle.

Abstract: A semiconductor device includes a substrate having a first conductivity type, an epitaxial layer formed on the substrate, a well region extending from a top surface of the epitaxial layer into the epitaxial layer, a drift region formed in the epitaxial layer and in contact with the bottom surface of the well region, a gate structure and a conductive structure. The epitaxial layer has the first conductivity type, the well region has the second conductivity type, and the drift region has the first conductivity type. The gate structure that extends from the top surface of the epitaxial layer penetrates the well region and is in contact with the drift region. The conductive structure is formed in the drift region and disposed below the gate structure. A gate electrode of the gate structure is separated from the underlying conductive structure by the gate dielectric layer of the gate structure.

Abstract: A semiconductor device includes a substrate, an epitaxial layer on the substrate, a well region in the epitaxial layer, an insulating pillar extending into the epitaxial layer, a first doping region in the epitaxial layer and surrounding the insulating pillar, a second doping region under the first doping region, and a gate structure formed at one lateral side of the insulating pillar and extending into the epitaxial layer. The substrate and the epitaxial layer each have a first conductivity type. The well region and the first and second doping regions each have a second conductivity type. The gate structure is separated from the insulating pillar. The insulating pillar penetrates the first doping region by extending from the top portion to the bottom portion of the first doping region. The first doping region is electrically connected to the well region.

Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, an epitaxy layer, a well region, a gate electrode, a conductive structure, and a source electrode. The substrate has a first conductive type. The epitaxy layer has the first conductive type and is disposed on the substrate. The well region has a second conductive type. The second conductive type is different than the first conductive type. The well region is disposed in the epitaxy layer. The gate electrode is disposed on the well region. The conductive structure includes an upper portion and a lower portion. The lower portion extends in the direction of the substrate into the epitaxy layer and the upper portion is disposed on the epitaxy layer. The source electrode is disposed on the conductive structure.

Abstract: The present invention provides a photocuring device, comprising a housing and an ultraviolet (UV) light module, wherein the housing comprises an electroluminescent layer and/or a touch layer and a control module connected to the electroluminescent layer and/or the touch layer by an electrical means. The photocuring device of the invention not only features a low material cost and low production cost, but also allows its display interface and/or operation interface to be provided at any position of the housing of the photocuring device, without limitations in size, shape, or angle. Furthermore, the photocuring device of the invention allows its display interface and/or operation interface to be simplified as needed to facilitate operation and viewing by a manicurist or one who is receiving a manicure.

Abstract: A micro-electro-mechanical system (MEMS) microphone is provided. The MEMS microphone includes a substrate, a diaphragm, a backplate and a first protrusion. The substrate has an opening portion. The diaphragm is disposed on one side of the substrate and extends across the opening portion of the substrate. The backplate includes a plurality of acoustic holes. The backplate is disposed on one side of the diaphragm. An air gap is formed between the backplate and the diaphragm. The first protrusion extends from the backplate towards the air gap.

Abstract: A controller is provided. The controller is adapted to determine a position conversion relationship between a predetermined position of a body part of a user and a tracking position of a wearing part of the user. The wearing part is where a wearable device is disposed on the user. The controller is configured to: obtain a camera data of a previous moment from a camera, wherein the camera data comprises an image of a wearable device; obtain a sensor data of the previous moment from a sensor of the wearable device; determine the position conversion relationship based on the camera data of the previous moment and the sensor data of the previous moment; and output a fusion data of the wearing part of a current moment based on the position conversion relationship.