Abstract: A method for producing Si ingot single crystal by NOC growth method including a Si ingot single crystal growing step and a continuous growing step is provided. The growing step includes providing a low temperature region in the Si melt where the Si ingot single crystal is grown along the surface of the Si melt or toward the inside of the Si melt, and the Si ingot single crystal has distribution of a vacancy concentration and an interstitial concentration in which respectively a vacancy concentration and an interstitial concentration vary with a distance from the growth interface; and adjusting a temperature gradient and a growth rate in the Si melt, so that along with the increasing of the distance from the growth interface, the vacancy concentration and the interstitial concentration in the Si ingot single crystal respectively decrease come near to each other.

Abstract: A method for producing Si ingot single crystal by NOC growth method including a Si ingot single crystal growing step and a continuous growing step is provided. The growing step includes providing a low temperature region in the Si melt where the Si ingot single crystal is grown along the surface of the Si melt or toward the inside of the Si melt, and the Si ingot single crystal has distribution of a vacancy concentration and an interstitial concentration in which respectively a vacancy concentration and an interstitial concentration vary with a distance from the growth interface; and adjusting a temperature gradient and a growth rate in the Si melt, so that along with the increasing of the distance from the growth interface, the vacancy concentration and the interstitial concentration in the Si ingot single crystal respectively decrease come near to each other.

Abstract: An electron-beam lithography method includes, computing and outputting a development time of a positive-tone electron-sensitive layer and a parameter recipe of an electron-beam device by using a pattern dimension simulation system, performing a low-temperature treatment to chill a developer solution, utilizing an electron-beam to irradiate an exposure region of the positive-tone electron-sensitive layer based on the parameter recipe, and utilizing the chilled developer solution to develop a development region of the positive-tone electron-sensitive layer based on the development time. The development region is present within the exposure region, and an area of the exposure region is smaller than that of the first portion. As a result, the electron-beam lithography method may control a dimension of a development pattern of the positive-tone electron-sensitive layer more accurately, and may also shrink a minimum dimension of the development pattern of the positive-tone electron-sensitive layer.

Abstract: An electron-beam lithography method includes, computing and outputting a development time of a positive-tone electron-sensitive layer and a parameter recipe of an electron-beam device by using a pattern dimension simulation system, performing a low-temperature treatment to chill a developer solution, utilizing an electron-beam to irradiate an exposure region of the positive-tone electron-sensitive layer based on the parameter recipe, and utilizing the chilled developer solution to develop a development region of the positive-tone electron-sensitive layer based on the development time. The development region is present within the exposure region, and an area of the exposure region is smaller than that of the first portion. As a result, the electron-beam lithography method may control a dimension of a development pattern of the positive-tone electron-sensitive layer more accurately, and may also shrink a minimum dimension of the development pattern of the positive-tone electron-sensitive layer.

Abstract: The present invention provides a solar cell with a surface staged type antireflective layer, comprising a photoelectric conversion layer having a first surface and a second surface opposite from each other and used for receiving incident photons in order to generate charged carriers; a staged type antireflective layer formed on the first surface; the staged type antireflective layer comprising a textured surface structure formed on the first surface via a coarsening method and a plurality of nanostructures formed to protrude from or indent into the textured surface structure; a front-side conductive layer disposed on top the staged type antireflective layer; and a back-side conductive layer disposed underneath the second surface; wherein the s staged type antireflective layer is used for allowing the solar cell to generate an antireflection effect subject to light in a full spectrum range; wherein the full spectrum range is between 300 nm to 1100 nm.

Abstract: A method for manufacturing a semiconductor template balanced between strains and defects is provided, the method including steps of: preparing a substrate, dividing the substrate into a plurality of first patterned zones and a plurality of second patterned zones, the second patterned zones applied to separate the first patterned zones; selecting a semiconductor with an ideal lattice of a semiconductor buffer layer to be deposited on the substrate; etching a plurality of first microstructures in the first patterned zones according to the semiconductor with the ideal lattice, the first microstructures and the semiconductor with the ideal lattice following a lattice-structure matching relationship, discovered by strain-traction experiments, making the substrate a multi-patterned substrate; and depositing the semiconductor buffer layer having the semiconductor with the ideal lattice on the multi-patterned substrate to manufacture a semiconductor template which is balanced between strains and defects.

Abstract: A method for manufacturing a semiconductor template balanced between strains and defects is provided, the method including steps of: preparing a substrate, dividing the substrate into a plurality of first patterned zones and a plurality of second patterned zones, the second patterned zones applied to separate the first patterned zones; selecting a semiconductor with an ideal lattice of a semiconductor buffer layer to be deposited on the substrate; etching a plurality of first microstructures in the first patterned zones according to the semiconductor with the ideal lattice, the first microstructures and the semiconductor with the ideal lattice following a lattice-structure matching relationship, discovered by strain-traction experiments, making the substrate a multi-patterned substrate; and depositing the semiconductor buffer layer having the semiconductor with the ideal lattice on the multi-patterned substrate to manufacture a semiconductor template which is balanced between strains and defects.

Abstract: A multi-chip semiconductor package and a fabrication method thereof are provided. A substrate having an upper surface and a lower surface is prepared. At least a first chip is mounted on the upper surface of the substrate. A non-conductive material is applied over predetermined area on the first chip and the upper surface of the substrate. At least a second chip is mounted on the non-conductive material, and formed with at least a suspending portion free of interference in position with the first chip, wherein the non-conductive material is dimensioned in surface area at least corresponding to the second chip, so as to allow the suspending portion to be supported on the non-conductive material. With the second chip being completely supported on the non-conductive material without causing a conventional chip-crack problem, structural intactness and reliability can be effectively assured for fabricated package products.

Abstract: A strengthened window-type semiconductor package is provided. A substrate having an opening is mounted with at least a chip in a manner that, an active surface of the chip covers and partly exposed to the opening, and electrically connected to the substrate by bonding wires formed through the opening. An elastic non-conductive material is applied over the chip exclusive of the active surface. An upper encapsulant is formed to encapsulate the chip and the non-conductive material, and a lower encapsulant is formed to encapsulate the bonding wires and seal the opening. With provision of the non-conductive material for encapsulating the chip before forming the upper encapsulant, the chip can be prevented from cracking particularly at corner and edge positions that encounter relatively greater thermal stress during subsequent fabrication processes such as curing of the upper encapsulant and thermal cycles.

Abstract: A multi-chip semiconductor package and a fabrication method thereof are provided. A substrate having an upper surface and a lower surface is prepared. At least a first chip is mounted on the upper surface of the substrate. A non-conductive material is applied over predetermined area on the first chip and the upper surface of the substrate. At least a second chip is mounted on the non-conductive material, and formed with at least a suspending portion free of interference in position with the first chip, wherein the non-conductive material is dimensioned in surface area at least corresponding to the second chip, so as to allow the suspending portion to be supported on the non-conductive material. With the second chip being completely supported on the non-conductive material without causing a conventional chip-crack problem, structural intactness and reliability can be effectively assured for fabricated package products.

Abstract: A multi-chip semiconductor package and a fabrication method thereof are provided. A substrate having an upper surface and a lower surface is prepared. At least a first chip is mounted on the upper surface of the substrate. A non-conductive material is applied over predetermined area on the first chip and the upper surface of the substrate. At least a second chip is mounted on the non-conductive material, and formed with at least a suspending portion free of interference in position with the first chip, wherein the non-conductive material is dimensioned in surface area at least corresponding to the second chip, so as to allow the suspending portion to be supported on the non-conductive material. With the second chip being completely supported on the non-conductive material without causing a conventional chip-crack problem, structural intactness and reliability can be effectively assured for fabricated-package products.

Abstract: A strengthened window-type semiconductor package is provided. A substrate having an opening is mounted with at least a chip in a manner that, an active surface of the chip covers and partly exposed to the opening, and electrically connected to the substrate by bonding wires formed through the opening. An elastic non-conductive material is applied over the chip exclusive of the active surface. An upper encapsulant is formed to encapsulate the chip and the non-conductive material, and a lower encapsulant is formed to encapsulate the bonding wires and seal the opening. With provision of the non-conductive material for encapsulating the chip before forming the upper encapsulant, the chip can be prevented from cracking particularly at corner and edge positions that encounter relatively greater thermal stress during subsequent fabrication processes such as curing of the upper encapsulant and thermal cycles.

Abstract: A multi-chip semiconductor package and a fabrication method thereof are provided. A substrate having an upper surface and a lower surface is prepared. At least a first chip is mounted on the upper surface of the substrate. A non-conductive material is applied over predetermined area on the first chip and the upper surface of the substrate. At least a second chip is mounted on the non-conductive material, and formed with at least a suspending portion free of interference in position with the first chip, wherein the non-conductive material is dimensioned in surface area at least corresponding to the second chip, so as to allow the suspending portion to be supported on the non-conductive material. With the second chip being completely supported on the non-conductive material without causing a conventional chip-crack problem, structural intactness and reliability can be effectively assured for fabricated-package products.