Abstract: A CVD process for producing nanocrystalline films using a plasma (56, 312) created by an argon atmosphere (at least about 90 percent by volume) containing methane (preferably about at least about 1% by volume) and optionally hydrogen (preferably 0.001 to 2% by volume) is described. Strictly controlled gas purity and an apparatus which excludes oxygen and nitrogen from being introduced from outside of the chamber (40, 305) are used. The films are coated on various substrates to provide seals, optical applications such as on lenses and as a substrate material for surface acoustic wave (SAW) devices.

Abstract: A flexible conducting wire structure having light emitters is disclosed. Two flexible conducting wires with different polarities and a plurality of light emitting diodes having a plurality of chips having first electrodes and second electrodes are provided. The first electrodes of the light emitting diodes are electrically connected with one of the flexible conducting wires. The second electrodes of the light emitting diodes are electrically connected with the other of the flexible conducting wires via an extremely fine conducting wire. The chips of the light emitting diodes, the flexible conducting wires, and locations therebetween are covered with a layer of transparent adhesive for providing an transparent protective cap for the chips and the extremely fine conducting wire. The flexible conducting wires are covered with a layer of transparent insulating adhesive respectively for forming an insulating wire cover to avoid the occurrence of short circuit.

Abstract: Surface Acoustic Wave (SAW) devices with an unpolished or nominally polished nanocrystalline diamond film, metal electrodes and piezoelectric composition coatings are described. The devices are used as radio frequency and microwave filters.

Abstract: Surface Acoustic Wave (SAW) devices with an unpolished or nominally polished nanocrystalline diamond film, metal electrodes and piezoelectric composition coatings are described. The devices are used as radiofrequency and microwave filters.

Abstract: A CVD process for producing nanocrystalline films using a plasma (56, 312) created by an argon atmosphere (at least about 90 percent by volume) containing methane (preferably about at least about 1% by volume) and optionally hydrogen (preferably 0.001 to 2% by volume) is described. Strictly controlled gas purity and an apparatus which excludes oxygen and nitrogen from being introduced from outside of the chamber (40, 305) are used. The films are coated on various substrates to provide seals, optical applications such as on lenses and as a substrate material for surface acoustic wave (SAW) devices.