Patents by Inventor Wen-Shin Shen

Wen-Shin Shen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5153102
    Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.
    Type: Grant
    Filed: August 10, 1990
    Date of Patent: October 6, 1992
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Jer Lee, Chein-Dhau Lee, Wen-Shin Shen, Dhei-Jhai Lin
  • Patent number: 5011762
    Abstract: A photosensitive composition which is suitable for free radical polymerization systems initiated by ultraviolet light, particularly useful in UV-curing coating and image transfer systems such as printing plates and photoresists. Among the above mentioned applications, systems in which the photosensitive layer has no protective film to insulate it from the air shows the greatest improvement in photosensitivity.
    Type: Grant
    Filed: August 14, 1990
    Date of Patent: April 30, 1991
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Jer Lee, Chein-Dhau Lee, Wen-Shin Shen